scholarly journals Vortex spin-torque oscillator stabilized by phase locked loop using integrated circuits

AIP Advances ◽  
2017 ◽  
Vol 7 (5) ◽  
pp. 056653 ◽  
Author(s):  
Martin Kreissig ◽  
R. Lebrun ◽  
F. Protze ◽  
K. J. Merazzo ◽  
J. Hem ◽  
...  
2016 ◽  
Vol 9 (5) ◽  
pp. 053005 ◽  
Author(s):  
Shingo Tamaru ◽  
Hitoshi Kubota ◽  
Kay Yakushiji ◽  
Akio Fukushima ◽  
Shinji Yuasa

2015 ◽  
Vol 5 (1) ◽  
Author(s):  
Shingo Tamaru ◽  
Hitoshi Kubota ◽  
Kay Yakushiji ◽  
Shinji Yuasa ◽  
Akio Fukushima

2017 ◽  
Vol 7 (6) ◽  
Author(s):  
Shingo Tamaru ◽  
Hitoshi Kubota ◽  
Kay Yakushiji ◽  
Akio Fukushima ◽  
Shinji Yuasa

2015 ◽  
Author(s):  
S. Tamaru ◽  
H. Kubota ◽  
K. Yakushiji ◽  
S. Yuasa ◽  
A. Fukushima

2020 ◽  
Vol 117 (7) ◽  
pp. 072407
Author(s):  
Lang Zeng ◽  
Xichuan Ma ◽  
Hao-Hsuan Chen ◽  
Yan Zhou ◽  
Deming Zhang ◽  
...  

Author(s):  
M. Kreissig ◽  
S. Wittrock ◽  
R. Lebrun ◽  
S. Menshawy ◽  
F. Protze ◽  
...  

2016 ◽  
Vol 55 (9) ◽  
pp. 093003 ◽  
Author(s):  
Shingo Tamaru ◽  
Hitoshi Kubota ◽  
Kay Yakushiji ◽  
Akio Fukushima ◽  
Shinji Yuasa

2017 ◽  
Vol 122 (12) ◽  
pp. 123903 ◽  
Author(s):  
Alexander A. Mitrofanov ◽  
Ansar R. Safin ◽  
Nikolay N. Udalov ◽  
Mikhail V. Kapranov

Author(s):  
Simon Thomas

Trends in the technology development of very large scale integrated circuits (VLSI) have been in the direction of higher density of components with smaller dimensions. The scaling down of device dimensions has been not only laterally but also in depth. Such efforts in miniaturization bring with them new developments in materials and processing. Successful implementation of these efforts is, to a large extent, dependent on the proper understanding of the material properties, process technologies and reliability issues, through adequate analytical studies. The analytical instrumentation technology has, fortunately, kept pace with the basic requirements of devices with lateral dimensions in the micron/ submicron range and depths of the order of nonometers. Often, newer analytical techniques have emerged or the more conventional techniques have been adapted to meet the more stringent requirements. As such, a variety of analytical techniques are available today to aid an analyst in the efforts of VLSI process evaluation. Generally such analytical efforts are divided into the characterization of materials, evaluation of processing steps and the analysis of failures.


Sign in / Sign up

Export Citation Format

Share Document