scholarly journals Activation energy of silicon diffusion in gallium oxide: Roles of the mediating defects charge states and phase modification

2021 ◽  
Vol 119 (18) ◽  
pp. 182103
Author(s):  
Alexander Azarov ◽  
Vishnukanthan Venkatachalapathy ◽  
Lasse Vines ◽  
Edouard Monakhov ◽  
In-Hwan Lee ◽  
...  
Keyword(s):  
Activation Energy ◽  
Gallium Oxide ◽  
Phase Modification ◽  
Charge States ◽  
Silicon Diffusion

Oxygen diffusion in amorphous and partially crystalline gallium oxide

2019 ◽  
Vol 21 (8) ◽  
pp. 4268-4275 ◽  
Author(s):  
Alexandra von der Heiden ◽  
Manuel Bornhöfft ◽  
Joachim Mayer ◽  
Manfred Martin
Keyword(s):  
Activation Energy ◽  
Diffusion Coefficients ◽  
Low Temperatures ◽  
Oxygen Diffusion ◽  
Gallium Oxide ◽  
Tracer Diffusion ◽  
Tof Sims ◽  
Tracer Diffusion Coefficients ◽  
Oxygen Tracer

We established a TTT diagram of crystallisation of gallium oxide. Determination of oxygen tracer diffusion coefficients by IEDP/ToF-SIMS allowed us to access the activation energy for amorphous GaO1.5 at low temperatures.

scholarly journals Структура и свойства пленок оксида галлия, полученных высокочастотным магнетронным напылением

2019 ◽  
Vol 53 (3) ◽  
pp. 411
Author(s):  
В.М. Калыгина ◽  
Т.З. Лыгденова ◽  
В.А. Новиков ◽  
Ю.С. Петрова ◽  
А.В. Цымбалов ◽  
...  
Keyword(s):  
Activation Energy ◽  
Gallium Oxide ◽  
Oxygen Plasma ◽  
Oxide Films ◽  
Wavelength Region ◽  
Ultraviolet Region ◽  
Substrate Plane ◽  
Sapphire Substrates ◽  
Solar Blind ◽  
C 30

AbstractThe properties of gallium-oxide films produced by the radio-frequency magnetron-assisted sputtering of a β-Ga_2O_3 target with deposition onto sapphire substrates are studied. The as-deposited gallium-oxide films are polycrystalline and contain crystallites of the α and β phases. Exposure to oxygen plasma does not bring about the appearance of new crystallites but makes crystallites several times larger in average dimensions in the substrate plane. After annealing at 900°C, the crystallite size becomes twice as large as that in the unannealed film. The films not subjected to thermal annealing exhibit a high resistance at 20°C. In the range of 50–500°C, the conductivity of the samples ( G ) only slightly depends on temperature ( T ) and, as T is elevated further, exponentially increases with the activation energy 0.7–1.0 eV. After annealing of the films in argon at 900°C (30 min), the conductivity G starts to sharply increase at T ≈ 350°C. In the dependence of ln G on T   ^–1, a maximum in the range of 470–520°C and a portion of decreasing conductivity at higher temperatures are observed. The unusual temperature dependence of the conductivity after annealing is attributed to a change in the structure and phase composition of polycrystalline gallium-oxide films and, possibly, to some effects at the surface. The structures produced on insulating substrates are solar blind in the visible wavelength region and sensitive to radiation in the ultraviolet region (222 nm).

scholarly journals THERMAL ACTIVATION ENERGY OF HOPPING ε2-CONDUCTION VIA BORON ATOMS IN WEAKLY COMPENSATED SILICON

2018 ◽  
Vol 62 (4) ◽  
pp. 406-414
Author(s):  
Nikolai A. Poklonski ◽  
Sergey A. Vyrko ◽  
Alexander I. Kovalev
Keyword(s):  
Activation Energy ◽  
Charge State ◽  
Energy Gap ◽  
Average Distance ◽  
Energy Levels ◽  
Band Shift ◽  
Impurity Atoms ◽  
V Band ◽  
Silicon Crystals ◽  
Charge States

The insulating side of the concentration insulator–metal phase transition (Mott’s transition) in p-type silicon crystals doped with acceptor (boron atoms) is considered under the conditions of stationary hopping electrical conduction. The boron atoms substitute silicon atoms in the crystal lattice and can be in one of the three charge states (−1, 0, +1), while the compensating impurity (donors) is in the charge state (+1). The distribution of impurity atoms is supposed to be random (Poisson’s distribution). The A0-band is formed from the energy levels of boron atoms in the charge states (0) and (−1), while the A+-band is formed from the energy levels of boron atoms in the charge states (+1) and (0). The decrease in the activation energy ε2 of thermally assisted tunneling transitions (hops) of holes between electrically neutral boron atoms, i. e. boron atoms that are in the charge state (0), is calculated. The ε2 quantity is approximately equal to an energy gap between A0- and A+-bands, i. e. Hubbard’s gap. In the quasi-classical approximation it is shown that the narrowing of the energy gap between A0- and A+-bands occurs due to: (i) the formation of a quasi-continuous band of allowed energy values for v-band holes from excited quantum states of boron atoms in the charge state (0), thus the value of the v-band shift into the band gap is determined by a maximum radius of the hole orbit in a boron atom, which does not exceed the half of the average distance between the nearest impurity atoms, and (ii) the splitting of the ground (non-excited) energy levels of the “molecular” pairs of boron atoms in the charge states (0) into triplet and singlet states of two holes. Calculations of ε2 without any adjustable parameters are quantitatively agree with the known experimental data on p-Si:B.

