scholarly journals Interlayer couplings in silicon/oxide/nitride thin films via laser crystallizations

AIP Advances ◽  
2021 ◽  
Vol 11 (3) ◽  
pp. 035128
Author(s):  
Minyeong Kim ◽  
Min Jin Kang ◽  
Eui Sun Hwang ◽  
Byoung-Ho Cheong
Keyword(s):  
Thin Films ◽  
Silicon Oxide

Facile Fabrication Procedure for C60-Doped Silicon Oxide Thin Films

1997 ◽  
Vol 26 (10) ◽  
pp. 995-996 ◽  
Author(s):  
Isao Hasegawa ◽  
Koji Shibusa ◽  
Satoshi Kobayashi ◽  
Shuichi Nonomura ◽  
Shoji Nitta
Keyword(s):  
Thin Films ◽  
Silicon Oxide ◽  
Oxide Thin Films ◽  
Doped Silicon ◽  
Fabrication Procedure ◽  
Facile Fabrication

Reversibility of pH-Induced Dewetting of Poly(vinyl pyridine) Thin Films on Silicon Oxide Substrate

Langmuir ◽  
2008 ◽  
Vol 24 (11) ◽  
pp. 5903-5910 ◽  
Author(s):  
Ruslan Burtovyy ◽  
Igor Luzinov
Keyword(s):  
Thin Films ◽  
Silicon Oxide ◽  
Vinyl Pyridine ◽  
Oxide Substrate

Residual Stress in Sputtered Silicon Oxycarbide Thin Films

2011 ◽  
Vol 1299 ◽  
Author(s):  
Ping Du ◽  
I-Kuan Lin ◽  
Yunfei Yan ◽  
Xin Zhang
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Elevated Temperatures ◽  
Silicon Oxide ◽  
Composite Films ◽  
Deposition Process ◽  
Silicon Oxycarbide ◽  
X Ray ◽  
Curvature Measurement ◽  
Film Substrate

ABSTRACTSilicon carbide (SiC) has received increasing attention on the integration of microelectro-mechanical system (MEMS) due to its excellent mechanical and chemical stability at elevated temperatures. However, the deposition process of SiC thin films tends to induce relative large residual stress. In this work, the relative low stress material silicon oxide was added into SiC by RF magnetron co-sputtering to form silicon oxycarbide (SiOC) composite films. The composition of the films was characterized by Energy dispersive X-ray (EDX) analysis. The Young’s modulus and hardness of the films were measured by nanoindentation technique. The influence of oxygen/carbon ratio and rapid thermal annealing (RTA) temperature on the residual stress of the composite films was investigated by film-substrate curvature measurement using the Stoney’s equation. By choosing the appropriate composition and post processing, a film with relative low residual stress could be obtained.

Silicon Oxide-Encapsulated Platinum Thin Films as Highly Active Electrocatalysts for Carbon Monoxide and Methanol Oxidation

ACS Catalysis ◽  
2018 ◽  
Vol 8 (12) ◽  
pp. 11423-11434 ◽  
Author(s):  
Jacob E. Robinson ◽  
Natalie Y. Labrador ◽  
Han Chen ◽  
B. Edward Sartor ◽  
Daniel V. Esposito
Keyword(s):  
Thin Films ◽  
Carbon Monoxide ◽  
Methanol Oxidation ◽  
Silicon Oxide ◽  
Highly Active

IR ellipsometry investigations of N2O-nitrided silicon oxide thin films on silicon

1993 ◽  
Vol 234 (1-2) ◽  
pp. 337-341 ◽  
Author(s):  
M. Weidner ◽  
A. Röseler ◽  
M. Eichler
Keyword(s):  
Thin Films ◽  
Silicon Oxide ◽  
Oxide Thin Films

Luminescence of Er-doped silicon oxide–zirconia thin films

2009 ◽  
Vol 129 (7) ◽  
pp. 696-703 ◽  
Author(s):  
Carlos Rozo ◽  
Luis F. Fonseca ◽  
Daniel Jaque ◽  
José García Solé
Keyword(s):  
Thin Films ◽  
Silicon Oxide ◽  
Doped Silicon ◽  
Er Doped

ChemInform Abstract: First Observation of Strained Siloxane Bonds on Silicon Oxide Thin Films.

ChemInform ◽  
2010 ◽  
Vol 24 (41) ◽  
pp. no-no
Author(s):  
C.-M. CHIANG ◽  
B. R. ZEGARSKI ◽  
L. H. DUBOIS
Keyword(s):  
Thin Films ◽  
Silicon Oxide ◽  
Oxide Thin Films

Wear and Nanomechanical Studies of Silicon Oxide and Silicon Nitride Thin Films for MEMS Applications

1998 ◽  
pp. 579-589 ◽  
Author(s):  
Z. Rymuza ◽  
Z. Kusznierewicz ◽  
M. Misiak ◽  
K. Schmidt-Szałowski ◽  
Z. Rżanek-Boroch ◽  
...  
Keyword(s):  
Thin Films ◽  
Silicon Nitride ◽  
Silicon Oxide
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