Novel chemical vapor deposition process of ZnO films using nonequilibrium N2 plasma generated near atmospheric pressure with small amount of O2 below 1%

Yukinori Nose; Takeshi Yoshimura; Atsushi Ashida; Tsuyoshi Uehara; Norifumi Fujimura

doi:10.1063/1.4948326

Novel chemical vapor deposition process of ZnO films using nonequilibrium N2 plasma generated near atmospheric pressure with small amount of O2 below 1%

Journal of Applied Physics ◽

10.1063/1.4948326 ◽

2016 ◽

Vol 119 (17) ◽

pp. 175302 ◽

Cited By ~ 3

Author(s):

Yukinori Nose ◽

Takeshi Yoshimura ◽

Atsushi Ashida ◽

Tsuyoshi Uehara ◽

Norifumi Fujimura

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Zno Films ◽

N2 Plasma ◽

Vapor Deposition Process

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Effect of Bipolar Charging of SiH4 on the Growth Rate and Crystallinity of Silicon Films Grown in the Atmospheric Pressure Chemical Vapor Deposition Process

Electronic Materials Letters ◽

10.1007/s13391-020-00217-0 ◽

2020 ◽

Vol 16 (4) ◽

pp. 385-395 ◽

Cited By ~ 1

Author(s):

Yoonjung Lee ◽

Heung Nam Han ◽

Woongsik Kim ◽

Nong Moon Hwang

Keyword(s):

Growth Rate ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Deposition Process ◽

Silicon Films ◽

Chemical Vapor Deposition Process ◽

Pressure Chemical ◽

Vapor Deposition Process

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The use of silver(I)-2-[2-(2-methoxyethoxy)ethoxy]acetate as precursor in the deposition of thin silver layers on float glass by the atmospheric pressure combustion chemical vapor deposition process

Thin Solid Films ◽

10.1016/j.tsf.2010.05.082 ◽

2010 ◽

Vol 518 (20) ◽

pp. 5741-5744 ◽

Cited By ~ 17

Author(s):

Thomas Struppert ◽

Alexander Jakob ◽

Andreas Heft ◽

Bernd Grünler ◽

Heinrich Lang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Deposition Process ◽

Float Glass ◽

Chemical Vapor Deposition Process ◽

Vapor Deposition Process

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Analysis of mass transport in an atmospheric pressure remote plasma-enhanced chemical vapor deposition process

Journal of Applied Physics ◽

10.1063/1.3294966 ◽

2010 ◽

Vol 107 (2) ◽

pp. 024909 ◽

Cited By ~ 9

Author(s):

R. P. Cardoso ◽

T. Belmonte ◽

G. Henrion ◽

T. Gries ◽

E. Tixhon

Keyword(s):

Chemical Vapor Deposition ◽

Mass Transport ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Remote Plasma ◽

Vapor Deposition Process

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Gas-Phase Nucleation in an Atmospheric Pressure Chemical Vapor Deposition Process for SiO2Films Using Tetraethylorthosilicate (TEOS)

Japanese Journal of Applied Physics ◽

10.1143/jjap.31.l1439 ◽

1992 ◽

Vol 31 (Part 2, No. 10A) ◽

pp. L1439-L1442 ◽

Cited By ~ 27

Author(s):

Motoaki Adachi ◽

Kikuo Okuyama ◽

Noboru Tohge ◽

Manabu Shimada ◽

Jun-ichi Satoh ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Gas Phase ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Pressure Chemical ◽

Phase Nucleation ◽

Vapor Deposition Process

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Scalable high-mobility MoS2thin films fabricated by an atmospheric pressure chemical vapor deposition process at ambient temperature

Nanoscale ◽

10.1039/c4nr04228j ◽

2014 ◽

Vol 6 (21) ◽

pp. 12792-12797 ◽

Cited By ~ 50

Author(s):

Chung-Che Huang ◽

Feras Al-Saab ◽

Yudong Wang ◽

Jun-Yu Ou ◽

John C. Walker ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Ambient Temperature ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

High Mobility ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Pressure Chemical ◽

Vapor Deposition Process

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Using an Atmospheric Pressure Chemical Vapor Deposition Process for the Development of V2O5 as an Electrochromic Material

Coatings ◽

10.3390/coatings7020024 ◽

2017 ◽

Vol 7 (2) ◽

pp. 24 ◽

Cited By ~ 6

Author(s):

Dimitra Vernardou

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Electrochromic Material ◽

Pressure Chemical ◽

Vapor Deposition Process

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Numerical Simulations of Films Formed by Cluster/Particle Co-Deposition in Atmospheric-Pressure Chemical Vapor Deposition Process Using Organic Silicon Vapors and Ozone Gas

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.3542 ◽

2000 ◽

Vol 39 (Part 1, No. 6A) ◽

pp. 3542-3548 ◽

Cited By ~ 6

Author(s):

Motoaki Adachi ◽

Toshiyuki Fujimoto ◽

Yoshifumi Itoh ◽

Kikuo Okuyama

Keyword(s):

Chemical Vapor Deposition ◽

Numerical Simulations ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Organic Silicon ◽

Pressure Chemical ◽

Vapor Deposition Process

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ANALYSIS OF HEAT AND MASS TRANSFER DURING MULTI-WAFER LOW PRESSURE CHEMICAL VAPOR DEPOSITION PROCESS

Proceeding of International Heat Transfer Conference 11 ◽

10.1615/ihtc11.240 ◽

1998 ◽

Author(s):

K.S. Park ◽

M. Choi

Keyword(s):

Mass Transfer ◽

Chemical Vapor Deposition ◽

Heat And Mass Transfer ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Low Pressure ◽

Chemical Vapor Deposition Process ◽

Pressure Chemical ◽

Vapor Deposition Process

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An analysis of the effect of the solid layer for the modified chemical vapor deposition process

Wärme- und Stoffübertragung ◽

10.1007/bf01541187 ◽

1993 ◽

Vol 28 (4) ◽

pp. 169-176 ◽

Cited By ~ 5

Author(s):

Y. T. Lin ◽

M. Choi ◽

R. Greif

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Solid Layer ◽

Vapor Deposition Process

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The Modified Chemical Vapor Deposition Process in a Concentric Annulus: An Extension for Focused High-Rate Deposition

Aerosol Science and Technology ◽

10.1080/02786828808959211 ◽

1988 ◽

Vol 9 (3) ◽

pp. 237-249 ◽

Cited By ~ 18

Author(s):

M. Fiebig ◽

M. Hilgenstock ◽

H.-A. Riemann

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

High Rate ◽

Chemical Vapor Deposition Process ◽

Concentric Annulus ◽

Vapor Deposition Process

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