scholarly journals Effect of Ti-Al cathode grain size on plasma generation and thin film synthesis from a direct current vacuum arc plasma source

AIP Advances ◽  
2019 ◽  
Vol 9 (4) ◽  
pp. 045008
Author(s):  
Igor Zhirkov ◽  
Andrejs Petruhins ◽  
Peter Polcik ◽  
Szilard Kolozsvári ◽  
Johanna Rosen
Keyword(s):  
Thin Film ◽  
Grain Size ◽  
Direct Current ◽  
Plasma Source ◽  
Vacuum Arc ◽  
Arc Plasma ◽  
Plasma Generation ◽  
Film Synthesis

scholarly journals Vacuum arc plasma generation and thin film deposition from a TiB2cathode

2015 ◽  
Vol 107 (18) ◽  
pp. 184103 ◽  
Author(s):  
Igor Zhirkov ◽  
Andrejs Petruhins ◽  
Lars-Ake Naslund ◽  
Szilard Kolozsvári ◽  
Peter Polcik ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Vacuum Arc ◽  
Arc Plasma ◽  
Plasma Generation

scholarly journals Thin Film Synthesis Using Miniature Pulsed Metal Vapor Vacuum arc Plasma Guns

1990 ◽  
Vol 190 ◽  
Author(s):  
X. Godechot ◽  
M. B. Salmeron ◽  
D. F. Ogletree ◽  
J. E. Galvin ◽  
R. A. Macgill ◽  
...  
Keyword(s):  
Thin Film ◽  
Metal Vapor ◽  
Vacuum Arc ◽  
Arc Plasma ◽  
Film Synthesis ◽  
Plasma Guns

Automatically reigniting dc vacuum arc plasma source

2002 ◽  
Vol 73 (8) ◽  
pp. 2971-2973 ◽  
Author(s):  
Liuhe Li ◽  
Tao Zhang ◽  
Paul K. Chu ◽  
Ian G. Brown
Keyword(s):  
Plasma Source ◽  
Vacuum Arc ◽  
Arc Plasma

High efficiency filtered vacuum-arc plasma source

2004 ◽  
Author(s):  
I.I. Aksenov ◽  
V.V. Vasilyev ◽  
A.A. Luchaninov ◽  
A.O. Omarov ◽  
V.E. Strel'nitskij ◽  
...  
Keyword(s):  
High Efficiency ◽  
Plasma Source ◽  
Vacuum Arc ◽  
Arc Plasma

Al and Zn film deposition using a vacuum arc plasma source with a refractory anode

2010 ◽  
Vol 205 (7) ◽  
pp. 2369-2374 ◽  
Author(s):  
I.I. Beilis ◽  
Y. Koulik ◽  
R.L. Boxman ◽  
D. Arbilly
Keyword(s):  
Plasma Source ◽  
Film Deposition ◽  
Vacuum Arc ◽  
Arc Plasma

Simple filtered repetitively pulsed vacuum arc plasma source

2010 ◽  
Vol 81 (2) ◽  
pp. 023506 ◽  
Author(s):  
Yu. Chekh ◽  
I. S. Zhirkov ◽  
M. P. Delplancke-Ogletree
Keyword(s):  
Plasma Source ◽  
Vacuum Arc ◽  
Arc Plasma

Streaming metal plasma generation by vacuum arc plasma guns

1998 ◽  
Vol 69 (2) ◽  
pp. 801-803 ◽  
Author(s):  
R. A. MacGill ◽  
M. R. Dickinson ◽  
A. Anders ◽  
O. R. Monteiro ◽  
I. G. Brown
Keyword(s):  
Vacuum Arc ◽  
Arc Plasma ◽  
Plasma Generation ◽  
Metal Plasma ◽  
Plasma Guns

scholarly journals Optical emission spectra of a copper plasma produced by a metal vapour vacuum arc plasma source

2001 ◽  
Vol 34 (12) ◽  
pp. 1928-1932 ◽  
Author(s):  
B Yotsombat ◽  
S Davydov ◽  
P Poolcharuansin ◽  
T Vilaithong ◽  
I G Brown
Keyword(s):  
Emission Spectra ◽  
Optical Emission ◽  
Plasma Source ◽  
Vacuum Arc ◽  
Arc Plasma ◽  
Metal Vapour ◽  
Optical Emission Spectra ◽  
Copper Plasma

Study on Two Plasma Physical Vapor Deposition Methods for Preparing Ultrafine Al Powders

2014 ◽  
Vol 556-562 ◽  
pp. 81-85
Author(s):  
Qiong Yu ◽  
Ming Li Li ◽  
Song Ji ◽  
Kun Ming Qian ◽  
Yu Song Zhou
Keyword(s):  
Particle Size ◽  
Grain Size ◽  
Direct Current ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
Arc Plasma ◽  
Deposition Method ◽  
Micro Structure ◽  
Physical Vapor Deposition Method ◽  
Better Than

Plasma physical vapor deposition method was most widely used to prepare ultrafine Al powders. Direct Current Arc Plasma (DCAP) and Radio Frequency Induction Plasma (RFIP) were adopted individually to produce Al powders with different particle size. The micro structure such as grain size, morphology and crystal phase was examined by SEM, TEM and XRD methods. The results show that the Al production by RFIP was better than by DCAP. DCAP has outstanding advantages in producing nanoAl powders with the particle size below 300nm while the RFIP is better to produce Al powders with the particle size 300nm to 1 μm.

Sign in / Sign up

Export Citation Format

Share Document