The influence of titanium adhesion layer oxygen stoichiometry on thermal boundary conductance at gold contacts

2018 ◽  
Vol 112 (17) ◽  
pp. 171602 ◽  
Author(s):  
David H. Olson ◽  
Keren M. Freedy ◽  
Stephen J. McDonnell ◽  
Patrick E. Hopkins
Keyword(s):  
Oxygen Stoichiometry ◽  
Adhesion Layer ◽  
Thermal Boundary Conductance ◽  
Gold Contacts

scholarly journals Tuning the Electrical Properties of NiO Thin Films by Stoichiometry and Microstructure

Coatings ◽  
2021 ◽  
Vol 11 (6) ◽  
pp. 697
Author(s):  
Yu-He Liu ◽  
Xiao-Yan Liu ◽  
Hui Sun ◽  
Bo Dai ◽  
Peng Zhang ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Energy Loss ◽  
Single Crystal ◽  
Oxygen Stoichiometry ◽  
High Resistivity ◽  
Edge Structure ◽  
Glass Substrates ◽  
Lower Resistivity

Here, the electrical properties of NiO thin films grown on glass and Al2O3 (0001) substrates have been investigated. It was found that the resistivity of NiO thin films strongly depends on oxygen stoichiometry. Nearly perfect stoichiometry yields extremely high resistivity. In contrast, off-stoichiometric thin films possess much lower resistivity, especially for oxygen-rich composition. A side-by-side comparison of energy loss near the edge structure spectra of Ni L3 edges between our NiO thin films and other theoretical spectra rules out the existence of Ni3+ in NiO thin films, which contradicts the traditional hypothesis. In addition, epitaxial NiO thin films grown on Al2O3 (0001) single crystal substrates exhibit much higher resistivity than those on glass substrates, even if they are deposited simultaneously. This feature indicates the microstructure dependence of electrical properties.

PEALD of a Ruthenium Adhesion Layer for Copper Interconnects

2004 ◽  
Vol 151 (12) ◽  
pp. C753 ◽  
Author(s):  
Oh-Kyum Kwon ◽  
Se-Hun Kwon ◽  
Hyoung-Sang Park ◽  
Sang-Won Kang
Keyword(s):  
Copper Interconnects ◽  
Adhesion Layer

Dependence of the conductivity noise of metallic oxide interconnects on the oxygen stoichiometry: a study of

1997 ◽  
Vol 30 (24) ◽  
pp. L75-L79 ◽  
Author(s):  
Arindam Ghosh ◽  
A K Raychaudhuri ◽  
R Sreekala ◽  
M Rajeswari ◽  
T Venkatesan
Keyword(s):  
Oxygen Stoichiometry ◽  
Metallic Oxide

scholarly journals Oxygen stoichiometry and transport properties of cerium niobate

2008 ◽  
Vol 179 (21-26) ◽  
pp. 1061-1065 ◽  
Author(s):  
Fride Vullum ◽  
Tor Grande
Keyword(s):  
Transport Properties ◽  
Oxygen Stoichiometry
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