Electrical Resistance of Single-Crystal Single-Domain Chromium from 77 to 325 °K

1971 ◽  
Vol 4 (3) ◽  
pp. 988-991 ◽  
Author(s):  
W. B. Muir ◽  
J. O. Ström-Olsen
1994 ◽  
Vol 65 (9) ◽  
pp. 1106-1108 ◽  
Author(s):  
Z. Li ◽  
C. M. Foster ◽  
D. Guo ◽  
H. Zhang ◽  
G. R. Bai ◽  
...  

Author(s):  
Timothy S. English ◽  
Leslie M. Phinney ◽  
Patrick E. Hopkins ◽  
Justin R. Serrano

Accurate thermal conductivity values are essential to the modeling, design, and thermal management of microelectromechanical systems (MEMS) and devices. However, the experimental technique best suited to measure thermal conductivity, as well as thermal conductivity itself, varies with the device materials, fabrication conditions, geometry, and operating conditions. In this study, the thermal conductivity of boron doped single-crystal silicon-on-insulator (SOI) microbridges is measured over the temperature range from 77 to 350 K. The microbridges are 4.6 mm long, 125 μm tall, and two widths, 50 or 85 μm. Measurements on the 85 μm wide microbridges are made using both steady-state electrical resistance thermometry and optical time-domain thermoreflectance. A thermal conductivity of ∼ 77 W/mK is measured for both microbridge widths at room temperature, where both experimental techniques agree. However, a discrepancy at lower temperatures is attributed to differences in the interaction volumes and in turn, material properties, probed by each technique. This finding is qualitatively explained through Boltzmann transport equation modeling under the relaxation time approximation.


2016 ◽  
Vol 119 (13) ◽  
pp. 135903 ◽  
Author(s):  
Takaki Muramatsu ◽  
Lev V. Gasparov ◽  
Helmuth Berger ◽  
Russell J. Hemley ◽  
Viktor V. Struzhkin

2016 ◽  
Vol 496 (1) ◽  
pp. 149-156 ◽  
Author(s):  
E. A. Kolchina ◽  
M. M. Neradovskiy ◽  
V. A. Shikhova ◽  
D.V. Pelegov ◽  
V. Ya. Shur ◽  
...  

2012 ◽  
Vol 100 (24) ◽  
pp. 242905 ◽  
Author(s):  
Matthias Dietze ◽  
Hannelore Katzke ◽  
M. Es-Souni ◽  
Norbert Neumann ◽  
Hao-Su Luo

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