A pump-probe photoionization mass spectrometer utilizing tunable extreme ultraviolet laser-produced-plasma radiation

2000 ◽  
Vol 71 (3) ◽  
pp. 1319-1324 ◽  
Author(s):  
R. Flesch ◽  
M. C. Schürmann ◽  
M. Hunnekuhl ◽  
H. Meiss ◽  
J. Plenge ◽  
...  
Keyword(s):  
Mass Spectrometer ◽  
Extreme Ultraviolet ◽  
Plasma Radiation ◽  
Pump Probe ◽  
Ultraviolet Laser ◽  
Laser Produced Plasma

scholarly journals Nanoimaging with a compact extreme-ultraviolet laser

2005 ◽  
Vol 30 (16) ◽  
pp. 2095 ◽  
Author(s):  
G. Vaschenko ◽  
F. Brizuela ◽  
C. Brewer ◽  
M. Grisham ◽  
H. Mancini ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Ultraviolet Laser

Fabrication of metallic micropatterns using table top extreme ultraviolet laser interferometric lithography

2008 ◽  
Vol 17 (2) ◽  
pp. 024019 ◽  
Author(s):  
L Ottaviano ◽  
F Bussolotti ◽  
S Piperno ◽  
M Rinaldi ◽  
S Santucci ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Ultraviolet Laser ◽  
Interferometric Lithography ◽  
Laser Interferometric

scholarly journals Extreme-ultraviolet laser metrology of O i transitions

2008 ◽  
Vol 389 (1) ◽  
pp. L4-L7 ◽  
Author(s):  
T. I. Ivanov ◽  
E. J. Salumbides ◽  
M. O. Vieitez ◽  
P. C. Cacciani ◽  
C. A. de Lange ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Ultraviolet Laser ◽  
Laser Metrology

scholarly journals Pump-Probe Delay Controlled by Laser-dressed Ionization with Isolated Attosecond Pulses

2021 ◽  
Vol 255 ◽  
pp. 13004
Author(s):  
Martin Luttmann ◽  
David Bresteau ◽  
Thierry Ruchon
Keyword(s):  
Pulse Train ◽  
Femtosecond Pulse ◽  
Photoelectron Spectrum ◽  
Large Range ◽  
Extreme Ultraviolet ◽  
Pump Probe ◽  
Gas Target ◽  
Probe Delay ◽  
Attosecond Pulses ◽  
The Mean

In a recent work [1], we demonstrated how laser-dressed ionization can be harnessed to control with attosecond accuracy the time delay between an extreme-ultraviolet (XUV) attosecond pulse train and an infrared (IR) femtosecond pulse. In this case, the comb-like photoelectron spectrum obtained by ionizing a gas target with the two superimposed beams exhibits peaks oscillating with the delay. Two of them can be found to oscillate in phase quadrature, allowing an optimal measurement and stabilization of the delay over a large range. Here we expand this technique to isolated attosecond pulses, by taking advantage of the delay-modulation of attosecond streaking traces. Although the photoelectron spectrum contains no peaks in that case, it is possible to reconstruct the pump-probe delay by simply monitoring the mean energy of the spectrum and the amplitude at this energy. In general, we find that active delay stabilization based on laser-dressed ionization is possible as long as the XUV pulses are chirped.

Recycling of laser and plasma radiation energy for enhancement of extreme ultraviolet sources for nanolithography

2018 ◽  
Vol 123 (1) ◽  
pp. 013302 ◽  
Author(s):  
V. Sizyuk ◽  
T. Sizyuk ◽  
A. Hassanein ◽  
K. Johnson
Keyword(s):  
Extreme Ultraviolet ◽  
Radiation Energy ◽  
Plasma Radiation

Laser-produced plasma light source for extreme ultraviolet lithography

2013 ◽  
Vol 6 (1) ◽  
pp. 20-33
Author(s):  
窦银萍 DOU Yin-ping ◽  
孙长凯 SUN Chang-kai ◽  
林景全 LIN Jing-quan
Keyword(s):  
Light Source ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Laser Produced Plasma

Research progress on laser-produced plasma light source for 13.5 nm extreme ultraviolet lithography

2020 ◽  
Vol 13 (1) ◽  
pp. 28-42
Author(s):  
宗 楠 ZONG Nan ◽  
胡蔚敏 HU Wei-min ◽  
王志敏 WANG Zhi-min ◽  
王小军 WANG Xiao-jun ◽  
张申金 ZHANG Shen-jin ◽  
...  
Keyword(s):  
Light Source ◽  
Extreme Ultraviolet ◽  
Research Progress ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Laser Produced Plasma
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