Negative differential resistance through real‐space electron transfer

1979 ◽  
Vol 35 (6) ◽  
pp. 469-471 ◽  
Author(s):  
K. Hess ◽  
H. Morkoç ◽  
H. Shichijo ◽  
B. G. Streetman
RSC Advances ◽  
2016 ◽  
Vol 6 (7) ◽  
pp. 5671-5676 ◽  
Author(s):  
Lingyan Shen ◽  
Xinhong Cheng ◽  
Zhongjian Wang ◽  
Duo Cao ◽  
Li zheng Li zheng ◽  
...  

Negative differential resistance is firstly observed in I–V characteristic of GaN MIS structure, which is induced by intervalley electron transfer.


2016 ◽  
Vol 30 (02) ◽  
pp. 1550256 ◽  
Author(s):  
Ji-Mei Shen ◽  
Jing Liu ◽  
Yi Min ◽  
Li-Ping Zhou

Using the first-principles method which combines the nonequilibrium Green’s function (NEGF) with density functional theory (DFT), the role of defect, dopant, barrier length and geometric deformation for low-bias negative differential resistance (NDR) in two capped armchair carbon nanotubes (CNTs) sandwiching [Formula: see text] barrier are systematically analyzed. We found that this method can regulate the negative differential resistance (NDR) effects such as current peak and peak position. The adjusting mechanism may originate from orbital interaction and orbital reconstruction. Our calculations try to manipulate the transport characteristics in energy space by simply manipulating the structure in real space, which may promise the potential applications in nanomolecular-electronics in the future.


2020 ◽  
Author(s):  
SMITA GAJANAN NAIK ◽  
Mohammad Hussain Kasim Rabinal

Electrical memory switching effect has received a great interest to develop emerging memory technology such as memristors. The high density, fast response, multi-bit storage and low power consumption are their...


2002 ◽  
Vol 25 (3) ◽  
pp. 233-237
Author(s):  
K. F. Yarn

First observation of switching behavior is reported in GaAs metal-insulator-p-n+structure, where the thin insulator is grown at low temperature by a liquid phase chemical-enhanced oxide (LPECO) with a thickness of 100 Å. A significant S-shaped negative differential resistance (NDR) is shown to occur that originates from the regenerative feedback in a tunnel metal/insulator/semiconductor (MIS) interface andp-n+junction. The influence of epitaxial doping concentration on the switching and holding voltages is investigated. The switching voltages are found to be decreased when increasing the epitaxial doping concentration, while the holding voltages are almost kept constant. A high turn-off/turn-on resistance ratio up to105has been obtained.


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