scholarly journals Electric shielding films for biased TEM samples and their application to in situ electron holography

Microscopy ◽  
2018 ◽  
Vol 67 (3) ◽  
pp. 178-186 ◽  
Author(s):  
Yuki Nomura ◽  
Kazuo Yamamoto ◽  
Tsukasa Hirayama ◽  
Koh Saitoh
Keyword(s):  
Electron Holography ◽  
Electric Shielding

In Situ Electron Holography and EELS of Hetero-Interfaces in Solid Oxide Fuel Cells

2012 ◽  
Vol 18 (S2) ◽  
pp. 1292-1293 ◽  
Author(s):  
T. Tanji ◽  
A.H. Tavabi
Keyword(s):  
Fuel Cells ◽  
Solid Oxide Fuel Cells ◽  
Solid Oxide ◽  
Electron Holography ◽  
Oxide Fuel

Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA, July 29 – August 2, 2012.

scholarly journals Direct Observation of Nanoscale Magnetization Reversal and Spin Dynamics Using In-Situ Lorentz Microscopy and Electron Holography

2010 ◽  
Vol 16 (S2) ◽  
pp. 576-577
Author(s):  
L Huang ◽  
Y Zhu
Keyword(s):  
Direct Observation ◽  
Magnetization Reversal ◽  
Spin Dynamics ◽  
Electron Holography ◽  
Lorentz Microscopy

Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010.

scholarly journals Redox Reactions in An YSZ/Pt Interface- An In-situ Electron Holography and EELS Study

2011 ◽  
Vol 17 (S2) ◽  
pp. 484-485 ◽  
Author(s):  
A Tavabi ◽  
T Tanji
Keyword(s):  
Redox Reactions ◽  
Electron Holography

Extended abstract of a paper presented at Microscopy and Microanalysis 2011 in Nashville, Tennessee, USA, August 7–August 11, 2011.

scholarly journals In-Situ Electrical Biasing of Electrically Connected TEM Lamellae with Embedded Nanodevices

2021 ◽  
Author(s):  
Maria Brodovoi ◽  
Kilian Gruel ◽  
Lucas Chapuis ◽  
Aurélien Masseboeuf ◽  
Cécile Marcelot ◽  
...  
Keyword(s):  
Electric Fields ◽  
High Performance ◽  
Low Cost ◽  
Electron Holography ◽  
Device Architecture ◽  
Quantitative Studies ◽  
Transmission Electron ◽  
Microelectronics Industry

Abstract In response to a continually rising demand for high performance and low-cost devices, and equally driven by competitivity, the microelectronics industry excels in meeting innovation challenges and further miniaturizing products. However, device shrinkage and the increasing complexity of device architecture require local quantitative studies. In this paper, we demonstrate with a case study on a nanocapacitor, the capability of transmission electron microscopy in electron holography mode to be a unique in-situ technique for mapping electric fields and charge distributions on a single device.

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