scholarly journals Environmental temperature effect on dimensional measurements of atomic force microscopy

2021 ◽  
Vol 4 (2) ◽  
pp. 023003
Author(s):  
Chengfu Ma ◽  
Yuhang Chen ◽  
Wenhao Huang
2015 ◽  
Author(s):  
Johann Foucher ◽  
Sebastian W. Schmidt ◽  
Aurelien Labrosse ◽  
Alexandre Dervillé ◽  
Sandra Bos ◽  
...  

2017 ◽  
Vol 8 ◽  
pp. 1774-1785
Author(s):  
Petra Fiala ◽  
Daniel Göhler ◽  
Benno Wessely ◽  
Michael Stintz ◽  
Giovanni Mattia Lazzerini ◽  
...  

Dimensional measurements on nano-objects by atomic force microscopy (AFM) require samples of safely fixed and well individualized particles with a suitable surface-specific particle number on flat and clean substrates. Several known and proven particle preparation methods, i.e., membrane filtration, drying, rinsing, dip coating as well as electrostatic and thermal precipitation, were performed by means of scanning electron microscopy to examine their suitability for preparing samples for dimensional AFM measurements. Different suspensions of nano-objects (with varying material, size and shape) stabilized in aqueous solutions were prepared therefore on different flat substrates. The drop-drying method was found to be the most suitable one for the analysed suspensions, because it does not require expensive dedicated equipment and led to a uniform local distribution of individualized nano-objects. Traceable AFM measurements based on Si and SiO2 coated substrates confirmed the suitability of this technique.


Author(s):  
F. Marinello ◽  
S. Carmignato ◽  
A. Voltan ◽  
E. Savio ◽  
L. De Chiffre

This paper aimed at identifying the error sources that occur in dimensional measurements performed using atomic force microscopy. In particular, a set of characterization techniques for errors quantification is presented. The discussion on error sources is organized in four main categories: scanning system, tip-surface interaction, environment, and data processing. The discussed errors include scaling effects, squareness errors, hysteresis, creep, tip convolution, and thermal drift. A mathematical model of the measurement system is eventually described, as a reference basis for errors characterization, with an applicative example on a reference silicon grating.


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