Noble-gas ion sputtering yield of gold and copper: Dependence on the energy and angle of incidence of the projectiles

1987 ◽  
Vol 35 (5) ◽  
pp. 2198-2204 ◽  
Author(s):  
A. Oliva-Florio ◽  
R. A. Baragiola ◽  
M. M. Jakas ◽  
E. V. Alonso ◽  
J. Ferrón
1981 ◽  
Vol 103 ◽  
pp. 339-343 ◽  
Author(s):  
J. Bohdansky ◽  
G.L. Chen ◽  
W. Eckstein ◽  
J. Roth

1995 ◽  
Vol 407 ◽  
Author(s):  
A.-L. Barabási ◽  
R. Cuerno

ABSTRACTRecently a number of experimental studies focusing on the scaling properties of surfaces eroded by ion bombardment provided apparently contradictory results. A number of experiments report the observation of self-affine fractal surfaces, while others provide evidence about the development of a non-fractal periodic ripple structure. To explain these discrepancies, here we derive a stochastic nonlinear equation that describes the evolution and scaling properties of surfaces eroded by ion bombardment. The coefficients appearing in the equation can be calculated explicitly in terms of the physical parameters characterizing the sputtering process. We find that transitions may take place between various scaling behaviors when experimental parameters, such as the angle of incidence of the incoming ions or their average penetration depth, are varied.


1977 ◽  
Vol 30 (6) ◽  
pp. 268-271 ◽  
Author(s):  
J. F. Ziegler ◽  
J. J. Cuomo ◽  
J. Roth

1997 ◽  
Vol 27 (4) ◽  
pp. 569-574 ◽  
Author(s):  
P Wetz ◽  
W Krüger ◽  
A Scharmann ◽  
K.-H Schartner

1981 ◽  
Vol 7 ◽  
Author(s):  
G. W. Reynolds ◽  
F. R. Vozzo ◽  
R. G. Alias ◽  
A. R. Knudson ◽  
J. M. Lambert ◽  
...  

ABSTRACTThin surface copper-nickel alloys were prepared by ion implantation at 90 keV. During the implantation of one pure element by the other the sputtered products were collected on catcher foils at different stages from the beginning of the implant through to the steady state configuration of the target surface. The collector foils and targets were analyzed to determine the behavior of the sputtering yields during implantation and for the change in surface composition at the selected fluence. The total sputtering yield for the target and the effective elemental sputtering yields for each component appear to be functions of the changing surface fractions, the self ion sputtering yield of the implanted species, and the elemental sputtering yield of the initial target species. A model relating these parameters is presented.


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