scholarly journals Ion beam enabled nanoscale fabrication, surface patterning, and self-assembly

2020 ◽  
Vol 7 (1) ◽  
pp. 011601 ◽  
Author(s):  
J. E. E. Baglin
Keyword(s):  
Self Assembly ◽  
Ion Beam ◽  
Surface Patterning ◽  
Nanoscale Fabrication

Nanoscale Self-Assembly Using Ion and Electron Beam Techniques: A Rapid Review

MRS Advances ◽  
2020 ◽  
Vol 5 (64) ◽  
pp. 3507-3520
Author(s):  
Chunhui Dai ◽  
Kriti Agarwal ◽  
Jeong-Hyun Cho
Keyword(s):  
Electron Beam ◽  
Self Assembly ◽  
Ion Beam ◽  
Three Dimensional ◽  
The Self ◽  
Stress Generation ◽  
Rapid Review ◽  
High Yield ◽  
3D Nanostructures ◽  
Self Assembled

AbstractNanoscale self-assembly, as a technique to transform two-dimensional (2D) planar patterns into three-dimensional (3D) nanoscale architectures, has achieved tremendous success in the past decade. However, an assembly process at nanoscale is easily affected by small unavoidable variations in sample conditions and reaction environment, resulting in a low yield. Recently, in-situ monitored self-assembly based on ion and electron irradiation has stood out as a promising candidate to overcome this limitation. The usage of ion and electron beam allows stress generation and real-time observation simultaneously, which significantly enhances the controllability of self-assembly. This enables the realization of various complex 3D nanostructures with a high yield. The additional dimension of the self-assembled 3D nanostructures opens the possibility to explore novel properties that cannot be demonstrated in 2D planar patterns. Here, we present a rapid review on the recent achievements and challenges in nanoscale self-assembly using electron and ion beam techniques, followed by a discussion of the novel optical properties achieved in the self-assembled 3D nanostructures.

Self-assembly of germanium islands under pulsed irradiation by a low-energy ion beam during heteroepitaxy of Ge/Si(100) structures

2008 ◽  
Vol 106 (3) ◽  
pp. 517-527 ◽  
Author(s):  
J. V. Smagina ◽  
V. A. Zinovyev ◽  
A. V. Nenashev ◽  
A. V. Dvurechenskiĭ ◽  
V. A. Armbrister ◽  
...  
Keyword(s):  
Self Assembly ◽  
Ion Beam ◽  
Low Energy ◽  
Pulsed Irradiation

Role of ion beam induced solid flow in surface patterning of Si (100) using Ar ion beam irradiation

2013 ◽  
Vol 283 ◽  
pp. 417-421 ◽  
Author(s):  
Tanuj Kumar ◽  
Ashish Kumar ◽  
N.P. Lalla ◽  
Sonu Hooda ◽  
Sunil Ojha ◽  
...  
Keyword(s):  
Ion Beam ◽  
Surface Patterning ◽  
Beam Irradiation ◽  
Ion Beam Irradiation ◽  
Solid Flow

scholarly journals Functional Micro–Nano Structure with Variable Colour: Applications for Anti-Counterfeiting

2019 ◽  
Vol 2019 ◽  
pp. 1-26
Author(s):  
Hailu Liu ◽  
Dong Xie ◽  
Huayan Shen ◽  
Fayong Li ◽  
Junjia Chen
Keyword(s):  
Refractive Index ◽  
Photonic Crystal ◽  
Photonic Crystals ◽  
Inkjet Printing ◽  
Self Assembly ◽  
Ion Beam ◽  
Lattice Parameters ◽  
Nano Structure ◽  
Advantages And Disadvantages ◽  
Colour Patterns

Colour patterns based on micro-nano structure have attracted enormous research interests due to unique optical switches and smart surface applications in photonic crystal, superhydrophobic surface modification, controlled adhesion, inkjet printing, biological detection, supramolecular self-assembly, anti-counterfeiting, optical device and other fields. In traditional methods, many patterns of micro-nano structure are derived from changes of refractive index or lattice parameters. Generally, the refractive index and lattice parameters of photonic crystals are processed by common solvents, salts or reactive monomers under specific electric, magnetic and stress conditions. This review focuses on the recent developments in the fabrication of micro-nano structures for patterns including styles, materials, methods and characteristics. It summarized the advantages and disadvantages of inkjet printing, angle-independent photonic crystal, self-assembled photonic crystals by magnetic field force, gravity, electric field, inverse opal photonic crystal, electron beam etching, ion beam etching, laser holographic lithography, imprinting technology and surface wrinkle technology, etc. This review will provide a summary on designing micro-nano patterns and details on patterns composed of photonic crystals by surface wrinkles technology and plasmonic micro-nano technology. In addition, colour patterns as switches are fabricated with good stability and reproducibility in anti-counterfeiting application. Finally, there will be a conclusion and an outlook on future perspectives.

Laser Sub-Micron Patterning of Rough Surfaces by Micro-Particle Lens Arrays

2011 ◽  
Vol 1 (3) ◽  
pp. 1-9 ◽  
Author(s):  
Ashfaq Khan ◽  
Zengbo Wang ◽  
Mohammad A Sheikh ◽  
Lin Li
Keyword(s):  
Rough Surface ◽  
Self Assembly ◽  
Glass Surface ◽  
Rough Surfaces ◽  
Flat Glass ◽  
Surface Patterning ◽  
Laser Surface ◽  
New Method ◽  
Experimental Investigations ◽  
Sio2 Spheres

Laser surface patterning by Contact Particles Lens Arrays (CPLA) has been widely utilized for patterning of smooth surfaces but there is no technique developed by which CPLA can be deposited on a rough surface. For deposition of CPLA, conventional techniques require the surface to be flat, smooth and hydrophilic. In this study, a new method for the deposition of CPLA on a rough surface is proposed and utilized for patterning. In this method, a hexagonal closed pack monolayer of SiO2 spheres was first formed by self-assembly on a flat glass surface. The formed monolayer of particles was picked up by a flexible sticky surface and then placed on the rough surface to be patterned. A Nd:YVO4 laser was used to irradiate the substrate with the laser passing through the sticky plastic and the particles. Experimental investigations have been carried out to determine the properties of the patterns.

