Dislocation microstructures on flat and stepped Si surfaces: Guidance for growing high‐quality GaAs on (100) Si substrates

1988 ◽  
Vol 52 (17) ◽  
pp. 1386-1388 ◽  
Author(s):  
Y. H. Lo ◽  
M. C. Wu ◽  
H. Lee ◽  
S. Wang ◽  
Z. Liliental‐Weber
Keyword(s):  
High Quality ◽  
Si Substrates

Phase transition and piezoelectricity of sol–gel-processed Sm-doped BiFeO3 thin films on Pt(111)/Ti/SiO2/Si substrates

2015 ◽  
Vol 3 (9) ◽  
pp. 2115-2122 ◽  
Author(s):  
Wei Sun ◽  
Jing-Feng Li ◽  
Qi Yu ◽  
Li-Qian Cheng
Keyword(s):  
Thin Films ◽  
Phase Transition ◽  
Sol Gel ◽  
Orthorhombic Phase ◽  
High Quality ◽  
Si Substrates ◽  
Bifeo3 Thin Films ◽  
Gel Processing

We prepared high-quality Bi1−xSmxFeO3 films on Pt(111)/Ti/SiO2/Si substrates by sol–gel processing and found rhombohedral–orthorhombic phase transition with enhanced piezoelectricity.

Effect of Ge on SiC Film Morphology in SiC/Si Films Grown by MOCVD

1999 ◽  
Vol 572 ◽  
Author(s):  
W. L. Samey ◽  
L. Salamanca-Riba ◽  
P. Zhou ◽  
M. G. Spencer ◽  
C. Taylor ◽  
...  
Keyword(s):  
Stacking Faults ◽  
Two Dimensional ◽  
High Quality ◽  
Flow Rates ◽  
Si Substrates ◽  
Cvd Growth ◽  
Polytype Transformation ◽  
Si Films ◽  
Sic Film ◽  
Sic Films

ABSTRACTSiC/Si films generally contain stacking faults and amorphous regions near the interface. High quality SiC/Si films are especially difficult to obtain since the temperatures usually required to grow high quality SiC are above the Si melting point. We added Ge in the form of GeH2 to the reactant gases to promote two-dimensional CVD growth of SiC films on (111) Si substrates at 1000°C. The films grown with no Ge are essentially amorphous with very small crystalline regions, whereas those films grown with GeH2 flow rates of 10 and 15 sccm are polycrystalline with the 3C structure. Increasing the flow rate to 20 sccm improves the crystallinity and induces growth of 6H SiC over an initial 3C layer. This study presents the first observation of spontaneous polytype transformation in SiC grown on Si by MOCVD.

Low-temperature fabrication of high-quality (Ba, Sr)TiO3 films using charged liquid cluster beam method

2002 ◽  
Vol 17 (8) ◽  
pp. 1888-1891 ◽  
Author(s):  
Hyungsoo Choi ◽  
Sungho Park ◽  
Yi Yang ◽  
HoChul Kang ◽  
Kyekyoon (Kevin) Kim ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
Low Temperature ◽  
Cluster Beam ◽  
High Quality ◽  
Carboxylate Ligands ◽  
Si Substrates ◽  
Beam Method ◽  
Temperature Deposition ◽  
Bst Films ◽  
Substrate Temperatures

Low-temperature deposition of high-quality (Ba, Sr)TiO3 (BST) thin films was achieved in air on Pt/Ti/SiO2/Si substrates using the charged liquid cluster beam (CLCB) method. The Ba, Sr, and Ti precursors were synthesized using alkoxy carboxylate ligands to tailor their physical properties to the CLCB process. The as-deposited BST films fabricated at substrate temperatures as low as 280 °C exhibited high purity. The leakage current density and dielectric constant of the film, deposited at 300 °C and subsequently annealed at 700 °C, were 2.5 × 10−9 A/cm2 at 1.5 V and 305, respectively.

Epitaxial Growth of Aluminum Nitride on Sapphire and Silicon

1994 ◽  
Vol 358 ◽  
Author(s):  
K. Dovidenko ◽  
S. Oktyabrsky ◽  
J. Narayan ◽  
M. Razeghi
Keyword(s):  
Epitaxial Growth ◽  
Substrate Surface ◽  
Wide Band ◽  
X Ray Diffraction ◽  
Wide Band Gap ◽  
High Quality ◽  
Microstructural Characteristics ◽  
X Ray ◽  
Si Substrates ◽  
Transmission Electron

ABSTRACTThe microstructural characteristics of wide band gap semiconductor, hexagonal A1N thin films on Si(100), (111), and sapphire (0001) and (10ī2) were studied by transmission electron microscopy (TEM) and x-ray diffraction. The films were grown by MOCVD from TMA1 + NH3 + N2 gas mixtures. Different degrees of film crystallinity were observed for films grown on α-A12O3 and Si substrates in different orientations. The epitaxial growth of high quality single crystalline A1N film on (0001) α-Al2O3 was demonstrated with a dislocation density of about 2*10 10cm−2 . The films on Si(111) and Si(100) substrates were textured with the c-axis of A1N being perpendicular to the substrate surface.

Growth of high-quality self-catalyzed core-shell GaAsP nanowires on Si substrates

2016 ◽  
Author(s):  
Yunyan Zhang ◽  
Martin Aagesen ◽  
Ana M. Sanchez ◽  
Jiang Wu ◽  
Richard Beanland ◽  
...  
Keyword(s):  
Core Shell ◽  
High Quality ◽  
Si Substrates

MOCVD growth of high-quality AlGaAs on Si substrates for high-efficiency solar cells

1997 ◽  
Vol 170 (1-4) ◽  
pp. 447-450 ◽  
Author(s):  
T. Soga ◽  
T. Kato ◽  
K. Baskar ◽  
C.L. Shao ◽  
T. Jimbo ◽  
...  
Keyword(s):  
Solar Cells ◽  
High Efficiency ◽  
High Quality ◽  
Si Substrates ◽  
Mocvd Growth ◽  
High Efficiency Solar Cells

High-Quality (211)B CdTe on (211)Si Substrates Using Metalorganic Vapor-Phase Epitaxy

2011 ◽  
Vol 40 (8) ◽  
pp. 1790-1794 ◽  
Author(s):  
S. R. Rao ◽  
S. S. Shintri ◽  
J. K. Markunas ◽  
R. N. Jacobs ◽  
I. B. Bhat
Keyword(s):  
Vapor Phase ◽  
Metalorganic Vapor Phase Epitaxy ◽  
Vapor Phase Epitaxy ◽  
High Quality ◽  
Si Substrates

Growth of high quality GaAs layers on Si substrates by MOCVD

1986 ◽  
Vol 77 (1-3) ◽  
pp. 490-497 ◽  
Author(s):  
Masahiro Akiyama ◽  
Yoshihiro Kawarada ◽  
Takashi Ueda ◽  
Seiji Nishi ◽  
Katsuzo Kaminishi
Keyword(s):  
High Quality ◽  
Si Substrates

High quality GaAs nanowires epitaxy on patterned Si substrates

2014 ◽  
Author(s):  
Shiyan Li ◽  
Jiaoqing Pan ◽  
Xuliang Zhou ◽  
Mengke Li ◽  
Junping Mi ◽  
...  
Keyword(s):  
High Quality ◽  
Si Substrates ◽  
Gaas Nanowires
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