Growth and morphological evolution of c-axis oriented AlN films on Si (100) substrates by DC sputtering technique

2018 ◽  
Author(s):  
Akhilesh Pandey ◽  
Ravi Prakash ◽  
Shankar Dutta ◽  
Sandeep Dalal ◽  
Anand Kumar ◽  
...  
Keyword(s):  
Morphological Evolution ◽  
Dc Sputtering ◽  
Dc Sputtering Technique

Low-temperature deposition of ZnO thin films on PET and glass substrates by DC-sputtering technique

2006 ◽  
Vol 496 (1) ◽  
pp. 112-116 ◽  
Author(s):  
A.N. Banerjee ◽  
C.K. Ghosh ◽  
K.K. Chattopadhyay ◽  
Hideki Minoura ◽  
Ajay K. Sarkar ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Zno Thin Films ◽  
Glass Substrates ◽  
Dc Sputtering ◽  
Low Temperature Deposition ◽  
Temperature Deposition ◽  
Dc Sputtering Technique

Nd2-XCeXCuO4±delta/Nd2CuO4 Ultra-Thin Films Grown by DC Sputtering Technique

2017 ◽  
Author(s):  
A. Guarino ◽  
N. Martucciello ◽  
A. Ubaldini ◽  
G. Grimaldi ◽  
A. Nigro ◽  
...  
Keyword(s):  
Thin Films ◽  
Dc Sputtering ◽  
Dc Sputtering Technique

Microstructure of ZnO films produced by reactive DC sputtering technique

1991 ◽  
Vol 108 (3-4) ◽  
pp. 534-540 ◽  
Author(s):  
S. Ghosh ◽  
A. Sarkar ◽  
S. Bhattacharya ◽  
S. Chaudhuri ◽  
A.K. Pal
Keyword(s):  
Zno Films ◽  
Dc Sputtering ◽  
Dc Sputtering Technique

ULTRATHIN SUPERCONDUCTING YBa2Cu3O7-δ FILMS OBTAINED BY HIGH OXYGEN PRESSURE DC SPUTTERING TECHNIQUE

2000 ◽  
Vol 14 (25n27) ◽  
pp. 2640-2645 ◽  
Author(s):  
M. A. BOFFA ◽  
A. M. CUCOLO
Keyword(s):  
Buffer Layer ◽  
Oxygen Pressure ◽  
Unit Cell ◽  
High Oxygen ◽  
Superconducting Properties ◽  
X Ray Diffraction ◽  
X Ray ◽  
Dc Sputtering ◽  
High Oxygen Pressure ◽  
Dc Sputtering Technique

Ultrathin YBa 2 Cu 3 O 7-x films with thicknesses ranging from 24 Å to 300 Å have been grown by high oxygen pressure sputtering technique on (100)K SrTiO 3 substrates without any additional buffer layer. These samples have been characterized by means of X-Ray diffraction and transport measurements. The thickness was calibrated by using the low angle X-Ray diffraction thecnique. The superconducting properties indicated no degradation of the resistive T c (ρ=0)=89 K for the 300 Å samples, while T c (ρ=0)=35.3 K was measured on the 3 unit cell thick films.

Characterization of Nd2−xCexCuO4±δ (x = 0 and 0.15) Ultrathin Films Grown by DC Sputtering Technique

2017 ◽  
Vol 27 (4) ◽  
pp. 1-4 ◽  
Author(s):  
A. Guarino ◽  
P. Romano ◽  
F. Avitabile ◽  
A. Leo ◽  
N. Martucciello ◽  
...  
Keyword(s):  
Ultrathin Films ◽  
Dc Sputtering ◽  
Dc Sputtering Technique
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