Effect of annealing on the laser induced damage of polished and CO2 laser-processed fused silica surfaces

2016 ◽  
Vol 119 (21) ◽  
pp. 213106 ◽  
Author(s):  
T. Doualle ◽  
L. Gallais ◽  
P. Cormont ◽  
T. Donval ◽  
L. Lamaignère ◽  
...  
Keyword(s):  
Co2 Laser ◽  
Fused Silica ◽  
Silica Surfaces ◽  
Laser Induced Damage

scholarly journals The effect of pulse duration on the growth rate of laser-induced damage sites at 351 nm on fused silica surfaces

2009 ◽  
Author(s):  
R. A. Negres ◽  
M. A. Norton ◽  
Z. M. Liao ◽  
D. A. Cross ◽  
J. D. Bude ◽  
...  
Keyword(s):  
Growth Rate ◽  
Pulse Duration ◽  
Fused Silica ◽  
Silica Surfaces ◽  
Laser Induced Damage

scholarly journals Thin film contamination effects on laser-induced damage of fused silica surfaces at 355 nm

1998 ◽  
Author(s):  
Anne Fornier ◽  
C. Cordillot ◽  
D. Schirman ◽  
Francois Y. Genin ◽  
Alan K. Burnham ◽  
...  
Keyword(s):  
Thin Film ◽  
Fused Silica ◽  
Silica Surfaces ◽  
Laser Induced Damage ◽  
Contamination Effects

scholarly journals Effects of wet etch processing on laser-induced damage of fused silica surfaces

1999 ◽  
Author(s):  
Colin L. Battersby ◽  
Lynn M. Sheehan ◽  
Mark R. Kozlowski
Keyword(s):  
Fused Silica ◽  
Silica Surfaces ◽  
Laser Induced Damage ◽  
Wet Etch

scholarly journals Correlation between Photoluminescence Properties of Surface Defects and Laser-Induced Damage Threshold of Fused Silica

2021 ◽  
Vol 2021 ◽  
pp. 1-6
Author(s):  
Qiao Chen ◽  
He Wang ◽  
Rucheng Dai ◽  
Zhongping Wang ◽  
Xiaoping Tao ◽  
...  
Keyword(s):  
Laser Treatment ◽  
Co2 Laser ◽  
Surface Defects ◽  
Damage Threshold ◽  
Threshold Value ◽  
Fused Silica ◽  
Process Technology ◽  
Co2 Laser Treatment ◽  
Laser Induced Damage

Laser-induced damage threshold is the main limitation for fused silica optics in high-power laser applications. The existence of various defects near the surface is the key factor for the degradation of the threshold. In this work, the photoluminescence spectra at different regions of the damaged and recovered fused silica samples are recorded to analyze the correlation between photoluminescence of surface defects and laser-induced damage threshold. The experimental data concluded the inverse proportional correlation between fluorescence and laser-induced damage threshold value. The weak photoluminescence is the guarantee of the high laser-induced damage threshold, and then the higher local Si nanocluster concentration corresponds with the higher laser-induced damage threshold value for the fused silica optics after CO2 laser treatment. The investigation reveals that photoluminescence measurement can be employed to check the quality of pristine fused silica and evaluate the tendency of the laser-induced damage threshold value. The current results are helpful for understanding the evolution of interaction from CO2 laser treatment and fused silica optics and can provide the guide of process technology for the high quality of fused silica optics.

scholarly journals Thin film contamination effects on laser-induced damage of fused silica surfaces at 355 nm

1999 ◽  
Author(s):  
Francois Y. Genin ◽  
Alexander M. Rubenchik ◽  
Alan K. Burnham ◽  
Michael D. Feit ◽  
J. M. Yoshiyama ◽  
...  
Keyword(s):  
Thin Film ◽  
Fused Silica ◽  
Silica Surfaces ◽  
Laser Induced Damage ◽  
Contamination Effects

scholarly journals Quantification of Carbonic Contamination of Fused Silica Surfaces at Different Stages of Classical Optics Manufacturing

Materials ◽  
2021 ◽  
Vol 14 (7) ◽  
pp. 1620
Author(s):  
Robert Köhler ◽  
Domenico Hellrung ◽  
Daniel Tasche ◽  
Christoph Gerhard
Keyword(s):  
Chemical Composition ◽  
Photoelectron Spectroscopy ◽  
Decisive Role ◽  
Fused Silica ◽  
Process Step ◽  
Carbon Contamination ◽  
Silica Surfaces ◽  
Carbon Impurities ◽  
High Level ◽  
Glass Surfaces

The chemical composition of ground and polished fused silica glass surfaces plays a decisive role in different applications of optics. In particular, a high level of carbon impurities is often undesirable for further processing and especially for gluing or cementing where adhesion failure may be attributed to carbonic surface-adherent contaminants. In this study, the surface carbon content at different stages of classical optics manufacturing was thus investigated. Two different standard processes—grinding and lapping with two final polishing processes using both polyurethane and pitch pads—were considered. After each process step, the chemical composition and roughness of the surface were analysed using X-ray photoelectron spectroscopy and atomic force microscopy. An obvious correlation between surface roughness and effective surface area, respectively, and the proportion of carbon contamination was observed. The lowest carbon contamination was found in case of lapped and pitch polished surfaces.

scholarly journals Monitoring annealing via CO_2 laser heating of defect populations on fused silica surfaces using photoluminescence microscopy

2010 ◽  
Vol 18 (14) ◽  
pp. 15207 ◽  
Author(s):  
Rajesh N. Raman ◽  
Manyalibo J. Matthews ◽  
John J. Adams ◽  
Stavros G. Demos
Keyword(s):  
Laser Heating ◽  
Fused Silica ◽  
Silica Surfaces ◽  
Photoluminescence Microscopy

Investigation on the influence of the CO2 laser parameters on the defect healing process of fused silica

2021 ◽  
Author(s):  
Zican YANG ◽  
Jian Cheng ◽  
Linjie Zhao ◽  
Mingjun Chen ◽  
Jinghe Wang ◽  
...  
Keyword(s):  
Co2 Laser ◽  
Healing Process ◽  
Fused Silica ◽  
Laser Parameters ◽  
Defect Healing

Laser-induced damage of fused silica at 355 nm initiated at scratches

1998 ◽  
Author(s):  
Alberto Salleo ◽  
Francois Y. Genin ◽  
J. M. Yoshiyama ◽  
Christopher J. Stolz ◽  
Mark R. Kozlowski
Keyword(s):  
Fused Silica ◽  
Laser Induced Damage
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