scholarly journals Effect of low-damage inductively coupled plasma on shallow nitrogen-vacancy centers in diamond

2015 ◽  
Vol 107 (7) ◽  
pp. 073107 ◽  
Author(s):  
Felipe Fávaro de Oliveira ◽  
S. Ali Momenzadeh ◽  
Ya Wang ◽  
Mitsuharu Konuma ◽  
Matthew Markham ◽  
...  
Coatings ◽  
2020 ◽  
Vol 10 (6) ◽  
pp. 513
Author(s):  
Tianfei Zhu ◽  
Yan Liang ◽  
Zongchen Liu ◽  
Jiao Fu ◽  
Yanfeng Wang ◽  
...  

In this study, nitrogen-vacancy center emissions from nanocone structures fabricated on diamond surfaces by gold film annealing and inductively coupled plasma etching techniques were characterized. First, the diamond substate deposited with gold film was annealed to form a nano-sized dot mask. Second, through inductively coupled plasma etching, nanocone-shaped structures were fabricated using optimized gold dots as masks. Finally, the as-fabricated nanocone and planar structures were investigated with photoluminescence experiments at temperatures ranging from room temperature to 80 K, with the results showing approximately two-fold higher emission values for nitrogen-vacancy centers from nanocones.


Materials ◽  
2019 ◽  
Vol 12 (10) ◽  
pp. 1622 ◽  
Author(s):  
Zongchen Liu ◽  
Tian-Fei Zhu ◽  
Yan-Feng Wang ◽  
Irfan Ahmed ◽  
Zhangcheng Liu ◽  
...  

Submicron lenses and cylinders exhibiting excellent properties in photodetector and quantum applications have been fabricated on a diamond surface by an inductively-coupled plasma (ICP) etching technique. During ICP etching, a layer containing 500 nm diameter balls of SiO2 was employed as mask. By changing the mixing ratio of O2, Ar and CF4 during ICP etching, several submicron structures were fabricated, such as cylinders and lenses. The simulation results demonstrated that such submicron structures on a diamond’s surface can greatly enhance the photon out-coupling efficiency of embedded nitrogen-vacancy center.


MRS Advances ◽  
2020 ◽  
Vol 5 (35-36) ◽  
pp. 1899-1907
Author(s):  
C. Giese ◽  
P. Quellmalz ◽  
P. Knittel

ABSTRACTWe are proposing a novel fabrication method for single crystal diamond scanning probes for atomic force microscopy (AFM), exploiting Faraday cage angled etching (FCAE). Common, oxygen-based, inductively coupled plasma (ICP) dry etching processes for diamond are limited with respect to the achievable geometries. The fabrication of freestanding micro- and nanostructures is therefore challenging. This is a major disadvantage for several application fields e.g., for realizing scanning magnetometry probes based on nitrogen vacancy (NV) centres and capable of measuring magnetic fields at the nanoscale. Combining a planar design with FCAE and state-of-the-art electron beam lithography (EBL) yields a reduction of process complexity and cost compared to the established fabrication technology of micro-opto-mechanical diamond devices. Here, we report on the direct comparison of both approaches and present first proof-of-concept planar-FCAE-prototypes for scanning probe applications.


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