scholarly journals Anisotropic and trap-limited diffusion of hydrogen/deuterium in monoclinic gallium oxide single crystals

2020 ◽  
Vol 117 (23) ◽  
pp. 232106
Author(s):  
Vilde M. Reinertsen ◽  
Philip M. Weiser ◽  
Ymir K. Frodason ◽  
Marianne E. Bathen ◽  
Lasse Vines ◽  
...  
2010 ◽  
Vol 405 (22) ◽  
pp. 4673-4677 ◽  
Author(s):  
A. Lincy ◽  
V. Mahalakshmi ◽  
A.J. Tinto ◽  
J. Thomas ◽  
K.V. Saban

2003 ◽  
Vol 12 (3-7) ◽  
pp. 647-651 ◽  
Author(s):  
Z. Teukam ◽  
D. Ballutaud ◽  
F. Jomard ◽  
J. Chevallier ◽  
M. Bernard ◽  
...  

Observations are recorded on X-ray spectra diffracted from cathodes of iron and palladium during actual discharge and diffusion of hydrogen. For iron, no expansion of the crystal lattice greater than 0.0002 Å could be observed during such diffusion, and the broadening observed of X-ray diffraction spectra indicated no preferred crystallographic planes for the evolution of molecular hydrogen. Blisters were formed across the faces of single crystals of iron, when made a cathode, indicating that diffusion of hydrogen occurs through the crystal grains rather than along crystal boundaries. For palladium, an expansion was observed during actual electrolysis to an extent of 0.0170 + 0.0002 Å. On ceasing electrolysis, there was reversion to a less-expanded lattice of palladium hydride. Broadening of the reflexions observed during electrolysis indicated no preferred planes for evolution of hydrogen. The significance of these findings is discussed for mechanisms of overvoltage and of diffusion of hydrogen through metals.


2016 ◽  
Vol 93 (12) ◽  
Author(s):  
M. Schubert ◽  
R. Korlacki ◽  
S. Knight ◽  
T. Hofmann ◽  
S. Schöche ◽  
...  

1981 ◽  
Vol 99 (2-3) ◽  
pp. 320-323 ◽  
Author(s):  
Kuniaki Watanabe ◽  
Masao Matsuyama ◽  
Kan Ashida ◽  
Toyosaburo Takeuchi

1993 ◽  
Vol 297 ◽  
Author(s):  
J.A. Roth ◽  
G.L. Olson ◽  
D.C. Jacobson ◽  
J.M. Poate

We report the first measurements of hydrogen diffusion kinetics in a-Si in the regime of low H concentration (<2×l019 cm−3). The results differ substantially from the diffusion behavior typically observed in hydrogenated a-Si:H at H concentrations >1020 cm−3. The activation energy and pre-exponential factor for low-concentration H diffusion are found to be 2.70 ± 0.02 eV and 2.2 × 104 cm2s−1, respectively, and are shown to be independent of both annealing time and H concentration. It is difficult to reconcile the combination of high activation energy and large pre-exponential factor with a simple deep-trap-limited diffusion model. Consequently, an alternative mechanism for H diffusion involving the migration of dangling bonds coupled with a H bond-switching step is proposed.


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