scholarly journals Operational stability of solution based zinc tin oxide/SiO2 thin film transistors under gate bias stress

APL Materials ◽  
2015 ◽  
Vol 3 (6) ◽  
pp. 062804 ◽  
Author(s):  
Asal Kiazadeh ◽  
Daniela Salgueiro ◽  
Rita Branquinho ◽  
Joana Pinto ◽  
Henrique L. Gomes ◽  
...  
Keyword(s):  
Thin Film ◽  
Tin Oxide ◽  
Thin Film Transistors ◽  
Operational Stability ◽  
Gate Bias ◽  
Bias Stress ◽  
Sio2 Thin Film ◽  
Stability Of Solution ◽  
Zinc Tin Oxide ◽  
Gate Bias Stress

Bias Stress Stability of Solution-Processed Zinc Tin Oxide Thin-Film Transistors

2009 ◽  
Vol 156 (11) ◽  
pp. H808 ◽  
Author(s):  
Youngmin Jeong ◽  
Keunkyu Song ◽  
Dongjo Kim ◽  
Chang Young Koo ◽  
Jooho Moon
Keyword(s):  
Thin Film ◽  
Tin Oxide ◽  
Thin Film Transistors ◽  
Oxide Thin Film ◽  
Solution Processed ◽  
Bias Stress ◽  
Stability Of Solution ◽  
Zinc Tin Oxide

Stability of Solution-processed ZrInZnO Thin-film Transistors under Gate Bias Stress

2011 ◽  
Vol 59 (2) ◽  
pp. 353-356
Author(s):  
Tae Hoon Jeong ◽  
Si Joon Kim ◽  
Doo Hyun Yoon ◽  
Woong Hee Jeong ◽  
Dong Lim Kim ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Film Transistors ◽  
Gate Bias ◽  
Solution Processed ◽  
Bias Stress ◽  
Stability Of Solution ◽  
Gate Bias Stress

Degradation behavior and degradation mechanism of bridged-grain polycrystalline silicon thin film transistors under AC gate bias stress

2017 ◽  
Vol 32 (2) ◽  
pp. 91-96
Author(s):  
张猛 ZHANG Meng ◽  
夏之荷 XIA Zhi-he ◽  
周玮 ZHOU Wei ◽  
陈荣盛 CHEN Rong-sheng ◽  
王文 WONG Man ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Film Transistors ◽  
Polycrystalline Silicon ◽  
Degradation Mechanism ◽  
Gate Bias ◽  
Degradation Behavior ◽  
Silicon Thin Film ◽  
Bias Stress ◽  
Gate Bias Stress
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