scholarly journals Characterization of an electrothermal plasma source for fusion transient simulations

2018 ◽  
Vol 123 (3) ◽  
pp. 033301 ◽  
Author(s):  
T. E. Gebhart ◽  
L. R. Baylor ◽  
J. Rapp ◽  
A. L. Winfrey
Keyword(s):  
Plasma Source ◽  
Electrothermal Plasma ◽  
Transient Simulations

scholarly journals Material impacts and heat flux characterization of an electrothermal plasma source with an applied magnetic field

2017 ◽  
Vol 122 (6) ◽  
pp. 063302 ◽  
Author(s):  
T. E. Gebhart ◽  
R. A. Martinez-Rodriguez ◽  
L. R. Baylor ◽  
J. Rapp ◽  
A. L. Winfrey
Keyword(s):  
Magnetic Field ◽  
Heat Flux ◽  
Applied Magnetic Field ◽  
Plasma Source ◽  
Electrothermal Plasma

scholarly journals Merits of microwave plasmas for optical emission spectrometry – characterization of an axially viewed microwave-sustained, inductively coupled, atmospheric-pressure plasma (MICAP)

2020 ◽  
Vol 35 (10) ◽  
pp. 2369-2377
Author(s):  
Helmar Wiltsche ◽  
Matthias Wolfgang
Keyword(s):  
Atmospheric Pressure ◽  
Atmospheric Pressure Plasma ◽  
Optical Emission ◽  
Plasma Source ◽  
Optical Emission Spectrometry ◽  
Emission Spectrometry ◽  
Icp Oes ◽  
Microwave Plasmas ◽  
Inductively Coupled

The MICAP is a microwave driven plasma source employing nitrogen as the plasma gas. In this work we compare LODs and LOQs obtained in axial viewing with those obtained by ICP-OES and evaluate the effect of air instead of nitrogen as the plasma gas.

scholarly journals Characterization of hydrogen plasma in a permanent ring magnet based helicon plasma source for negative ion source research

2019 ◽  
Vol 61 (6) ◽  
pp. 065003 ◽  
Author(s):  
A Pandey ◽  
Debrup Mukherjee ◽  
Dipshikha Borah ◽  
M Bandyopadhyay ◽  
Himanshu Tyagi ◽  
...  
Keyword(s):  
Hydrogen Plasma ◽  
Plasma Source ◽  
Ion Source ◽  
Negative Ion ◽  
Helicon Plasma ◽  
Ring Magnet

Characterization of CNx films prepared by twinned ECR plasma source enhanced DC magnetron sputtering

2001 ◽  
Vol 390 (1-2) ◽  
pp. 107-112 ◽  
Author(s):  
Jun Xu ◽  
Xinlu Deng ◽  
Jialiang Zhang ◽  
Wenqi Lu ◽  
Tengcai Ma
Keyword(s):  
Magnetron Sputtering ◽  
Plasma Source ◽  
Dc Magnetron Sputtering ◽  
Ecr Plasma ◽  
Cnx Films

scholarly journals Characterization of a Plasma Source for Ground-Based Simulation of LEO Plasma Conditions

2004 ◽  
Author(s):  
C. Enloe ◽  
Linda Habash Krause ◽  
M. Geoff McHarg ◽  
Omar Nava ◽  
Paul Shoemaker ◽  
...  
Keyword(s):  
Plasma Source
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