scholarly journals High resolution spectrometer for extended x-ray absorption fine structure measurements in the 6 keV to 15 keV energy range

2016 ◽  
Vol 87 (11) ◽  
pp. 11E305
Author(s):  
J. F. Seely ◽  
L. T. Hudson ◽  
Albert Henins ◽  
U. Feldman
Keyword(s):  
Fine Structure ◽  
High Resolution ◽  
Energy Range ◽  
X Ray ◽  
Absorption Fine ◽  
High Resolution Spectrometer ◽  
X Ray Absorption ◽  
Resolution Spectrometer

scholarly journals FDMX: extended X-ray absorption fine structure calculations using the finite difference method

2016 ◽  
Vol 23 (2) ◽  
pp. 551-559 ◽  
Author(s):  
Jay D. Bourke ◽  
Christopher T. Chantler ◽  
Yves Joly
Keyword(s):  
Fine Structure ◽  
Energy Range ◽  
Cross Sections ◽  
Full Potential ◽  
Final State ◽  
X Ray ◽  
Complete Representation ◽  
Absorption Fine ◽  
Energy Dependent ◽  
X Ray Absorption

A new theoretical approach and computational package,FDMX, for general calculations of X-ray absorption fine structure (XAFS) over an extended energy range within a full-potential model is presented. The final-state photoelectron wavefunction is calculated over an energy-dependent spatial mesh, allowing for a complete representation of all scattering paths. The electronic potentials and corresponding wavefunctions are subject to constraints based on physicality and self-consistency, allowing for accurate absorption cross sections in the near-edge region, while higher-energy results are enabled by the implementation of effective Debye–Waller damping and new implementations of second-order lifetime broadening. These include inelastic photoelectron scattering and, for the first time, plasmon excitation coupling. This is the first full-potential package available that can calculate accurate XAFS spectra across a complete energy range within a single framework and without fitted parameters. Example spectra are provided for elemental Sn, rutile TiO2and the FeO6octahedron.

scholarly journals SAXES, a high resolution spectrometer for resonant x-ray emission in the 400–1600eV energy range

2006 ◽  
Vol 77 (11) ◽  
pp. 113108 ◽  
Author(s):  
G. Ghiringhelli ◽  
A. Piazzalunga ◽  
C. Dallera ◽  
G. Trezzi ◽  
L. Braicovich ◽  
...  
Keyword(s):  
High Resolution ◽  
Energy Range ◽  
X Ray ◽  
High Resolution Spectrometer ◽  
Resolution Spectrometer

EFFECT OF HEAT TREATMENT ON MICROSTRUCTURE AND MAGNETOSTRICTIVE PROPERTY OF MELT-SPUN Fe85Ga15 RIBBONS

2013 ◽  
Vol 27 (30) ◽  
pp. 1350174 ◽  
Author(s):  
HAO LIU ◽  
HAIOU WANG ◽  
MENGXIONG CAO ◽  
WEISHI TAN ◽  
YANGGUANG SHI ◽  
...  
Keyword(s):  
Heat Treatment ◽  
Fine Structure ◽  
High Resolution ◽  
Nearest Neighbor ◽  
Annealed Sample ◽  
X Ray Diffraction ◽  
X Ray ◽  
Absorption Fine ◽  
Melt Spun ◽  
X Ray Absorption

In order to study the microstructure of Fe – Ga alloy, Fe 85 Ga 15 ribbons prepared with different wheel velocity were studied by high resolution X-ray diffraction (HRXRD) and extend X-ray absorption fine structure (EXAFS). HRXRD patterns showed that only disordered A 2 phase was observed in as-cast Fe 85 Ga 15 alloy. A modified- DO 3 phase was detected in all of the melt spun samples. The HRXRD associated with EXAFS results indicated that Ga atoms were located as second-nearest neighbor along [100] orientation. A little DO 3 phase was found in ribbons annealed at 1000°C under 0.06 MPa Ar atmosphere. The result of magnetostriction measurement revealed that in the ribbon prepared with higher wheel velocity, more modified- DO 3 phase will enhance the magnetostriction. DO 3 phase in the annealed sample will deteriorate the magnetostrictive properties of Fe – Ga ribbons.

3C-, 4H- and 6H-SiC Bulks Studied by Silicon K-Edge X-Ray Absorption

2013 ◽  
Vol 740-742 ◽  
pp. 573-576 ◽  
Author(s):  
Wei Zeng ◽  
Zhe Chuan Feng ◽  
Rui Sheng Zheng ◽  
Ling Yun Jang ◽  
Chee Wei Liu
Keyword(s):  
Electronic Structure ◽  
Fine Structure ◽  
High Resolution ◽  
Synchrotron Radiation ◽  
Angular Dependence ◽  
Comparative Studies ◽  
X Ray ◽  
Absorption Fine ◽  
X Ray Absorption

High-resolution synchrotron radiation X-ray absorption of Si K-edge have been employed to investigate 6H-, 4H- and 3C-SiC. Detailed analyses of the extended x-ray absorption fine structure are taken by using the IFEFFIT program, and significant results on the atomic bonding are obtained from these comparative studies. The x-ray absorption near-edge structures of the Si K-edge are investigated, and the electronic structure of 3C-, 4H- and 6H-SiC are studied. In order to investigate the angular dependence, the x-ray absorption near-edge spectra were operated at 55o and 90o of the angle between the surface and the X-ray direction.

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