All-optical quantum thermometry based on spin-level cross-relaxation and multicenter entanglement under ambient conditions in SiC

A. N. Anisimov; V. A. Soltamov; I. D. Breev; R. A. Babunts; E. N. Mokhov; G. V. Astakhov; V. Dyakonov; D. R. Yakovlev; D. Suter; P. G. Baranov

doi:10.1063/1.5037158

All-optical quantum thermometry based on spin-level cross-relaxation and multicenter entanglement under ambient conditions in SiC

AIP Advances ◽

10.1063/1.5037158 ◽

2018 ◽

Vol 8 (8) ◽

pp. 085304 ◽

Cited By ~ 4

Author(s):

A. N. Anisimov ◽

V. A. Soltamov ◽

I. D. Breev ◽

R. A. Babunts ◽

E. N. Mokhov ◽

...

Keyword(s):

Cross Relaxation ◽

Ambient Conditions ◽

Spin Level ◽

All Optical

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Spin centers in SiC for all-optical nanoscale quantum sensing under ambient conditions

JETP Letters ◽

10.1134/s0021364016140010 ◽

2016 ◽

Vol 104 (2) ◽

pp. 82-87 ◽

Cited By ~ 3

Author(s):

A. N. Anisimov ◽

R. A. Babunts ◽

S. V. Kidalov ◽

E. N. Mokhov ◽

V. A. Soltamov ◽

...

Keyword(s):

Ambient Conditions ◽

All Optical ◽

Quantum Sensing

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All-Optical Phosphorene Phase Modulator with Enhanced Stability Under Ambient Conditions

Laser & Photonics Review ◽

10.1002/lpor.201800016 ◽

2018 ◽

Vol 12 (6) ◽

pp. 1800016 ◽

Cited By ~ 88

Author(s):

Yunzheng Wang ◽

Feng Zhang ◽

Xian Tang ◽

Xing Chen ◽

Yunxiang Chen ◽

...

Keyword(s):

Phase Modulator ◽

Ambient Conditions ◽

All Optical ◽

Enhanced Stability

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From partial to complete optical erasure of azobenzene–polymer gratings: effect of molecular weight

Journal of Materials Chemistry C ◽

10.1039/c5tc01776a ◽

2015 ◽

Vol 3 (42) ◽

pp. 11011-11016 ◽

Cited By ~ 27

Author(s):

Jaana Vapaavuori ◽

Robin H. A. Ras ◽

Matti Kaivola ◽

C. Geraldine Bazuin ◽

Arri Priimagi

Keyword(s):

Modulation Depth ◽

Complex Surface ◽

Ambient Conditions ◽

Azobenzene Polymer ◽

High Modulation ◽

All Optical ◽

Surface Patterns ◽

Spatially Varying ◽

Polymer Gratings ◽

Grating Vector

We demonstrate complete all-optical erasure of high-modulation-depth azopolymer surface patterns at ambient conditions. Applying selective optical erasure and rewriting can be translated into complex surface patterns with spatially varying grating vector directions.

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Correlation analysis of radiation damage

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100108210 ◽

1978 ◽

Vol 36 (1) ◽

pp. 214-215

Author(s):

R. Hegerl ◽

A. Feltynowski ◽

B. Grill

Keyword(s):

Electron Microscopy ◽

Independent Random Variables ◽

Optical Parameters ◽

Bright Field Image ◽

Bright Field ◽

Expectation Value ◽

All Optical ◽

Image Element ◽

Stochastic Series ◽

The Common

Till now correlation functions have been used in electron microscopy for two purposes: a) to find the common origin of two micrographs representing the same object, b) to check the optical parameters e. g. the focus. There is a third possibility of application, if all optical parameters are constant during a series of exposures. In this case all differences between the micrographs can only be caused by different noise distributions and by modifications of the object induced by radiation.Because of the electron noise, a discrete bright field image can be considered as a stochastic series Pm,where i denotes the number of the image and m (m = 1,.., M) the image element. Assuming a stable object, the expectation value of Pm would be Ηm for all images. The electron noise can be introduced by addition of stationary, mutual independent random variables nm with zero expectation and the variance. It is possible to treat the modifications of the object as a noise, too.

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