A new method to control impact ionization rate ratio by spatial separation of avalanching carriers in multilayered heterostructures

1982 ◽  
Vol 41 (1) ◽  
pp. 67-70 ◽  
Author(s):  
T. Tanoue ◽  
H. Sakaki
2001 ◽  
Vol 24 (2) ◽  
pp. 129-134
Author(s):  
Y. Amhouche ◽  
A. El Abbassi ◽  
K. Raïs ◽  
E. Bendada ◽  
R. Rmaily

A new method for drain saturation voltage extraction in submicron MOSFETs is presented. It is based on measurements of the partial derivative of the impact ionization rate. The method has been tested using main of channel length MOSFET devices and compared with others methods.


2010 ◽  
Vol 25 (11) ◽  
pp. 115010 ◽  
Author(s):  
G R Li ◽  
Z X Qin ◽  
G F Luo ◽  
B Shen ◽  
G Y Zhang

2012 ◽  
Author(s):  
S. R. Pattanaik ◽  
J. Pradhan ◽  
S. K. Swain ◽  
P. Panda ◽  
G. N. Dash

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