X‐ray photoelectron spectroscopy study of the surface chemistry of freon‐oxygen plasma etched silicon

J. H. Thomas; J‐S. Maa

doi:10.1063/1.94528

X‐ray photoelectron spectroscopy study of the surface chemistry of freon‐oxygen plasma etched silicon

Applied Physics Letters ◽

10.1063/1.94528 ◽

1983 ◽

Vol 43 (9) ◽

pp. 859-861 ◽

Cited By ~ 20

Author(s):

J. H. Thomas ◽

J‐S. Maa

Keyword(s):

Surface Chemistry ◽

Photoelectron Spectroscopy ◽

Oxygen Plasma ◽

Spectroscopy Study ◽

X Ray ◽

Etched Silicon

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The influence of relative humidity upon Cu(In,Ga)Se2 thin-film surface chemistry: an X-ray photoelectron spectroscopy study

Applied Surface Science ◽

10.1016/j.apsusc.2021.151898 ◽

2021 ◽

pp. 151898

Author(s):

Solène Béchu ◽

Muriel Bouttemy ◽

Jean-François Guillemoles ◽

Arnaud Etcheberry

Keyword(s):

Thin Film ◽

Relative Humidity ◽

Surface Chemistry ◽

Photoelectron Spectroscopy ◽

Film Surface ◽

Spectroscopy Study ◽

X Ray ◽

Thin Film Surface

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Plasma Treatment of Polymers: The Effects of Energy Transfer from an Argon Plasma on the Surface Chemistry of Polystyrene, and Polypropylene. A High-Energy Resolution X-ray Photoelectron Spectroscopy Study

Langmuir ◽

10.1021/la9713053 ◽

1998 ◽

Vol 14 (17) ◽

pp. 4827-4835 ◽

Cited By ~ 179

Author(s):

Richard M. France ◽

Robert D. Short

Keyword(s):

Energy Transfer ◽

Surface Chemistry ◽

Plasma Treatment ◽

Energy Resolution ◽

Photoelectron Spectroscopy ◽

Argon Plasma ◽

High Energy ◽

High Energy Resolution ◽

Spectroscopy Study ◽

X Ray

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A thermal desorption and x‐ray photoelectron spectroscopy study of the surface chemistry of iron pentacarbonyl

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.575858 ◽

1989 ◽

Vol 7 (3) ◽

pp. 640-645 ◽

Cited By ~ 35

Author(s):

Francisco Zaera

Keyword(s):

Surface Chemistry ◽

Thermal Desorption ◽

Photoelectron Spectroscopy ◽

Iron Pentacarbonyl ◽

Spectroscopy Study ◽

X Ray

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Oxygen Plasma Treatment of Fluorinated Polyimide: An X-Ray Photoelectron Spectroscopy Study

Metallized Plastics 3 ◽

10.1007/978-1-4615-3416-7_18 ◽

1992 ◽

pp. 215-223 ◽

Cited By ~ 1

Author(s):

Naresh C. Saha ◽

Li-Hsin Chang

Keyword(s):

Plasma Treatment ◽

Photoelectron Spectroscopy ◽

Oxygen Plasma ◽

Oxygen Plasma Treatment ◽

Spectroscopy Study ◽

X Ray ◽

Fluorinated Polyimide

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X-Ray Photoelectron Spectroscopy Study of Si-C Film Growth by Chemical Vapor Deposition of Ethylene on Si(100)

10.21236/ada197437 ◽

1988 ◽

Author(s):

P. A. Taylor ◽

M. Bozack ◽

W. J. Choyke ◽

J. T. Yates ◽

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Photoelectron Spectroscopy ◽

Film Growth ◽

Chemical Vapor ◽

Spectroscopy Study ◽

X Ray

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Photoelectron spectroscopy on organic surfaces: X-ray degradation of oxygen-plasma-treated and chemically reduced poly(propylene) surfaces in comparison to conventional polymers

Surface and Interface Analysis ◽

10.1002/sia.3024 ◽

2009 ◽

Vol 41 (5) ◽

pp. 445-448 ◽

Cited By ~ 6

Author(s):

Thomas Gross ◽

Gerhard Kühn ◽

Wolfgang E. S. Unger

Keyword(s):

Photoelectron Spectroscopy ◽

Oxygen Plasma ◽

X Ray ◽

Organic Surfaces ◽

Poly Propylene

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Time‐of‐flight secondary ion mass spectrometry and X‐ray photoelectron spectroscopy study of 2‐phenylimidazole on brass

Rapid Communications in Mass Spectrometry ◽

10.1002/rcm.8974 ◽

2020 ◽

Vol 35 (2) ◽

Author(s):

Matjaž Finšgar

Keyword(s):

Mass Spectrometry ◽

Photoelectron Spectroscopy ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Spectroscopy Study ◽

X Ray ◽

Ion Mass Spectrometry ◽

Secondary Ion

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A high-resolution X-ray photoelectron spectroscopy study of trifluoroacetic anhydride labelling of hydroxyl groups: demonstration of the β shift due to OC(O)CF3

Polymer ◽

10.1016/0032-3861(93)90418-a ◽

1993 ◽

Vol 34 (9) ◽

pp. 1795-1799 ◽

Cited By ~ 35

Author(s):

A.P. Ameen ◽

R.J. Ward ◽

R.D. Short ◽

G. Beamson ◽

D. Briggs

Keyword(s):

High Resolution ◽

Photoelectron Spectroscopy ◽

Trifluoroacetic Anhydride ◽

Hydroxyl Groups ◽

Spectroscopy Study ◽

X Ray

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An X-ray photoelectron spectroscopy study of the surface layers between diamond crystallites and silicon substrate deposited by microwave-plasma-assisted chemical vapour deposition

Diamond and Related Materials ◽

10.1016/0925-9635(93)90120-q ◽

1993 ◽

Vol 2 (2-4) ◽

pp. 558-561 ◽

Cited By ~ 5

Author(s):

S. Haq ◽

C. Somerton ◽

D. Tunnicliffe ◽

J.A. Savage ◽

P. John ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Silicon Substrate ◽

Photoelectron Spectroscopy ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Spectroscopy Study ◽

Surface Layers ◽

X Ray

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Combined Time-of-Flight Secondary Ion Mass Spectrometry and X-ray Photoelectron Spectroscopy Study of the Surface Segregation of Poly(methyl methacrylate) (PMMA) in Bisphenol A Polycarbonate/PMMA Blends

Macromolecules ◽

10.1021/ma00117a038 ◽

1995 ◽

Vol 28 (13) ◽

pp. 4631-4637 ◽

Cited By ~ 52

Author(s):

J.-B. Lhoest ◽

P. Bertrand ◽

L. T. Weng ◽

J.-L. Dewez

Keyword(s):

Mass Spectrometry ◽

Bisphenol A ◽

Photoelectron Spectroscopy ◽

Surface Segregation ◽

Secondary Ion Mass Spectrometry ◽

Spectroscopy Study ◽

Bisphenol A Polycarbonate ◽

X Ray ◽

Secondary Ion ◽

Pmma Blends

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