A high bandwidth three-axis out-of-plane motion measurement system based on optical beam deflection

2018 ◽  
Vol 89 (3) ◽  
pp. 035003 ◽  
Author(s):  
P. Piyush ◽  
M. S. Giridhar ◽  
G. R. Jayanth
Keyword(s):  
Measurement System ◽  
Plane Motion ◽  
Optical Beam ◽  
Beam Deflection ◽  
Motion Measurement ◽  
Out Of Plane ◽  
High Bandwidth

A two-axis in-plane motion measurement system based on optical beam deflection

2013 ◽  
Vol 84 (10) ◽  
pp. 105001 ◽  
Author(s):  
R. Sriramshankar ◽  
R. Sri Muthu Mrinalini ◽  
G. R. Jayanth
Keyword(s):  
Measurement System ◽  
Plane Motion ◽  
Optical Beam ◽  
Beam Deflection ◽  
Motion Measurement

Nano-Manipulation Device With Parallel Kinematic Micro-Positioning Stage and Integrated Active Cantilever

2009 ◽  
Author(s):  
Jingyan Dong ◽  
Placid M. Ferreira
Keyword(s):  
Plane Motion ◽  
Silicon On Insulator ◽  
Three Dimensions ◽  
Driving Voltage ◽  
Ambient Conditions ◽  
Positioning Stage ◽  
Out Of Plane ◽  
Motion Range ◽  
High Bandwidth ◽  
Parallel Kinematic

This paper discusses the design, analysis, fabrication and characterization of a MEMS device for nano-manufacturing and nano-metrology applications. The device includes an active cantilever as its manipulator that is integrated with a high-bandwidth two degree-of-freedom translational (XY) micro positioning stage. The cantilever is actuated electrostatically through a separate electrode that is fabricated underneath the cantilever. Torsion bars that connect the cantilever to the rest of the structure provide the required compliance for cantilever’s out-of-plane rotation. The active cantilever is carried by a micro-positioning stage, which enables high-bandwidth scanning to allow manipulation in three dimensions. The design of the MEMS (Micro-Electro-Mechanical Systems) stage is based on a parallel kinematic mechanism (PKM). The PKM design decouples the motion in the X and Y directions and restricts rotations in the XY plane while allowing for an increased motion range with linear kinematics in the operating region (or workspace). The truss-like structure of the PKM also results in increased stiffness and reduced mass of the stage. The integrated cantilever device is fabricated on a Silicon-On-Insulator (SOI) wafer using surface micromachining and deep reactive ion etching (DRIE) processes. The actuation electrode of the cantilever is fabricated on the handle layer, while the cantilever and XY stage are at the device layer of the SOI wafer. Two sets of electrostatic linear comb drives are used to actuate the stage mechanism in X and Y directions. The cantilever provides an out-of-plane motion of 7 microns at 4.5V, while the XY stage provides a motion range of 24 microns in each direction at the driving voltage of 180V. The resonant frequency of the XY stage under ambient conditions is 2090 Hz. A high quality factor (∼210) is achieved from this parallel kinematics XY stage. The fabricated stages will be adapted as chip-scale manufacturing and metrology devices for nanomanufacturing and nano-metrology applications.

Systematic characterization of optical beam deflection measurement system for micro and nanomechanical systems

Measurement ◽  
2014 ◽  
Vol 56 ◽  
pp. 104-116 ◽  
Author(s):  
R.W. Herfst ◽  
W.A. Klop ◽  
M. Eschen ◽  
T.C. van den Dool ◽  
N.B. Koster ◽  
...  
Keyword(s):  
Measurement System ◽  
Optical Beam ◽  
Beam Deflection ◽  
Deflection Measurement ◽  
Nanomechanical Systems

Development of multi-environment dual-probe atomic force microscopy system using optical beam deflection sensors with vertically incident laser beams

2013 ◽  
Vol 84 (8) ◽  
pp. 083701 ◽  
Author(s):  
Eika Tsunemi ◽  
Kei Kobayashi ◽  
Noriaki Oyabu ◽  
Masaharu Hirose ◽  
Yoshiko Takenaka ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Optical Beam ◽  
Laser Beams ◽  
Beam Deflection ◽  
Incident Laser ◽  
Force Microscopy ◽  
Atomic Force ◽  
Dual Probe

Multi-Probe Atomic Force Microscopy with Optical Beam Deflection Method

2007 ◽  
Vol 46 (8B) ◽  
pp. 5636-5638 ◽  
Author(s):  
Eika Tsunemi ◽  
Nobuo Satoh ◽  
Yuji Miyato ◽  
Kei Kobayashi ◽  
Kazumi Matsushige ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Optical Beam ◽  
Beam Deflection ◽  
Force Microscopy ◽  
Atomic Force

Out-of-Plane Motion Effects in Microscopic Particle Image Velocimetry

2003 ◽  
Vol 125 (5) ◽  
pp. 895-901 ◽  
Author(s):  
Michael G. Olsen ◽  
Chris J. Bourdon
Keyword(s):  
Particle Image Velocimetry ◽  
Particle Image ◽  
Laser Sheet ◽  
Plane Motion ◽  
Entire Volume ◽  
Measurement Volume ◽  
Microscopic Particle ◽  
Image Velocimetry ◽  
Out Of Plane ◽  
Signal Peak

In microscopic particle image velocimetry (microPIV) experiments, the entire volume of a flowfield is illuminated, resulting in all of the particles in the field of view contributing to the image. Unlike in light-sheet PIV, where the depth of the measurement volume is simply the thickness of the laser sheet, in microPIV, the measurement volume depth is a function of the image forming optics of the microscope. In a flowfield with out-of-plane motion, the measurement volume (called the depth of correlation) is also a function of the magnitude of the out-of-plane motion within the measurement volume. Equations are presented describing the depth of correlation and its dependence on out-of-plane motion. The consequences of this dependence and suggestions for limiting its significance are also presented. Another result of the out-of-plane motion is that the height of the PIV signal peak in the correlation plane will decrease. Because the height of the noise peaks will not be affected by the out-of-plane motion, this could lead to erroneous velocity measurements. An equation is introduced that describes the effect of the out-of-plane motion on the signal peak height, and its implications are discussed. Finally, the derived analytical equations are compared to results calculated using synthetic PIV images, and the agreement between the two is seen to be excellent.

Sign in / Sign up

Export Citation Format

Share Document