Laser chemical-vapor deposition of titanium nitride

Xiangli Chen; Jyoti Mazumder

doi:10.1103/physrevb.52.5947

Laser chemical-vapor deposition of titanium nitride

Physical Review B ◽

10.1103/physrevb.52.5947 ◽

1995 ◽

Vol 52 (8) ◽

pp. 5947-5952 ◽

Cited By ~ 11

Author(s):

Xiangli Chen ◽

Jyoti Mazumder

Keyword(s):

Chemical Vapor Deposition ◽

Titanium Nitride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition

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Kinetics and microstructure of laser chemical vapor deposition of titanium nitride

10.1117/12.237738 ◽

1996 ◽

Cited By ~ 1

Author(s):

Kieth M. Egland ◽

Jyotirmoy Mazumder

Keyword(s):

Chemical Vapor Deposition ◽

Titanium Nitride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition

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Laser chemical vapor deposition of titanium nitride films with tetrakis (diethylamido) titanium and ammonia system

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2009.10.042 ◽

2010 ◽

Vol 204 (14) ◽

pp. 2111-2117 ◽

Cited By ~ 4

Author(s):

Yansheng Gong ◽

Rong Tu ◽

Takashi Goto

Keyword(s):

Chemical Vapor Deposition ◽

Titanium Nitride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition

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Process diagnostics of laser chemical vapor deposition of titanium nitride

International Congress on Applications of Lasers & Electro-Optics ◽

10.2351/1.5058798 ◽

1994 ◽

Author(s):

Xiangli Chen ◽

Magdi Azer ◽

Keith Egland ◽

Jyoti Mazumder

Keyword(s):

Chemical Vapor Deposition ◽

Titanium Nitride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Process Diagnostics

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Laser Chemical Vapor Deposition of Titanium Nitride and Process Diagnostics With Laser Induced Fluorescence Spectroscopy

Laser Processing: Surface Treatment and Film Deposition ◽

10.1007/978-94-009-0197-1_35 ◽

1996 ◽

pp. 693-701

Author(s):

X. Chen ◽

M. N. Azer ◽

K. M. Egland ◽

J. Mazumder

Keyword(s):

Chemical Vapor Deposition ◽

Fluorescence Spectroscopy ◽

Titanium Nitride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Induced Fluorescence ◽

Laser Chemical Vapor Deposition ◽

Process Diagnostics

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Kinetics and microstructure of laser chemical vapor deposition of titanium nitride

Acta Materialia ◽

10.1016/j.actamat.2007.02.013 ◽

2007 ◽

Vol 55 (10) ◽

pp. 3623-3631 ◽

Cited By ~ 8

Author(s):

K.M. Egland ◽

J. Mazumder

Keyword(s):

Chemical Vapor Deposition ◽

Titanium Nitride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition

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Kinetic studies of laser chemical vapor deposition of titanium nitride

Journal of Applied Physics ◽

10.1063/1.357400 ◽

1994 ◽

Vol 76 (6) ◽

pp. 3914-3916 ◽

Cited By ~ 6

Author(s):

Xiangli Chen ◽

Jyoti Mazumder

Keyword(s):

Chemical Vapor Deposition ◽

Titanium Nitride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Kinetic Studies ◽

Laser Chemical Vapor Deposition

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Influence of oxygen partial pressure on SmBa2Cu3O7-δ film deposited by laser chemical vapor deposition

Journal of Asian Ceramic Societies ◽

10.1080/21870764.2020.1860434 ◽

2020 ◽

pp. 1-11

Author(s):

Ting Wang ◽

Rong Tu ◽

Canlin Zhang ◽

Song Zhang ◽

Kaidong Wang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition

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Structures and Energetics of Some Potential Intermediates in Titanium Nitride Chemical Vapor Deposition: TiClm(NH2)n, TiClm(NH2)nNH, and TiClm(NH2)nN. An ab Initio Molecular Orbital Study

The Journal of Physical Chemistry B ◽

10.1021/jp9810668 ◽

1998 ◽

Vol 102 (26) ◽

pp. 5152-5157 ◽

Cited By ~ 10

Author(s):

Anwar G. Baboul ◽

H. Bernhard Schlegel

Keyword(s):

Chemical Vapor Deposition ◽

Titanium Nitride ◽

Ab Initio ◽

Molecular Orbital ◽

Vapor Deposition ◽

Chemical Vapor ◽

Molecular Orbital Study ◽

Orbital Study

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Laser Chemical Vapor Deposition

Physical Processes in Laser-Materials Interactions ◽

10.1007/978-1-4684-4322-6_22 ◽

1983 ◽

pp. 455-468 ◽

Cited By ~ 2

Author(s):

Susan D. Allen

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition

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ArF excimer laser chemical vapor deposition a-Si:H/a-AlxO1−x superlattices

Thin Solid Films ◽

10.1016/0040-6090(92)90904-p ◽

1992 ◽

Vol 218 (1-2) ◽

pp. 62-67

Author(s):

K. Uwasawa ◽

F. Ishihara ◽

S. Matsumoto

Keyword(s):

Chemical Vapor Deposition ◽

Excimer Laser ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Arf Excimer Laser

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