Electron transport in InP at high electric fields

1983 ◽  
Vol 42 (8) ◽  
pp. 725-727 ◽  
Author(s):  
T. H. Windhorn ◽  
L. W. Cook ◽  
M. A. Haase ◽  
G. E. Stillman
2008 ◽  
Vol 22 (22) ◽  
pp. 3915-3922 ◽  
Author(s):  
A. R. BINESH ◽  
H. ARABSHAHI ◽  
G. R. EBRAHIMI ◽  
M. REZAEE ROKN-ABADI

An ensemble Monte Carlo simulation has been used to model bulk electron transport at room and higher temperatures as a function of high electric fields. Electronic states within the conduction band valleys at the Γ1, U, M, Γ3 and K are represented by non-parabolic ellipsoidal valleys centred on important symmetry points of the Brillouin zone. The simulation shows that intervalley electron transfer plays a dominant role in GaN in high electric fields leading to a strongly inverted electron distribution and to a large negative differential conductance. Our simulation results have also shown that the electron velocity in GaN is less sensitive to temperature than in other III-V semiconductors like GaAs . So GaN devices are expected to be more tolerant to self-heating and high ambient temperature device modeling. Our steady state velocity-field characteristics are in fair agreement with other recent calculations.


2002 ◽  
Vol 12 (04) ◽  
pp. 1057-1081 ◽  
Author(s):  
S. M. KOMIRENKO ◽  
K. W. KIM ◽  
V. A. KOCHELAP ◽  
M. A. STROSCIO

We have investigated the problem of electron runaway at strong electric fields in polar semiconductors focusing on the nanoscale nitride-based heterostructures. A transport model which takes into account the main features of electrons injected in short devices under high electric fields is developed. The electron distribution as a function of the electron momenta and coordinate is analyzed. We have determined the critical field for the runaway regime and investigated this regime in detail. The electron velocity distribution over the device is studied at different fields. We have applied the model to the group-III nitrides: InN, GaN and AlN. For these materials, the basic parameters and characteristics of the high-field electron transport are obtained. We have found that the transport in the nitrides is always dissipative. However, in the runaway regime, energies and velocities of electrons increase with distance which results in average velocities higher than the peak velocity in bulk-like samples. We demonstrated that the runaway electrons are characterized by the extreme distribution function with the population inversion. A three-terminal heterostructure where the runaway effect can be detected and measured is proposed. We also have considered briefly different nitride-based small-feature-size devices where this effect can have an impact on the device performance.


2001 ◽  
Vol 693 ◽  
Author(s):  
Ramón Collazo ◽  
Raoul Schlesser ◽  
Amy Roskowski ◽  
Robert F. Davis ◽  
Z. Sitar

AbstractThe energy distribution of electrons transported through an intrinsic AlN film was directly measured as a function of the applied field, and AlN film thickness. Following the transport, electrons were extracted into vacuum through a semitransparent Au electrode and their energy distribution was measured using an electron spectrometer. Transport through films thicker than 95 nm and applied field between 200 kV/cm -350 kV/cm occurred as steady-state hot electron transport represented by a Maxwellian energy distribution, with a corresponding carrier temperature. At higher fields (470 kV/cm), intervalley scattering was evidenced by a multi-component energy distribution with a second peak at the energy position of the first satellite valley. Electron transport through films thinner than 95 nm demonstrated velocity overshoot under fields greater than 550 kV/cm. This was evidenced by a symmetric energy distribution centered at an energy above the conduction band minimum. This indicated that the drift component of the electron velocity was on the order of the “thermal” component. A transient length of less than 80 nm was deduced from these observations.


2010 ◽  
Vol 44 (7) ◽  
pp. 898-903 ◽  
Author(s):  
I. S. Vasil’evskii ◽  
G. B. Galiev ◽  
Yu. A. Matveev ◽  
E. A. Klimov ◽  
J. Požela ◽  
...  

2013 ◽  
Vol 2013 ◽  
pp. 1-6 ◽  
Author(s):  
F. M. Abou El-Ela ◽  
A. Z. Mohamed

A three-valley Monte Carlo simulation approach was used to investigate electron transport in wurtzite GaN such as the drift velocity, the drift mobility, the average electron energy, energy relaxation time, and momentum relaxation time at high electric fields. The simulation accounted for polar optical phonon, acoustic phonon, piezoelectric, intervalley scattering, and Ridley charged impurity scattering model. For the steady-state transport, the drift velocity against electric field showed a negative differential resistance of a peak value of 2.9×105 m/s at a critical electric field strength 180×105 V/m. The electron drift velocity relaxes to the saturation value of 1.5×105 m/s at very high electric fields. The electron velocities against time over wide range of electric fields are reported.


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