Intermixing reduction in ultra-thin titanium nitride/hafnium oxide film stacks grown on oxygen-inserted silicon and associated reduction of the interface charge dipole
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2009 ◽
Vol 9
(2)
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pp. 147-162
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2008 ◽
Vol 48
(11-12)
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pp. 1765-1768
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2016 ◽
Vol 45
(4)
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pp. 242-255
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