Large-Strain Dependence of the Acceptor Binding Energy in Germanium

1962 ◽  
Vol 128 (1) ◽  
pp. 68-75 ◽  
Author(s):  
John J. Hall
2014 ◽  
Vol 11 (17) ◽  
pp. 20140707-20140707 ◽  
Author(s):  
Hiroki Ujihara ◽  
Neisei Hayashi ◽  
Marie Tabaru ◽  
Yosuke Mizuno ◽  
Kentaro Nakamura

2008 ◽  
Vol 93 (14) ◽  
pp. 141104 ◽  
Author(s):  
A. Sedhain ◽  
T. M. Al Tahtamouni ◽  
J. Li ◽  
J. Y. Lin ◽  
H. X. Jiang

2002 ◽  
Vol 92 (10) ◽  
pp. 6039-6042 ◽  
Author(s):  
W. M. Zheng ◽  
M. P. Halsall ◽  
P. Harmer ◽  
P. Harrison ◽  
M. J. Steer

1994 ◽  
Vol 339 ◽  
Author(s):  
Yoshihiro Ueta ◽  
Shiro Sakai ◽  
Yasushi Kamiya ◽  
Hisao Sato

ABSTRACTThe acceptor binding energy is calculated to find out the best acceptor impurity in InN, GaN and AlN. Be is predicted to be the shallowest acceptor and the next are Mg and Zn. Group IV elements such as C or Si are very deep. Band lineup is calculated to be ΔEc : ΔEv = 2.1 eV : 0.76 eV = 0.73 : 0.27 = 2.8 : 1 for GaN/AlN and ΔEc : ΔEv = 0.88 eV : 0.66 eV = 0.57 : 0.43 = 1.3 : 1 for GaN/InN. GaN is grown on GaAs and GaP-coated Si substrate by MOCVD. GaAs intermediate layer gives better GaN compared to GaP intermediate layer. It is suggested that the lower bulk modulus of GaAs than that of GaP gives this difference.


2004 ◽  
Vol 1 (4) ◽  
pp. 973-976
Author(s):  
Le Van Khoi ◽  
J. Kossut ◽  
H. Kępa ◽  
T. M. Giebułtowicz ◽  
R. R. Gałązka

2000 ◽  
Vol 75 (2-3) ◽  
pp. 204-206
Author(s):  
Jian-Bai Xia ◽  
K.W Cheah ◽  
Xiao-Liang Wang ◽  
Dian-Zhao Sun ◽  
Mei-Ying Kong

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