Total Reflection of X-Rays from Nickel Films Part II

1929 ◽  
Vol 33 (4) ◽  
pp. 463-466 ◽  
Author(s):  
Hiram W. Edwards
Keyword(s):  
Total Reflection ◽  
X Rays ◽  
Nickel Films

Total Reflection of X-Rays from Nickel Films of Various Thicknesses

1928 ◽  
Vol 32 (5) ◽  
pp. 712-714 ◽  
Author(s):  
Hiram W. Edwards
Keyword(s):  
Total Reflection ◽  
X Rays ◽  
Nickel Films

Contribution of x-ray total reflection to the background intensity in EPMA

1990 ◽  
Vol 48 (2) ◽  
pp. 202-203
Author(s):  
Werner P. Rehbach ◽  
Peter Karduck
Keyword(s):  
Atomic Number ◽  
Target Material ◽  
Total Reflection ◽  
Background Intensity ◽  
X Rays ◽  
Characteristic Radiation ◽  
X Ray

In the EPMA of soft x rays anomalies in the background are found for several elements. In the literature extremely high backgrounds in the region of the OKα line are reported for C, Al, Si, Mo, and Zr. We found the same effect also for Boron (Fig. 1). For small glancing angles θ, the background measured using a LdSte crystal is significantly higher for B compared with BN and C, although the latter are of higher atomic number. It would be expected, that , characteristic radiation missing, the background IB (bremsstrahlung) is proportional Zn by variation of the atomic number of the target material. According to Kramers n has the value of unity, whereas Rao-Sahib and Wittry proposed values between 1.12 and 1.38 , depending on Z, E and Eo. In all cases IB should increase with increasing atomic number Z. The measured values are in discrepancy with the expected ones.

How to Use the Features of Total Reflection of X-Rays for Energy Dispersive XRF

1988 ◽  
Vol 32 ◽  
pp. 105-114 ◽  
Author(s):  
H. Schwenke ◽  
W. Berneike ◽  
J. Knoth ◽  
U. Weisbrod
Keyword(s):  
Thin Films ◽  
Penetration Depth ◽  
Fluorescence Analysis ◽  
Total Reflection ◽  
X Rays ◽  
X Ray ◽  
Characteristic Features ◽  
Respective Characteristic ◽  
Nanometer Regime ◽  
Sensitive Method

AbstractThe total reflection of X-rays is mainly determined by three parameters , that is the orltical angle, the reflectivity and the penetration depth. For X-ray fluorescence analysis the respective characteristic features can be exploited in two rather different fields of application. In the analysis of trace elements in samples placed as thin films on optical flats, detection limits as low as 2 pg or 0.05 ppb, respectively, have been obtained. In addition, a penetration depth in the nanometer regime renders Total Reflection XRF an inherently sensitive method for the elemental analysis of surfaces. This paper outlines the main physical and constructional parameters for instrumental design and quantitation in both branches of TXRF.

X–ray absorption fine structure (XAFS) of Si wafer measured using total reflection X–rays

1999 ◽  
Vol 54 (1) ◽  
pp. 215-222 ◽  
Author(s):  
Jun Kawai ◽  
Shinjiro Hayakawa ◽  
Yoshinori Kitajima ◽  
Yohichi Gohshi
Keyword(s):  
Fine Structure ◽  
Total Reflection ◽  
X Rays ◽  
X Ray ◽  
Absorption Fine ◽  
X Ray Absorption ◽  
Si Wafer

Total reflection and surface scattering of soft X-rays on the Si-SiO2system and hexagonal BN crystal

1995 ◽  
Vol 7 (14) ◽  
pp. 2731-2744 ◽  
Author(s):  
E Filatova ◽  
A Stepanov ◽  
C Blessing ◽  
J Friedrich ◽  
R Barchewitz ◽  
...  
Keyword(s):  
Total Reflection ◽  
Surface Scattering ◽  
X Rays

scholarly journals Nanofocusing Optics for an X-Ray Free-Electron Laser Generating an Extreme Intensity of 100 EW/cm2 Using Total Reflection Mirrors

2020 ◽  
Vol 10 (7) ◽  
pp. 2611
Author(s):  
Hirokatsu Yumoto ◽  
Yuichi Inubushi ◽  
Taito Osaka ◽  
Ichiro Inoue ◽  
Takahisa Koyama ◽  
...  
Keyword(s):  
Photon Energy ◽  
Pulse Energy ◽  
Free Electron ◽  
Free Electron Laser ◽  
Total Reflection ◽  
Experimental Chamber ◽  
X Rays ◽  
X Ray ◽  
Set Up ◽  
Focused Beam

A nanofocusing optical system—referred to as 100 exa—for an X-ray free-electron laser (XFEL) was developed to generate an extremely high intensity of 100 EW/cm2 (1020 W/cm2) using total reflection mirrors. The system is based on Kirkpatrick-Baez geometry, with 250-mm-long elliptically figured mirrors optimized for the SPring-8 Angstrom Compact Free-Electron Laser (SACLA) XFEL facility. The nano-precision surface employed is coated with rhodium and offers a high reflectivity of 80%, with a photon energy of up to 12 keV, under total reflection conditions. Incident X-rays on the optics are reflected with a large spatial acceptance of over 900 μm. The focused beam is 210 nm × 120 nm (full width at half maximum) and was evaluated at a photon energy of 10 keV. The optics developed for 100 exa efficiently achieved an intensity of 1 × 1020 W/cm2 with a pulse duration of 7 fs and a pulse energy of 150 μJ (25% of the pulse energy generated at the light source). The experimental chamber, which can provide different stage arrangements and sample conditions, including vacuum environments and atmospheric-pressure helium, was set up with the focusing optics to meet the experimental requirements.

Measurements of Soft and Ultrasoft X-Rays with Total Reflection Monochromator

1986 ◽  
Vol 30 ◽  
pp. 213-223
Author(s):  
Tomoya Arai
Keyword(s):  
Gas Flow ◽  
Bragg Reflection ◽  
Optical Resolution ◽  
Fluorescence Analysis ◽  
Total Reflection ◽  
X Rays ◽  
Light Elements ◽  
Lower Intensity ◽  
Measured Intensity ◽  
X Ray

The development of X-ray spectrographic analysis of light elements, which are O, C and B, has bee n performed for many applications using an end-window type X-ray tube with Rh-target and thin Be-window, wavelength dispersing devices, which are synthetic multilayers or total reflection mirror (with a specific filter) and a gas flow proportional counter with a thin film window. In Fig. 1 factors related to the intensity measurements in X-ray fluorescence analysis are shown. The excitation efficiency in the soft and ultrasoft X-ray region is very low because of the lower intensity of primary X-rays and low fluorescence yield of light elements. Instead of the wavelength dispersive method of Bragg reflection, having high resolution and low reflectivity, monochromatization combining total reflection by a selected mirror and an appropriate filter offered an alternate approach in order to increase measured intensity with reasonable optical resolution. Synthetic multilayers which have higher resolution and lower intensity compared with the performance of the mirror method have become popular for the detection of soft and ultrasoft X-ray region.

Study of organic films by using total reflection of X-rays

1993 ◽  
Vol 61 (1-2) ◽  
pp. 195-198 ◽  
Author(s):  
Yu. Emelyanov ◽  
V. Khat'ko ◽  
A. Lunevich ◽  
I. Globa
Keyword(s):  
Total Reflection ◽  
Organic Films ◽  
X Rays
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