scholarly journals High internal quantum efficiency of long wavelength InGaN quantum wells

2021 ◽  
Vol 119 (7) ◽  
pp. 071102
Author(s):  
Saulius Marcinkevičius ◽  
Rinat Yapparov ◽  
Yi Chao Chow ◽  
Cheyenne Lynsky ◽  
Shuji Nakamura ◽  
...  
2016 ◽  
Vol 55 (4) ◽  
Author(s):  
Kazimieras Nomeika ◽  
Mantas Dmukauskas ◽  
Ramūnas Aleksiejūnas ◽  
Patrik Ščajev ◽  
Saulius Miasojedovas ◽  
...  

Enhancement of internal quantum efficiency (IQE) in InGaN quantum wells by insertion of a superlattice interlayer and applying the pulsed growth regime is investigated by a set of time-resolved optical techniques. A threefold IQE increase was achieved in the structure with the superlattice. It was ascribed to the net effect of decreased internal electrical field due to lower strain and altered carrier localization conditions. Pulsed MOCVD growth also resulted in twice higher IQE, presumably due to better control of defects in the structure. An LED (light emitting diode) structure with a top p-type contact GaN layer was manufactured by using both growth techniques with the peak IQE equal to that in the underlying quantum well structure. The linear recombination coefficient was found to gradually increase with excitation due to carrier delocalization, and the latter dependence was successfully used to fit the IQE droop.


2007 ◽  
Author(s):  
A. Laubsch ◽  
M. Sabathil ◽  
G. Bruederl ◽  
J. Wagner ◽  
M. Strassburg ◽  
...  

2010 ◽  
Vol 405 (7) ◽  
pp. 1857-1860 ◽  
Author(s):  
E.Y. Lin ◽  
C.Y. Chen ◽  
T.S. Lay ◽  
Z.X. Peng ◽  
T.Y. Lin ◽  
...  

1991 ◽  
Vol 220 ◽  
Author(s):  
V. P. Kesan ◽  
P. G. May ◽  
G. V. Treyz ◽  
E. Bassous ◽  
S. S. Iyer ◽  
...  

ABSTRACTWe have investigated the structural, electrical, and optical quality of epitaxial Si and Si1−xGex films grown by MBE on SIMOX (Separation by IMplanted OXygen) silicon substrates. Epitaxial films grown on these SOI substrates have been characterized using planar and cross-sectional TEM, high resolution X-ray diffraction, SIMS, and Seeco chemical etching to delineate defects. We have fabricated Si/SiGe P-i-N photodetectors integrated with Si waveguides on SOI for long wavelength applications. Low reverse leakage current densities were seen in these device structures. The photodetector exhibited an internal quantum efficiency of 50% at 1.1 μm with a frequency response bandwidth of 2 GHz.


2014 ◽  
Vol 57 (4) ◽  
pp. 533-535 ◽  
Author(s):  
I. S. Romanov ◽  
I. A. Prudaev ◽  
А. А. Marmalyuk ◽  
V. A. Kureshov ◽  
D. R. Sabitov ◽  
...  

2011 ◽  
Vol 19 (S4) ◽  
pp. A991 ◽  
Author(s):  
Hongping Zhao ◽  
Guangyu Liu ◽  
Jing Zhang ◽  
Jonathan D. Poplawsky ◽  
Volkmar Dierolf ◽  
...  

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