Abrikosov-like lattices in organic crystals on graphite surface

2014 ◽  
Vol 1663 ◽  
Author(s):  
Alexandre F. Fonseca ◽  
Paulo N. Lisboa-Filho
Keyword(s):  
Small Molecules ◽  
Aromatic Hydrocarbons ◽  
Self Assembly ◽  
Surface Patterning ◽  
Organic Crystals ◽  
Spontaneous Formation ◽  
Vast Literature ◽  
Different Types ◽  
Polycyclic Aromatic ◽  
Initial Results

ABSTRACTThe interest for surface patterning presents a fast increasing in the last few years due to several factors ranging from miniaturization trends and sensor design to worries about the absorption of carcinogenic molecules on inhalable particles. Although the existence of a vast literature regarding the self-assembly and patterning of nanoparticles on different types of surfaces, it remains unclear the dynamics and main mechanisms behind the formation and maintenance of two-dimensional symmetric patterns of small molecules on top of surfaces. In this contribution, we report initial results on an investigation on the similarities between the well-known Abrikosov hexagonal lattices in superconductors, and the spontaneous formation of hexagonal patterns of some small polycyclic aromatic hydrocarbons (PAHs) on top of a graphitic surface. In order to attest our results, some experimental results from literature are compared to the obtained results.

Guided Control of Cu2O Nanodot Self-Assembly on SrTiO3 (100)

2004 ◽  
Vol 811 ◽  
Author(s):  
Yingge Du ◽  
Surajit Atha ◽  
Robert Hull ◽  
James F. Groves ◽  
Igor Lyubinetsky ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Self Assembly ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Photocatalytic Decomposition ◽  
Process Conditions ◽  
Photochemical Process ◽  
Force Microscopy ◽  
Atomic Force

ABSTRACTA method has been developed for specifying the growth location of Cu2O nanodotson SrTiO3 (100) substrates. Growth location has been specified by using a focused ion beam (FIB) to modify microscopic and nanoscopic regions of the SrTiO3substrate prior to Cu2O deposition. Deposition onto the modified regions under carefully selected process conditions has generated nanodot growth at the edge of microscopic FIB-induced features and on top of nanoscopic FIB-induced features. For this work, an array of evenly spaced FIB implants was first patterned into several regions of each substrate. Within each sub-division of the array, the FIB implants were identical in Ga+ energy and dosage and implant diameter and spacing. After FIB surface modification and subsequent in-situ substrate cleaning, Cu2O nanodots were synthesized on the patterned SrTiO3 substrates using oxygen plasma assisted molecular beam epitaxy. The substrates and nanodots were characterized using atomic force microscopy at various stages of the process; in-situ X-ray photoelectron spectroscopy and Auger electron spectroscopy analysis demonstrated that the final stoichiometry of the nanodots was Cu2O. The photocatalytic decomposition of water on Cu2O under visible light irradiation has been reported. If the Cu2O can be located in the form ofislands on a carefully selected substrate, then it could be possible to greatly enhance the efficiency of the photochemical process.

Surface Modification Energized by FIB: The Influence of Etch Rates & Aspect Ratio on Ripple Wavelengths

2006 ◽  
Vol 960 ◽  
Author(s):  
Warren MoberlyChan
Keyword(s):  
Aspect Ratio ◽  
Self Assembly ◽  
Focused Ion Beam ◽  
Process Development ◽  
Ion Beam ◽  
Natural Diamond ◽  
Single Crystal Silicon ◽  
Nanometer Scale ◽  
Crystal Silicon ◽  
Etch Rates

ABSTRACTIon beams have been used to modify surface topography, producing nanometer-scale modulations (and even subnanometer ripples in this work) that have potential uses ranging from designing self-assembly structures, to controlling stiction of micromachined surfaces, to providing imprint templates for patterned media. Modern computer-controlled Focused Ion Beam tools enable alternating submicron patterned zones of such ion-eroded surfaces, as well as dramatically increasing the rate of ion beam processing. The DualBeam FIB/SEM also expedites process development while minimizing the use of materials that may be precious (Diamond) and/or produce hazardous byproducts (Beryllium). A FIB engineer can prototype a 3-by-3-by-3 matrix of variables in tens of minutes and consume as little as zeptoliters of material; whereas traditional ion beam processing would require tens of days and tens of precious wafers. Saturation wavelengths have been reported for ripples on materials such as single crystal silicon or diamond (∼200nm); however this work achieves wavelengths >400nm on natural diamond. Conversely, Be can provide a stable and ordered 2-dimensional array of <40nm periodicity. Also ripples <0.4nm are fabricated on carbon-base surfaces, and these quantized picostructures are measured by HR-TEM and electron diffraction. Rippling is a function of material, ion beam, and angle; but is also controlled by chemical environment, redeposition, and aspect ratio. Ideally a material has a constant yield (atoms sputtered off per incident ion); however, pragmatic FIB processes, coupled with the direct metrological feedback in a DualBeam tool, reveal etch rates do not remain constant for nanometer-scale processing. Control of rippling requires controlled metrology, and robust software tools are developed to enhance metrology. In situ monitoring of the influence of aspect ratio and redeposition at the micron scale correlates to the rippling fundamentals that occur at the nanometer scale and are controlled by the boundary conditions of FIB processing.

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