Recycling of laser and plasma radiation energy for enhancement of extreme ultraviolet sources for nanolithography

2018 ◽  
Vol 123 (1) ◽  
pp. 013302 ◽  
Author(s):  
V. Sizyuk ◽  
T. Sizyuk ◽  
A. Hassanein ◽  
K. Johnson
Keyword(s):  
Extreme Ultraviolet ◽  
Radiation Energy ◽  
Plasma Radiation

scholarly journals Photo-ionized neon plasmas induced by radiation pulses of a laser-plasma EUV source and a free electron laser FLASH

2013 ◽  
Vol 31 (2) ◽  
pp. 195-201 ◽  
Author(s):  
A. Bartnik ◽  
R. Fedosejevs ◽  
P. Wachulak ◽  
H. Fiedorowicz ◽  
C. Serbanescu ◽  
...  
Keyword(s):  
Free Electron ◽  
Free Electron Laser ◽  
Extreme Ultraviolet ◽  
Spectral Characteristics ◽  
Emission Spectra ◽  
Spectral Lines ◽  
Plasma Radiation ◽  
Beam Radiation ◽  
Radiation Beam ◽  
Ionized Plasmas

AbstractIn this work, a laser-produced plasma extreme ultraviolet source and a free electron laser were used to create Ne photo-ionized plasmas. In both cases, a radiation beam was focused onto a gas stream injected into a vacuum chamber synchronously with the radiation pulse. Extreme ultraviolet radiation from the plasma spanned a wide spectral range with pronounced maximum centered at λ = 11 ± 1 nm while the free electron laser pulses were emitted at a wavelength of 32 nm. The power density of the focused plasma radiation was approximately 2 × 107 W/cm2 and was seven orders of magnitude lower compared with the focused free electron laser beam. Radiation fluences in both experimental conditions were comparable. Despite quite different spectral characteristics and extremely different power densities, emission spectra of both photo-ionized plasmas consist of the same spectral lines within a wavelength range of 20 to 50 nm, however, with different relative intensities of the corresponding lines. The dominating spectral lines originated from singly charged ions (Ne II); however, Ne III lines were also detected. Additionally, computer simulations of the emission spectra, obtained for photo-ionized plasmas, driven by the plasma extreme ultraviolet source, were performed. The corresponding measured and calculated spectra are presented. An electron temperature and ionic composition were estimated. Differences between the experimental spectra, obtained for both irradiation conditions, were analyzed. The differences were attributed mainly to different energies of driving photons.

scholarly journals Simulation and mitigation of the magneto-Rayleigh-Taylor instabilities in Z-pinch gas discharge extreme ultraviolet plasma radiation sources

2013 ◽  
Vol 20 (11) ◽  
pp. 112113 ◽  
Author(s):  
B. Huang ◽  
T. Tomizuka ◽  
B. Xie ◽  
Y. Sakai ◽  
Q. Zhu ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Gas Discharge ◽  
Plasma Radiation ◽  
Radiation Sources ◽  
Z Pinch

Plasma radiation dynamics with the upgraded Absolute Extreme Ultraviolet tomographical system in the Tokamak à Configuration Variable

2013 ◽  
Vol 84 (12) ◽  
pp. 123508 ◽  
Author(s):  
B. Tal ◽  
B. Labit ◽  
D. Nagy ◽  
R. Chavan ◽  
B. Duval ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Plasma Radiation

Pinch Plasma Radiation Sources for the Extreme Ultraviolet

2001 ◽  
Vol 41 (6) ◽  
pp. 589-597 ◽  
Author(s):  
W. Neff ◽  
K. Bergmann ◽  
O. Rosier ◽  
R. Lebert ◽  
L. Juschkin
Keyword(s):  
Extreme Ultraviolet ◽  
Plasma Radiation ◽  
Pinch Plasma ◽  
Radiation Sources

A pump-probe photoionization mass spectrometer utilizing tunable extreme ultraviolet laser-produced-plasma radiation

2000 ◽  
Vol 71 (3) ◽  
pp. 1319-1324 ◽  
Author(s):  
R. Flesch ◽  
M. C. Schürmann ◽  
M. Hunnekuhl ◽  
H. Meiss ◽  
J. Plenge ◽  
...  
Keyword(s):  
Mass Spectrometer ◽  
Extreme Ultraviolet ◽  
Plasma Radiation ◽  
Pump Probe ◽  
Ultraviolet Laser ◽  
Laser Produced Plasma

A multi-kilohertz pinch plasma radiation source for extreme ultraviolet lithography

2001 ◽  
Vol 57-58 ◽  
pp. 71-77 ◽  
Author(s):  
Klaus Bergmann ◽  
Oliver Rosier ◽  
Rainer Lebert ◽  
Willi Neff ◽  
Reinhart Poprawe
Keyword(s):  
Radiation Source ◽  
Extreme Ultraviolet ◽  
Plasma Radiation ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Pinch Plasma

scholarly journals Ptychographic imaging with partially coherent plasma EUV sources

2017 ◽  
Vol 6 (6) ◽  
Author(s):  
Jan Bußmann ◽  
Michal Odstrčil ◽  
Yusuke Teramoto ◽  
Larissa Juschkin
Keyword(s):  
High Resolution ◽  
Extreme Ultraviolet ◽  
High Harmonic ◽  
Visible Spectral Range ◽  
Image Resolution ◽  
Plasma Radiation ◽  
Photon Flux ◽  
Light Sources ◽  
Range Image ◽  
Diffractive Imaging

AbstractWe report on high-resolution lens-less imaging experiments based on ptychographic scanning coherent diffractive imaging (CDI) method employing compact plasma sources developed for extreme ultraviolet (EUV) lithography applications. Two kinds of discharge sources were used in our experiments: a hollow-cathode-triggered pinch plasma source operated with oxygen and for the first time a laser-assisted discharge EUV source with a liquid tin target. Ptychographic reconstructions of different samples were achieved by applying constraint relaxation to the algorithm. Our ptychography algorithms can handle low spatial coherence and broadband illumination as well as compensate for the residual background due to plasma radiation in the visible spectral range. Image resolution down to 100 nm is demonstrated even for sparse objects, and it is limited presently by the sample structure contrast and the available coherent photon flux. We could extract material properties by the reconstruction of the complex exit-wave field, gaining additional information compared to electron microscopy or CDI with longer-wavelength high harmonic laser sources. Our results show that compact plasma-based EUV light sources of only partial spatial and temporal coherence can be effectively used for lens-less imaging applications. The reported methods may be applied in combination with reflectometry and scatterometry for high-resolution EUV metrology.

THOMSON SCATTERING WITH A HIGH BACKGROUND LEVEL OF PLASMA RADIATION

1979 ◽  
Vol 40 (C7) ◽  
pp. C7-851-C7-852
Author(s):  
B. Van der Sijde ◽  
T. Poorter ◽  
S. Adema ◽  
B. F.M. Pots ◽  
D. C. Schram
Keyword(s):  
Background Level ◽  
Thomson Scattering ◽  
Plasma Radiation ◽  
High Background
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