Effect of helium incorporation on plasma parameters and characteristic properties of hydrogen free carbon films deposited using DC magnetron sputtering

2020 ◽  
Vol 127 (1) ◽  
pp. 014901 ◽  
Author(s):  
Bibhuti B. Sahu ◽  
Sung I. Kim ◽  
Min W. Lee ◽  
Jeon G. Han
Keyword(s):  
Magnetron Sputtering ◽  
Carbon Films ◽  
Free Carbon ◽  
Dc Magnetron Sputtering ◽  
Plasma Parameters

Voids Investigation of Amorphous Carbon Films Deposited by DC-Magnetron Sputtering: A Small Angle x-ray Scattering and Gas Thermal Effusion Study

1999 ◽  
Vol 593 ◽  
Author(s):  
F.L. Freire ◽  
L.G. Jacobsohn ◽  
D.F. Franceschini ◽  
S.S. Camargo
Keyword(s):  
Magnetron Sputtering ◽  
Amorphous Carbon ◽  
Small Angle ◽  
Ion Beam ◽  
Carbon Films ◽  
Dc Magnetron Sputtering ◽  
Amorphous Carbon Films ◽  
X Ray ◽  
X Ray Scattering ◽  
Ray Scattering

ABSTRACTAmorphous carbon films were deposited onto (100) Si crystals and onto ultra-pure Al foils by dc-magnetron sputtering with different Ar plasma pressures, from 0.17 to 1.4 Pa. We investigate the voids structure and the voids density in these films by means of small angle x-ray scattering (SAXS) and mass spectrometry of effused gases. The analysis of the effusion spectra provided clear evidence that films deposited at lower pressures are compact, while the films deposited at higher pressure present a more open structural arrangement, confirming density results obtained by using ion beam techniques. SAXS results reveal that the fraction of open volumes increases with the plasma pressure: a direct correlation between film density and open volume fraction is found. These different film microstructures could be explained by the existence of different bombarding regimes during film growth

Diamond like carbon films deposited from graphite target by asymmetric bipolar pulsed-DC magnetron sputtering

2007 ◽  
Vol 16 (4-7) ◽  
pp. 1286-1290 ◽  
Author(s):  
M. Rubio-Roy ◽  
C. Corbella ◽  
J. Garcia-Céspedes ◽  
M.C. Polo ◽  
E. Pascual ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Dc Magnetron Sputtering ◽  
Graphite Target ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering

Mechanical and Tribological Properties of a-GeCx Films Deposited by DC-Magnetron Sputtering

1997 ◽  
Vol 505 ◽  
Author(s):  
L. G. Jacobsohn ◽  
D. C. Reigada ◽  
F. L. Freire ◽  
R. Prioli ◽  
S. I. Zanette ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Internal Stress ◽  
Rutherford Backscattering Spectrometry ◽  
Argon Plasma ◽  
Carbon Films ◽  
Elastic Recoil ◽  
Dc Magnetron Sputtering ◽  
Elastic Recoil Detection ◽  
Mechanical And Tribological Properties ◽  
Film Hardness

ABSTRACTAmorphous carbon-germanium films were grown by dc-magnetron sputtering at different argon plasma pressures ranging from 0.17 and 1.4 Pa. The water-cooled sample holder was grounded. The film thickness were typically 0.5 μm. The ratio between germanium and carbon atomic concentration ranges up to 2.8, as measured by Rutherford backscattering spectrometry (RBS). Elastic recoil detection technique was used to measure hydrogen contamination. The film hardness was measured by nanoindentation techniques and the internal stress was determined by the bending of the substrate. The incorporation of Ge reduces both the film hardness and the internal stress. Hardness and internal stress increases when the films are deposited in lower pressures. Atomic Force Microscopy (AFM) was used to measure the surface roughness, which was found to be insensitive to the pressure and to the Ge content. A possible influence of the thickness on the morphology of pure carbon films is discussed. The friction coefficient measured by AFM is independent on the film composition within experimental errors.

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