scholarly journals Gate controlled electronic transport in monolayer MoS2 field effect transistor

2015 ◽  
Vol 117 (10) ◽  
pp. 104307 ◽  
Author(s):  
Y. F. Zhou ◽  
H. M. Xian ◽  
B. Wang ◽  
Y. J. Yu ◽  
Y. D. Wei ◽  
...  
2021 ◽  
Vol 129 (14) ◽  
pp. 145106
Author(s):  
Sameer Kumar Mallik ◽  
Sandhyarani Sahoo ◽  
Mousam Charan Sahu ◽  
Sanjeev K. Gupta ◽  
Saroj Prasad Dash ◽  
...  

2019 ◽  
Vol 115 (1) ◽  
pp. 012104 ◽  
Author(s):  
Dongjea Seo ◽  
Dong Yun Lee ◽  
Junyoung Kwon ◽  
Jea Jung Lee ◽  
Takashi Taniguchi ◽  
...  

2013 ◽  
Vol 103 (6) ◽  
pp. 063109 ◽  
Author(s):  
Jiadan Lin ◽  
Jianqiang Zhong ◽  
Shu Zhong ◽  
Hai Li ◽  
Hua Zhang ◽  
...  

Nano Letters ◽  
2019 ◽  
Vol 19 (3) ◽  
pp. 1437-1444 ◽  
Author(s):  
Jingxia Liu ◽  
Xihua Chen ◽  
Qinqin Wang ◽  
Mengmeng Xiao ◽  
Donglai Zhong ◽  
...  

2019 ◽  
Vol 21 (2) ◽  
pp. 597-606 ◽  
Author(s):  
Sindy J. Rodríguez ◽  
Eduardo A. Albanesi

We modeled a type of field-effect transistor device based on graphene for the recognition of amino acids with a potential application in the building of a protein sequencer.


Nanoscale ◽  
2018 ◽  
Vol 10 (23) ◽  
pp. 10856-10862 ◽  
Author(s):  
Hyunjin Ji ◽  
Hojoon Yi ◽  
Jinbong Seok ◽  
Hyun Kim ◽  
Young Hee Lee ◽  
...  

The influence of the adsorbates from the atmosphere on the transport properties of a CVD-grown monolayer MoS2 FET is studied.


2021 ◽  
Author(s):  
Yuning Li ◽  
Shasha Li ◽  
Jingye Sun ◽  
Ke Li ◽  
Zewen Liu ◽  
...  

Nanomaterials ◽  
2019 ◽  
Vol 9 (9) ◽  
pp. 1209 ◽  
Author(s):  
Han ◽  
Liu ◽  
Wang ◽  
Chen ◽  
Xie ◽  
...  

The two-dimensional materials can be used as the channel material of transistor, which can further decrease the size of transistor. In this paper, the molybdenum disulfide (MoS2) is grown on the SiO2/Si substrate by atmospheric pressure chemical vapor deposition (APCVD), and the MoS2 is systematically characterized by the high-resolution optical microscopy, Raman spectroscopy, photoluminescence spectroscopy, and the field emission scanning electron microscopy, which can confirm that the MoS2 is a monolayer. Then, the monolayer MoS2 is selected as the channel material to complete the fabrication process of the back-gate field effect transistor (FET). Finally, the electrical characteristics of the monolayer MoS2-based FET are tested to obtain the electrical performance. The switching ratio is 103, the field effect mobility is about 0.86 cm2/Vs, the saturation current is 2.75 × 10−7 A/μm, and the lowest gate leakage current is 10−12 A. Besides, the monolayer MoS2 can form the ohmic contact with the Ti/Au metal electrode. Therefore, the electrical performances of monolayer MoS2-based FET are relatively poor, which requires the further optimization of the monolayer MoS2 growth process. Meanwhile, it can provide the guidance for the application of monolayer MoS2-based FETs in the future low-power optoelectronic integrated circuits.


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