Structural aspects of silicon diffusion in quaternary III-V thin-film semiconductors

1991 ◽  
Vol 49 ◽  
pp. 850-851
Author(s):  
F. A. Ponce ◽  
R. L. Thornton ◽  
G. B. Anderson
Keyword(s):  
Semiconductor Lasers ◽  
Wide Bandgap ◽  
Semiconductor Diode ◽  
Visible Range ◽  
P System ◽  
Misfit Dislocations ◽  
Lattice Match ◽  
Semiconductor Diode Laser ◽  
Thin Film Semiconductors ◽  
Silicon Diffusion

The InGaAlP quaternary system allows the production of semiconductor lasers emitting light in the visible range of the spectrum. Recent advances in the visible semiconductor diode laser art have established the viability of diode structures with emission wavelengths comparable to the He-Ne gas laser. There has been much interest in the growth of wide bandgap quaternary thin films on GaAs, a substrate most commonly used in optoelectronic applications. There is particular interest in compositions which are lattice matched to GaAs, thus avoiding misfit dislocations which can be detrimental to the lifetime of these materials. As observed in Figure 1, the (AlxGa1-x)0.5In0.5P system has a very close lattice match to GaAs and is favored for these applications.In this work, we have studied the effect of silicon diffusion in GaAs/InGaAlP structures. Silicon diffusion in III-V semiconductor alloys has been found to have an disordering effect which is associated with removal of fine structures introduced during growth. Due to the variety of species available for interdiffusion, the disordering effect of silicon can have severe consequences on the lattice match at GaAs/InGaAlP interfaces.

Sensing of dynamic charge states using single-electron tunneling transistors

1998 ◽  
Vol 168 (2) ◽  
pp. 219
Author(s):  
V.A. Krupenin ◽  
S.V. Lotkhov ◽  
H. Scherer ◽  
A.B. Zorin ◽  
F.-J. Ahlers ◽  
...  
Keyword(s):  
Electron Tunneling ◽  
Single Electron ◽  
Single Electron Tunneling ◽  
Dynamic Charge ◽  
Charge States

Gallium Oxide Schottky Barrier Diodes

2016 ◽  
Vol 136 (4) ◽  
pp. 479-483
Author(s):  
Masataka Higashiwaki ◽  
Kohei Sasaki ◽  
Hisashi Murakami ◽  
Yoshinao Kumagai ◽  
Akito Kuramata
Keyword(s):  
Schottky Barrier ◽  
Gallium Oxide ◽  
Schottky Barrier Diodes

High Temperature n- and p-type Doped Microcrystalline Silicon Layers Grown by VHF PECVD Layer-by-Layer Deposition

2003 ◽  
Vol 762 ◽  
Author(s):  
A. Gordijn ◽  
J.K. Rath ◽  
R.E.I. Schropp
Keyword(s):  
Activation Energy ◽  
High Temperature ◽  
High Temperatures ◽  
Continuous Wave ◽  
Hydrogen Plasma ◽  
Silicon Layer ◽  
Dark Conductivity ◽  
High Deposition Rate ◽  
Layer By Layer ◽  
Microcrystalline Silicon

AbstractDue to the high temperatures used for high deposition rate microcrystalline (μc-Si:H) and polycrystalline silicon, there is a need for compact and temperature-stable doped layers. In this study we report on films grown by the layer-by-layer method (LbL) using VHF PECVD. Growth of an amorphous silicon layer is alternated by a hydrogen plasma treatment. In LbL, the surface reactions are separated time-wise from the nucleation in the bulk. We observed that it is possible to incorporate dopant atoms in the layer, without disturbing the nucleation. Even at high substrate temperatures (up to 400°C) doped layers can be made microcrystalline. At these temperatures, in the continuous wave case, crystallinity is hindered, which is generally attributed to the out-diffusion of hydrogen from the surface and the presence of impurities (dopants).We observe that the parameter window for the treatment time for p-layers is smaller compared to n-layers. Moreover we observe that for high temperatures, the nucleation of p-layers is more adversely affected than for n-layers. Thin, doped layers have been structurally, optically and electrically characterized. The best n-layer made at 400°C, with a thickness of only 31 nm, had an activation energy of 0.056 eV and a dark conductivity of 2.7 S/cm, while the best p-layer made at 350°C, with a thickness of 29 nm, had an activation energy of 0.11 V and a dark conductivity of 0.1 S/cm. The suitability of these high temperature n-layers has been demonstrated in an n-i-p microcrystalline silicon solar cell with an unoptimized μc-Si:H i-layer deposited at 250°C and without buffer. The Voc of the cell is 0.48 V and the fill factor is 70 %.

White- and Brown-Rice Supplementation Improves Insulin Tolerance, Brown Fat Activation, Energy Expenditure, and Changes the Gut Microflora in Diet-Induced Obesity

Diabetes ◽  
2018 ◽  
Vol 67 (Supplement 1) ◽  
pp. 1897-P
Author(s):  
HISASHI YOKOMIZO ◽  
ATSUSHI ISHIKADO ◽  
TAKANORI SHINJO ◽  
KYOUNGMIN PARK ◽  
YASUTAKA MAEDA ◽  
...  
Keyword(s):  
Activation Energy ◽  
Energy Expenditure ◽  
Brown Rice ◽  
Brown Fat ◽  
Gut Microflora ◽  
Diet Induced Obesity ◽  
Insulin Tolerance
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