scholarly journals Evaluation of Acceptor Binding Energy of Nitrogen-Doped Zinc Oxide Thin Films Grown by Dielectric Barrier Discharge in Pulsed Laser Deposition

2011 ◽  
Vol 12 (5) ◽  
pp. 200-203 ◽  
Author(s):  
Deuk-Hee Lee ◽  
Yoon-Soo Chun ◽  
Sang-Yeol Lee ◽  
Sang-Sig Kim
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Binding Energy ◽  
Dielectric Barrier Discharge ◽  
Barrier Discharge ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Dielectric Barrier ◽  
Nitrogen Doped ◽  
Acceptor Binding Energy

scholarly journals Positioning of the Precursor Gas Inlet in an Atmospheric Dielectric Barrier Reactor, and its Effect on the Quality of Deposited TiOx Thin Film Surface

10.14311/1767 ◽  
2013 ◽  
Vol 53 (2) ◽  
Author(s):  
Jan Píchal ◽  
Julia Klenko
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Dielectric Barrier Discharge ◽  
Atmospheric Pressure ◽  
Barrier Discharge ◽  
Film Surface ◽  
Dielectric Barrier ◽  
Thin Film Surface ◽  
Atmospheric Dielectric Barrier Discharge

Thin film technology has become pervasive in many applications in recent years, but it remains difficult to select the best deposition technique. A further consideration is that, due to ecological demands, we are forced to search for environmentally benign methods. One such method might be the application of cold plasmas, and there has already been a rapid growth in studies of cold plasma techniques. Plasma technologies operating at atmospheric pressure have been attracting increasing attention. The easiest way to obtain low temperature plasma at atmospheric pressure seems to be through atmospheric dielectric barrier discharge (ADBD). We used the plasma enhanced chemical vapour deposition (PECVD) method applying atmospheric dielectric barrier discharge (ADBD) plasmafor TiOx thin films deposition, employing titanium isopropoxide (TTIP) and oxygen as reactants, and argon as a working gas. ADBD was operated in filamentary mode. The films were deposited on glass. We studied the quality of the deposited TiOx thin film surface for various precursor gas inlet positions in the ADBD reactor. The best thin films quality was achieved when the precursor gases were brought close to the substrate surface directly through the inlet placed in one of the electrodes.High hydrophilicity of the samples was proved by contact angle tests (CA). The film morphology was tested by atomic force microscopy (AFM). The thickness of the thin films varied in the range of (80 ÷ 210) nm in dependence on the composition of the reactor atmosphere. XPS analyses indicate that composition of the films is more like the composition of TiOxCy.

Paramagnetic dysprosium-doped zinc oxide thin films grown by pulsed-laser deposition

2015 ◽  
Vol 117 (21) ◽  
pp. 213911 ◽  
Author(s):  
Fang-Yuh Lo ◽  
Yi-Chieh Ting ◽  
Kai-Chieh Chou ◽  
Tsung-Chun Hsieh ◽  
Cin-Wei Ye ◽  
...  
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Oxide Thin Films

Electrical conductivity mechanisms in zinc oxide thin films deposited by pulsed laser deposition using different growth environments

2006 ◽  
Vol 515 (4) ◽  
pp. 2379-2386 ◽  
Author(s):  
S.P. Heluani ◽  
G. Braunstein ◽  
M. Villafuerte ◽  
G. Simonelli ◽  
S. Duhalde
Keyword(s):  
Thin Films ◽  
Electrical Conductivity ◽  
Zinc Oxide ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Oxide Thin Films

Characterization of zinc oxide thin films prepared by pulsed laser deposition at room temperature

2008 ◽  
Vol 202 (22-23) ◽  
pp. 5467-5470 ◽  
Author(s):  
Norihiro Sakai ◽  
Yoshihiro Umeda ◽  
Fumiaki Mitsugi ◽  
Tomoaki Ikegami
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Pulsed Laser Deposition ◽  
Room Temperature ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Oxide Thin Films

Pulsed laser deposition of zinc oxide luminescent thin films

2001 ◽  
Vol 19 (3) ◽  
pp. 1082 ◽  
Author(s):  
Jue Wei ◽  
Binglin Zhang ◽  
Ning Yao ◽  
Xiaoping Wang ◽  
Huizhong Ma ◽  
...  
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition

Optical properties of amorphous indium zinc oxide thin films synthesized by pulsed laser deposition

2014 ◽  
Vol 306 ◽  
pp. 52-55 ◽  
Author(s):  
V. Craciun ◽  
C. Martin ◽  
G. Socol ◽  
D. Tanner ◽  
H.C. Swart ◽  
...  
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Optical Properties ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Oxide Thin Films ◽  
Indium Zinc Oxide
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