Si etching with reactive neutral beams of very low energy

2014 ◽  
Vol 116 (22) ◽  
pp. 223301
Author(s):  
Yasuhiro Hara ◽  
Manabu Hamagaki ◽  
Takaya Mise ◽  
Naotaka Iwata ◽  
Tamio Hara
Keyword(s):  
Low Energy ◽  
Neutral Beams

A 7-nm nanocolumn structure fabricated by using a ferritin iron-core mask and low-energy Cl neutral beams

2004 ◽  
Vol 84 (9) ◽  
pp. 1555-1557 ◽  
Author(s):  
Tomohiro Kubota ◽  
Tomohiro Baba ◽  
Seiji Samukawa ◽  
Hiroyuki Kawashima ◽  
Yukiharu Uraoka ◽  
...  
Keyword(s):  
Low Energy ◽  
Iron Core ◽  
Neutral Beams ◽  
Ferritin Iron

Coulomb-staircase observed in silicon-nanodisk structures fabricated by low-energy chlorine neutral beams

2007 ◽  
Vol 101 (12) ◽  
pp. 124301 ◽  
Author(s):  
Tomohiro Kubota ◽  
Takeshi Hashimoto ◽  
Masaki Takeguchi ◽  
Kensuke Nishioka ◽  
Yukiharu Uraoka ◽  
...  
Keyword(s):  
Low Energy ◽  
Neutral Beams ◽  
Coulomb Staircase

High‐flux source of low‐energy neutral beams using reflection of ions from metals

1992 ◽  
Vol 63 (11) ◽  
pp. 5279-5288 ◽  
Author(s):  
John W. Cuthbertson ◽  
Robert W. Motley ◽  
William D. Langer
Keyword(s):  
Low Energy ◽  
High Flux ◽  
Neutral Beams

Development of a low energy Ne atom scattering system for insulator surface strctural analysis

2005 ◽  
Vol 908 ◽  
Author(s):  
Kenji Umezawa ◽  
E Narihiro ◽  
K Oda ◽  
Shigemitsu Nakanishi ◽  
Walter M Gibson
Keyword(s):  
Ion Beam ◽  
Time Of Flight ◽  
Low Energy ◽  
Primary Beam ◽  
Scattering System ◽  
Insulator Surface ◽  
Detection Systems ◽  
Neutral Beams ◽  
Atom Scattering ◽  
Fundamental Research

AbstractWe have been developing a low energy Ne atom scattering system combined with a time-of-flight spectrometer for insulator surface structural analysis. Insulator surface structure is difficult to study because of charging effects during electron or ion beam bombardment. Structural analyses of insulator surfaces are very important in fundamental research as well as technology fields. In our system, charged ion beams of 2 keV-Ne+ are converted into neutral beams by charge exchange with the same element gas after the primary beam passes through a chopper. Other features of this system are pulsed beams, time-of-flight measurements, and a micochannel plate (MCP) detector is coaxially mounted along the primary beam. This is a home made equipment. We will show the detection systems, as well.

Dissociated Σ=27 boundaries in silicon

1988 ◽  
Vol 46 ◽  
pp. 624-625
Author(s):  
A. Garg ◽  
W.A.T. Clark ◽  
J.P. Hirth
Keyword(s):  
Electron Diffraction ◽  
Local Minimum ◽  
Boundary Energy ◽  
Coincidence Site Lattice ◽  
Boundary Plane ◽  
Low Energy ◽  
Theoretical Understanding ◽  
Site Lattice ◽  
Kikuchi Pattern ◽  
Analysis Techniques

In the last twenty years, a significant amount of work has been done in the theoretical understanding of grain boundaries. The various proposed grain boundary models suggest the existence of coincidence site lattice (CSL) boundaries at specific misorientations where a periodic structure representing a local minimum of energy exists between the two crystals. In general, the boundary energy depends not only upon the density of CSL sites but also upon the boundary plane, so that different facets of the same boundary have different energy. Here we describe TEM observations of the dissociation of a Σ=27 boundary in silicon in order to reduce its surface energy and attain a low energy configuration.The boundary was identified as near CSL Σ=27 {255} having a misorientation of (38.7±0.2)°/[011] by standard Kikuchi pattern, electron diffraction and trace analysis techniques. Although the boundary appeared planar, in the TEM it was found to be dissociated in some regions into a Σ=3 {111} and a Σ=9 {122} boundary, as shown in Fig. 1.

