Resonant-Raman-scattering study on short-period Si/Ge superlattices

1994 ◽  
Vol 50 (24) ◽  
pp. 18211-18218 ◽  
Author(s):  
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G. Abstreiter ◽  
H. Kibbel ◽  
H. Presting
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V M Dzhagan ◽  
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Vol 100 (7) ◽  
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Wang Peng ◽  
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RSC Advances ◽  
2016 ◽  
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Author(s):  
Abdul Majid ◽  
J. J. Zhu ◽  
Usman Ali Rana ◽  
Salah Ud-Din Khan

200 keV ions of V, Cr and Co were implanted into wurtzite GaN/sapphire thin films at fluences of 5 × 1014 cm−2, 5 × 1015 cm−2 and 5 × 1016 cm−2.


1991 ◽  
Vol 43 (14) ◽  
pp. 11815-11824 ◽  
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M. Cardona ◽  
K. Ploog

2005 ◽  
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pp. 8605-8620 ◽  
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M. E. Delaney ◽  
T. C. McGlinn ◽  
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1989 ◽  
Vol 40 (2) ◽  
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M. I. Alonso ◽  
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...  

1991 ◽  
Vol 220 ◽  
Author(s):  
U. Menczigar ◽  
K. Eberl ◽  
G. Abstreiter

ABSTRACTShort period Si/Ge superlattices have been grown on Ge (001) and Si (001) substrates by molecular beam epitaxy. The optical properties of the superlattices have been studied with photoreflectance. (PR) and resonant Raman scattering (RRS). With PR we are able to observe new, structural induced transitions for all superlattices which are related to E0-and E1-like gaps. The analysis of PR spectra is complicated by an optical etalon effect if the samples are sufficently thick. The E1-like transitions in the range between 1.9eV and 2.7eV are also studied with RRS. Due to the confinement of the optical phonons in the Ge and Si layers RRS is able to probe the bandstructure in each layer seperately. Localized electronic states in the Ge layers can be observed with RRS for a Si4Ge18 superlattice and are compared with PR measurements.


1996 ◽  
Vol 79 (11) ◽  
pp. 8853-8855 ◽  
Author(s):  
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G. Armelles ◽  
T. Utzmeier ◽  
J. Anguita ◽  
F. Briones

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