Amorphous carbon films as resist masks with high reactive ion etching resistance for nanometer lithography
Keyword(s):
2018 ◽
Vol 354
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pp. 153-160
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Keyword(s):
1990 ◽
Vol 48
(1)
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pp. 318-319
2019 ◽
Vol 96
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pp. 74-84
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2008 ◽
Vol 145
(4)
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pp. 186-191
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