Erratum: “Vertical GaN p+-n junction diode with ideal avalanche capability grown by halide vapor phase epitaxy” [Appl. Phys. Lett. 119, 152102 (2021)]
Keyword(s):
2004 ◽
Vol 43
(2)
◽
pp. 534-535
◽
2002 ◽
Vol 14
(13-14)
◽
pp. 991-993
◽