Energy dependence of the optical matrix element in hydrogenated amorphous and crystalline silicon

1985 ◽  
Vol 31 (8) ◽  
pp. 5187-5198 ◽  
Author(s):  
W. B. Jackson ◽  
S. M. Kelso ◽  
C. C. Tsai ◽  
J. W. Allen ◽  
S.-J. Oh
Keyword(s):  
Matrix Element ◽  
Energy Dependence ◽  
Crystalline Silicon ◽  
Optical Matrix Element ◽  
Hydrogenated Amorphous

scholarly journals High quality crystalline silicon surface passivation by combined intrinsic and n-type hydrogenated amorphous silicon

2011 ◽  
Vol 99 (20) ◽  
pp. 203503 ◽  
Author(s):  
Jan-Willem A. Schüttauf ◽  
Karine H. M. van der Werf ◽  
Inge M. Kielen ◽  
Wilfried G. J. H. M. van Sark ◽  
Jatindra K. Rath ◽  
...  
Keyword(s):  
Amorphous Silicon ◽  
Silicon Surface ◽  
Surface Passivation ◽  
Crystalline Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
High Quality ◽  
Hydrogenated Amorphous ◽  
Silicon Surface Passivation

Influence of hydrogen concentration on void-related microstructure in low hydrogen amorphous and crystalline silicon materials

2014 ◽  
Vol 92 (7/8) ◽  
pp. 700-704 ◽  
Author(s):  
W. Beyer ◽  
U. Breuer ◽  
R. Carius ◽  
W. Hilgers ◽  
D. Lennartz ◽  
...  
Keyword(s):  
Hydrogen Concentration ◽  
Amorphous Materials ◽  
Low Dose ◽  
Concentration Level ◽  
Crystalline Silicon ◽  
High Deposition Temperature ◽  
Diffusion Paths ◽  
Silicon Materials ◽  
Amorphous Si ◽  
Hydrogenated Amorphous

The influence of implanted hydrogen (up to a concentration level of 3 at. %) on the microstructure of silicon (Si) materials is investigated by Fourier transform infrared spectroscopy as well as by effusion of hydrogen and of (low dose) implanted helium. Three materials of low original hydrogen concentration, crystalline Si, electron beam evaporated amorphous Si, and plasma-deposited hydrogenated amorphous Si (using high deposition temperature) were investigated. Significant differences between crystalline and amorphous materials were observed. In crystalline Si, implanted hydrogen is found to generate multivacancies that trap diffusing helium while this is not the case in amorphous Si. Accordingly, cavities where hydrogen is located in amorphous Si must be smaller than divacancies. Those cavities in amorphous Si, present from the growth process, that trap helium tend to disappear when the implanted hydrogen concentration increases. Annealing of the materials up to temperatures of 575 °C was also studied. No significant change in the density of voids (trapping helium) occur but in case of crystalline Si the bonding sites of hydrogen as well as the diffusion paths of helium change.

scholarly journals Light trapping in hydrogenated amorphous and nano-crystalline silicon thin film solar cells

2009 ◽  
Vol 1153 ◽  
Author(s):  
Jeffrey Yang ◽  
Baojie Yan ◽  
Guozhen Yue ◽  
Subhendu Guha
Keyword(s):  
Stainless Steel ◽  
Solar Cells ◽  
Triple Junction ◽  
Crystalline Silicon ◽  
Light Trapping ◽  
Nano Crystalline ◽  
Back Reflectors ◽  
Back Reflector ◽  
Junction Structure ◽  
Hydrogenated Amorphous