Transfer optics for high spatial resolution electron spectroscopy

1988 ◽  
Vol 46 ◽  
pp. 666-667
Author(s):  
G. G. Hembree ◽  
Luo Chuan Hong ◽  
P.A. Bennett ◽  
J.A. Venables
Keyword(s):  
Magnetic Field ◽  
Scanning Transmission Electron Microscope ◽  
Low Energy ◽  
Objective Lens ◽  
State University ◽  
Arizona State University ◽  
Initial Field ◽  
Resolution Electron ◽  
Scanning Transmission ◽  
Low Energy Electrons

A new field emission scanning transmission electron microscope has been constructed for the NSF HREM facility at Arizona State University. The microscope is to be used for studies of surfaces, and incorporates several surface-related features, including provision for analysis of secondary and Auger electrons; these electrons are collected through the objective lens from either side of the sample, using the parallelizing action of the magnetic field. This collimates all the low energy electrons, which spiral in the high magnetic field. Given an initial field Bi∼1T, and a final (parallelizing) field Bf∼0.01T, all electrons emerge into a cone of semi-angle θf≤6°. The main practical problem in the way of using this well collimated beam of low energy (0-2keV) electrons is that it is travelling along the path of the (100keV) probing electron beam. To collect and analyze them, they must be deflected off the beam path with minimal effect on the probe position.

Performance Evaluation of a Novel Type of Low-Energy Electron Microscope

1990 ◽  
Vol 48 (1) ◽  
pp. 354-355
Author(s):  
Bertholdand Senftinger ◽  
Helmut Liebl
Keyword(s):  
Electron Microscope ◽  
High Resolution ◽  
Field Strength ◽  
Numerical Aperture ◽  
Low Energy ◽  
Energy Electron ◽  
High Resolution Imaging ◽  
Lens System ◽  
Resolution Imaging ◽  
Low Energy Electron

During the last few years the investigation of clean and adsorbate-covered solid surfaces as well as thin-film growth and molecular dynamics have given rise to a constant demand for high-resolution imaging microscopy with reflected and diffracted low energy electrons as well as photo-electrons. A recent successful implementation of a UHV low-energy electron microscope by Bauer and Telieps encouraged us to construct such a low energy electron microscope (LEEM) for high-resolution imaging incorporating several novel design features, which is described more detailed elsewhere.The constraint of high field strength at the surface required to keep the aberrations caused by the accelerating field small and high UV photon intensity to get an improved signal-to-noise ratio for photoemission led to the design of a tetrode emission lens system capable of also focusing the UV light at the surface through an integrated Schwarzschild-type objective. Fig. 1 shows an axial section of the emission lens in the LEEM with sample (28) and part of the sample holder (29). The integrated mirror objective (50a, 50b) is used for visual in situ microscopic observation of the sample as well as for UV illumination. The electron optical components and the sample with accelerating field followed by an einzel lens form a tetrode system. In order to keep the field strength high, the sample is separated from the first element of the einzel lens by only 1.6 mm. With a numerical aperture of 0.5 for the Schwarzschild objective the orifice in the first element of the einzel lens has to be about 3.0 mm in diameter. Considering the much smaller distance to the sample one can expect intense distortions of the accelerating field in front of the sample. Because the achievable lateral resolution depends mainly on the quality of the first imaging step, careful investigation of the aberrations caused by the emission lens system had to be done in order to avoid sacrificing high lateral resolution for larger numerical aperture.

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