Optimization of process parameters for RF sputter deposition of tin-nitride thin-films

2018 ◽  
Author(s):  
Teena Jangid ◽  
G. Mohan Rao
Keyword(s):  
Thin Films ◽  
Process Parameters ◽  
Sputter Deposition ◽  
Optimization Of Process Parameters ◽  
Tin Nitride ◽  
Rf Sputter Deposition

Rf-sputter deposition of boron nitride thin films

1991 ◽  
Vol 59-60 ◽  
pp. 341-343 ◽  
Author(s):  
Kikkawa Shinichi ◽  
Takahashi Mari ◽  
Gu Xiaoyi ◽  
Kanamaru Fumikazu ◽  
Katayama Saichi ◽  
...  
Keyword(s):  
Thin Films ◽  
Boron Nitride ◽  
Sputter Deposition ◽  
Rf Sputter Deposition

Interface Reaction Behavior between Mn and SiO2 Formed by RF Sputter Deposition

2012 ◽  
Vol 508 ◽  
pp. 48-51
Author(s):  
Byeong Taek Bae ◽  
Hideaki Nakano ◽  
Junichi Koike
Keyword(s):  
Thin Films ◽  
Barrier Layer ◽  
Reaction Layer ◽  
Interface Reaction ◽  
Sputter Deposition ◽  
Reaction Behavior ◽  
Post Annealing ◽  
Rf Sputter Deposition ◽  
Adsorbed Moisture

The Present Work Investigated the Effects of Adsorbed Moisture in Substrates on the Growth of a Self-Forming Barrier Layer between Mn and SiO2. In Order to Control the Adsorbed Moisture, the Substrates of TEOS-SiO2/Si Were Pre-Annealed in Vacuum at Various Temperatures. Then, Mn Thin Films Were Deposited on the Substrate with or without Pre-Annealing. The Results of Interface Reaction after Additional Post-Annealing Indicated that an Interface Reaction Layer Becomes Thinner with Decreasing the Adsorbed Moisture in the SiO2Substrates.

RF-Sputter Deposition of Nd1-xSrxCoO3 Oriented Thin Films

2007 ◽  
Author(s):  
L MALAVASI ◽  
C SANNA ◽  
N LAMPIS ◽  
A LEHMANN ◽  
C TEALDI ◽  
...  
Keyword(s):  
Thin Films ◽  
Sputter Deposition ◽  
Rf Sputter Deposition

Growth of Mn-doped ZnO thin films by rf-sputter deposition and lattice relaxation by energetic ion impact

2015 ◽  
Vol 350 ◽  
pp. 31-37 ◽  
Author(s):  
N. Matsunami ◽  
M. Itoh ◽  
M. Kato ◽  
S. Okayasu ◽  
M. Sataka ◽  
...  
Keyword(s):  
Thin Films ◽  
Lattice Relaxation ◽  
Sputter Deposition ◽  
Zno Thin Films ◽  
Doped Zno ◽  
Ion Impact ◽  
Mn Doped ◽  
Rf Sputter Deposition

scholarly journals XRD Characterization of AlN Thin Films Prepared by Reactive RF-Sputter Deposition

2013 ◽  
Vol 03 (01) ◽  
pp. 101-107 ◽  
Author(s):  
N. Matsunami ◽  
H. Kakiuchida ◽  
M. Sataka ◽  
S. Okayasu
Keyword(s):  
Thin Films ◽  
Sputter Deposition ◽  
Rf Sputter Deposition
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