AbstractLight trapping effect in hydrogenated amorphous silicon-germanium alloy (a-SiGe:H) and nano-crystalline silicon (nc-Si:H) thin film solar cells deposited on stainless steel substrates with various back reflectors is reviewed. Structural and optical properties of the Ag/ZnO back reflectors are systematically characterized and correlated to solar cell performance, especially the enhancement in photocurrent. The light trapping method used in our current production lines employing an a-Si:H/a-SiGe:H/a-SiGe:H triple-junction structure consists of a bi-layer of Al/ZnO back reflector with relatively thin Al and ZnO layers. Such Al/ZnO back reflectors enhance the short-circuit current density, Jsc, by ˜20% compared to bare stainless steel. In the laboratory, we use Ag/ZnO back reflector for higher Jsc and efficiency. The gain in Jsc is about ˜30% for an a-SiGe:H single-junction cell used in the bottom cell of a multi-junction structure. In recent years, we have also worked on the optimization of Ag/ZnO back reflectors for nano-crystalline silicon (nc-Si:H) solar cells. We have carried out a systematic study on the effect of texture for Ag and ZnO. We found that for a thin ZnO layer, a textured Ag layer is necessary to increase Jsc, even though the parasitic loss is higher at the Ag and ZnO interface due to the textured Ag. However, a flat Ag can be used for a thick ZnO to reduce the parasitic loss, while the light scattering is provided by the textured ZnO. The gain in Jsc for nc-Si:H solar cells on Ag/ZnO back reflectors is in the range of ˜60-75% compared to cells deposited on bare stainless steel, which is much larger than the enhancement observed for a-SiGe:H cells. The highest total current density achieved in an a-Si:H/a-SiGe:H/nc-Si:H triple-junction structure on Ag/ZnO back reflector is 28.6 mA/cm2, while it is 26.9 mA/cm2 for a high efficiency a-Si:H/a-SiGe:H/a-SiGe:H triple-junction cell.

scholarly journals Effect of Hydrogen Content in Intrinsic a-Si:H on Performances of Heterojunction Solar Cells

2013 ◽  
Vol 2013 ◽  
pp. 1-6 ◽  
Author(s):  
Yun-Shao Cho ◽  
Chia-Hsun Hsu ◽  
Shui-Yang Lien ◽  
Dong-Sing Wuu ◽  
In-Cha Hsieh
Keyword(s):  
Solar Cells ◽  
Hydrogen Content ◽  
Crystalline Silicon ◽  
Phase Particle ◽  
Optical Emission ◽  
Point Of View ◽  
Experimental Result ◽  
Heterojunction Solar Cells ◽  
Hydrogenated Amorphous ◽  
Silane Plasma

Influences of hydrogen content in intrinsic hydrogenated amorphous silicon (i-a-Si:H) on performances of heterojunction (HJ) solar cells are investigated. The simulation result shows that in the range of 0–18% of the i-layer hydrogen content, solar cells with higher i-layer hydrogen content can have higher degree of dangling bond passivation on single crystalline silicon (c-Si) surface. In addition, the experimental result shows that HJ solar cells with a low hydrogen content have a poor a-Si:H/c-Si interface. The deteriorate interface is assumed to be attributed to (i) voids created by insufficiently passivated c-Si surface dangling bonds, (ii) voids formed by SiH2clusters, and (iii) Si particles caused by gas phase particle formation in silane plasma. The proposed assumption is well supported and explained from the plasma point of view using optical emission spectroscopy.

Hall-Effect and Sign Properties in Hydrogenated Amorphous and Disordered Crystalline Silicon

1996 ◽  
Vol 420 ◽  
Author(s):  
C. E. Nebel ◽  
M. Rother ◽  
C. Summonte ◽  
M. Heintze ◽  
M. Stutzmann
Keyword(s):  
Hall Effect ◽  
Amorphous Silicon ◽  
Volume Fraction ◽  
Crystalline Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Small Volume Fraction ◽  
Phosphorus Doped ◽  
Hydrogenated Amorphous ◽  
Defect Densities ◽  
Very High

AbstractHall experiments on a series of microcrystalline, microcrystalline-amorphous, amorphous and crystalline silicon samples with varying defect densities are presented and discussed. Normal Hall effect signatures on boron and phosphorus doped hydrogenated amorphous silicon are detected. We interpret these results to be due to a small volume fraction of nanocrystalline Si, which falls below the detection limits of Raman experiments. Hydrogenated amorphous silicon, prepared under conditions far away from microcrystalline growth, shows the known double sign anomaly, Sign reversals in c-Si, where the disorder is increased by Si implantation up to very high levels, could not be detected.

Sign in / Sign up

Export Citation Format

Share Document