scholarly journals Electronic properties of monolayer tungsten disulfide grown by chemical vapor deposition

2016 ◽  
Vol 109 (19) ◽  
pp. 193502 ◽  
Author(s):  
Abdullah Alharbi ◽  
Davood Shahrjerdi
Keyword(s):  
Chemical Vapor Deposition ◽  
Electronic Properties ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Tungsten Disulfide

One-step growth of wafer-scale monolayer tungsten disulfide via hydrogen sulfide assisted chemical vapor deposition

2019 ◽  
Vol 115 (16) ◽  
pp. 163104 ◽  
Author(s):  
Zhiyan Jia ◽  
Jiyu Dong ◽  
Lixuan Liu ◽  
Jianyong Xiang ◽  
Anmin Nie ◽  
...  
Keyword(s):  
Hydrogen Sulfide ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Tungsten Disulfide ◽  
Wafer Scale ◽  
One Step ◽  
Step Growth

Dual‐Additive Assisted Chemical Vapor Deposition for the Growth of Mn‐Doped 2D MoS 2 with Tunable Electronic Properties

Small ◽  
2019 ◽  
Vol 16 (15) ◽  
pp. 1903181 ◽  
Author(s):  
Zhengyang Cai ◽  
Tianze Shen ◽  
Qi Zhu ◽  
Simin Feng ◽  
Qiangmin Yu ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Electronic Properties ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Mn Doped

Controllable synthesis of high quality monolayer WS2 on a SiO2/Si substrate by chemical vapor deposition

RSC Advances ◽  
2015 ◽  
Vol 5 (21) ◽  
pp. 15795-15799 ◽  
Author(s):  
Qi Fu ◽  
Wenhui Wang ◽  
Lei Yang ◽  
Jian Huang ◽  
Jingyu Zhang ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Tungsten Disulfide ◽  
Controllable Synthesis ◽  
Si Substrate ◽  
High Quality ◽  
Device Applications ◽  
Direct Band

Tungsten disulfide (WS2), with its transformation from indirect to direct band transitions when scaled down to a monolayer, exhibits great potential for future micro-device applications.

Tuning the electronic properties of graphene by hydrogenation in a plasma enhanced chemical vapor deposition reactor

Carbon ◽  
2011 ◽  
Vol 49 (13) ◽  
pp. 4420-4426 ◽  
Author(s):  
James S. Burgess ◽  
Bernard R. Matis ◽  
Jeremy T. Robinson ◽  
Felipe A. Bulat ◽  
F. Keith Perkins ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Electronic Properties ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Reactor

Modified Chemical Vapor Deposition Synthesis of Ultralong V2O5 Nanobelt and Its Electronic Properties

2013 ◽  
Vol 13 (2) ◽  
pp. 914-918 ◽  
Author(s):  
Jianing Lu ◽  
Ming Hu ◽  
Ye Tian ◽  
Chuanfei Guo ◽  
Shengming Guo ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Electronic Properties ◽  
Vapor Deposition ◽  
Chemical Vapor
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