A dynamic optical constant extraction method for thin films with structural and optical-parametric justifications

2020 ◽  
Vol 128 (19) ◽  
pp. 195301
Author(s):  
M. A. Zubair ◽  
M. T. Chowdhury
Keyword(s):  
Thin Films ◽  
Optical Constant ◽  
Extraction Method ◽  
Optical Parametric

scholarly journals Optical Constant and Conformality Analysis of SiO2 Thin Films Deposited on Linear Array Microstructure Substrate by PECVD

Coatings ◽  
2021 ◽  
Vol 11 (5) ◽  
pp. 510
Author(s):  
Yongqiang Pan ◽  
Huan Liu ◽  
Zhuoman Wang ◽  
Jinmei Jia ◽  
Jijie Zhao
Keyword(s):  
Thin Films ◽  
Film Thickness ◽  
Deposition Rate ◽  
Optical Constant ◽  
Photoelectron Spectroscopy ◽  
Linear Array ◽  
Chemical Vapor ◽  
Rf Plasma ◽  
X Ray ◽  
Sio2 Thin Film

SiO2 thin films are deposited by radio frequency (RF) plasma-enhanced chemical vapor deposition (PECVD) technique using SiH4 and N2O as precursor gases. The stoichiometry of SiO2 thin films is determined by the X-ray photoelectron spectroscopy (XPS), and the optical constant n and k are obtained by using variable angle spectroscopic ellipsometer (VASE) in the spectral range 380–1600 nm. The refractive index and extinction coefficient of the deposited SiO2 thin films at 500 nm are 1.464 and 0.0069, respectively. The deposition rate of SiO2 thin films is controlled by changing the reaction pressure. The effects of deposition rate, film thickness, and microstructure size on the conformality of SiO2 thin films are studied. The conformality of SiO2 thin films increases from 0.68 to 0.91, with the increase of deposition rate of the SiO2 thin film from 20.84 to 41.92 nm/min. The conformality of SiO2 thin films decreases with the increase of film thickness, and the higher the step height, the smaller the conformality of SiO2 thin films.

Optical Constant and Dielectric Properties of Erbium Oxide Thin Films

2009 ◽  
Vol 29 (6) ◽  
pp. 1724-1728
Author(s):  
刘传标 Liu Chuanbiao ◽  
魏爱香 Wei Aixiang ◽  
刘毅 Liu Yi
Keyword(s):  
Thin Films ◽  
Dielectric Properties ◽  
Optical Constant ◽  
Erbium Oxide ◽  
Oxide Thin Films

Determination of optical constant of diamond thin films

1992 ◽  
Author(s):  
Xuantong Ying ◽  
Yuanhua Shen ◽  
Hang Xue ◽  
Jianhai Liu ◽  
Zhongjing Xing ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Constant ◽  
Diamond Thin Films

The crystallinity, the surface morphology and the optical constant of sol-gel derived thin films of BaTio3on SiO2/Si and Si substrates

1999 ◽  
Vol 231 (1) ◽  
pp. 67-72
Author(s):  
K. Pita ◽  
S. D. Cheng ◽  
C. H. Kam ◽  
Y. Zhou ◽  
Y. L. Lam ◽  
...  
Keyword(s):  
Thin Films ◽  
Surface Morphology ◽  
Optical Constant ◽  
Sol Gel ◽  
Si Substrates

Infrared optical constant determination of weakly absorbing dielectric thin films

1992 ◽  
Vol 31 (7) ◽  
pp. 885
Author(s):  
Jacques Mouchart ◽  
Jacqueline Begel ◽  
Claudy Clément
Keyword(s):  
Thin Films ◽  
Optical Constant ◽  
Dielectric Thin Films ◽  
Constant Determination

Spot Effect in Optical Constant Characterization of Thin Films Fabricated by Ion Beam Sputtering

2017 ◽  
Vol 37 (10) ◽  
pp. 1031001
Author(s):  
刘华松 Liu Huasong ◽  
杨 霄 Yang Xiao ◽  
刘丹丹 Liu Dandan ◽  
姜承慧 Jiang Chenghui ◽  
李士达 Li Shida ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Constant ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering

Spectroscopic variations of optical constant and emissivity of PtAl2O3 cermet thin films

1993 ◽  
Vol 234 (1-2) ◽  
pp. 503-507 ◽  
Author(s):  
J.P. Segaud ◽  
B. Drévillon ◽  
E. Pascual ◽  
R. Ossikovski ◽  
G. Monnier ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Constant
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