Characterization of 100 keV silicon negative ion implanted SiO2 thin films

2020 ◽  
Author(s):  
S. B. Vishwakarma ◽  
S. K. Dubey ◽  
R. L. Dubey ◽  
I. Sulania ◽  
D. Kanjilal ◽  
...  
1986 ◽  
Vol 75 ◽  
Author(s):  
Eiichi Izumi ◽  
Yoshinori Ikebe ◽  
Hiroyasu Shichi ◽  
Hifumi Tamura

A variety of materials such as semiconductors, metals, and insulators have been analyzed by use of the Hitachi IMA-3 ion microprobe analyzer. From the depth profile of a GaAs/AQ GaAs superlattice(50Å), a depth resolution of 45Å was obtained at 2350Å below the surface. The stable depth profile of a multilayer plastic film was obtained by using the negative ion beam(O) as a primary ion for charge neutralization. Further, the usefulness of the total ion monitoring method for correcting the changing factors of secondary ion intensity is demonstrated.


1994 ◽  
Vol 361 ◽  
Author(s):  
J.S. Cross ◽  
M. Tsukada ◽  
K. Kurihara ◽  
N. Kamehara ◽  
K. Niwa

ABSTRACTThin films of Pb(MgxNb1−x)Oz were produced by reactive sputtering from a lead target and columbite magnesium niobate powder targets at temperatures of 500–700°C on Pt/Ti/Si, Pt/SiO2/Si, MgO(lOO) and SrTiO3(100) substrates. The films in general deposited on Pt consisted of PbO and pyrochlore phases depending upon the deposition temperature. ICP analysis revealed that the films contained slightly less Mg than the target. This was attributed to negative ion preferential resputtering of the film within the discharge. However, films deposited at 650°C on MgO and SrTiO3 substrates from a lead target and magnesium niobate target which contained excess MgO, contained a highly oriented perovskite (100) Pb(Mg1/3Nb2/3)O3 [PMN] phase according to X-ray diffraction analysis. It was observed that the substrate composition and orientation greatly influenced the crystallinity of the deposited films.


1991 ◽  
Vol 41 (1-2) ◽  
pp. 291-294 ◽  
Author(s):  
T.P. Nguyen ◽  
S. Lefrant ◽  
G. Froyer ◽  
Y. Pelous ◽  
B. Ratier ◽  
...  

Author(s):  
A. K. Rai ◽  
P. P. Pronko

Several techniques have been reported in the past to prepare cross(x)-sectional TEM specimen. These methods are applicable when the sample surface is uniform. Examples of samples having uniform surfaces are ion implanted samples, thin films deposited on substrates and epilayers grown on substrates. Once device structures are fabricated on the surfaces of appropriate materials these surfaces will no longer remain uniform. For samples with uniform surfaces it does not matter which part of the surface region remains in the thin sections of the x-sectional TEM specimen since it is similar everywhere. However, in order to study a specific region of a device employing x-sectional TEM, one has to make sure that the desired region is thinned. In the present work a simple way to obtain thin sections of desired device region is described.


Author(s):  
J.B. Posthill ◽  
R.P. Burns ◽  
R.A. Rudder ◽  
Y.H. Lee ◽  
R.J. Markunas ◽  
...  

Because of diamond’s wide band gap, high thermal conductivity, high breakdown voltage and high radiation resistance, there is a growing interest in developing diamond-based devices for several new and demanding electronic applications. In developing this technology, there are several new challenges to be overcome. Much of our effort has been directed at developing a diamond deposition process that will permit controlled, epitaxial growth. Also, because of cost and size considerations, it is mandatory that a non-native substrate be developed for heteroepitaxial nucleation and growth of diamond thin films. To this end, we are currently investigating the use of Ni single crystals on which different types of epitaxial metals are grown by molecular beam epitaxy (MBE) for lattice matching to diamond as well as surface chemistry modification. This contribution reports briefly on our microscopic observations that are integral to these endeavors.


2017 ◽  
Vol 137 (1) ◽  
pp. 46-47
Author(s):  
Takeshi Kohno ◽  
Masato Mihara ◽  
Ataru Tanabe ◽  
Takashi Abe ◽  
Masanori Okuyama ◽  
...  

2011 ◽  
Vol E94-C (2) ◽  
pp. 157-163 ◽  
Author(s):  
Masakazu MUROYAMA ◽  
Ayako TAJIRI ◽  
Kyoko ICHIDA ◽  
Seiji YOKOKURA ◽  
Kuniaki TANAKA ◽  
...  

2018 ◽  
Vol 14 (2) ◽  
pp. 221-234
Author(s):  
Ahmed Namah Mohamed ◽  
◽  
Jafer Fahdel Odah ◽  
Haider Tawfiq Naeem

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