scholarly journals Voltammetric and impedance behaviours of surface-treated nano-crystalline diamond film electrodes

AIP Advances ◽  
2015 ◽  
Vol 5 (4) ◽  
pp. 041306 ◽  
Author(s):  
F. B. Liu ◽  
B. Jing ◽  
Y. Cui ◽  
J. J. Di ◽  
M. Qu
Keyword(s):  
Diamond Film ◽  
Nano Crystalline ◽  
Diamond Film Electrodes

Nano-Crystalline Diamond Films Deposited on Copper Substrate by MPCVD Method

2011 ◽  
Vol 117-119 ◽  
pp. 1310-1314
Author(s):  
Xing Rui Li ◽  
Xin Wei Shi ◽  
Ning Yao ◽  
Xin Chang Wang
Keyword(s):  
Diamond Film ◽  
Deposition Time ◽  
Microwave Plasma ◽  
Copper Substrate ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Annealing Process ◽  
Adhesive Properties ◽  
Plasma Chemical Vapor Deposition ◽  
Nano Crystalline

Nano-crystalline diamond (NCD) films with good adhesion were deposited on flexible copper substrate with Ni interlayer by Microwave Plasma Chemical Vapor Deposition (MPCVD). In this paper, two-stage method was used to improve the adhesion between the copper substrates and the diamond films. The effect of deposition time of the first stage on the morphology, crystal structure, non-diamond phase and adhesive properties of diamond films was investigated. The performance and structure of the diamond films were studied by Scanning Electron Microscope (SEM), Raman Spectroscopy (Raman) and X-Ray Diffraction (XRD). The results showed that the films were nano-crystalline diamond films positively. Impress method was used to examine the adhesion between diamond film and the substrate. When deposition time is 1.5h, the adhesion between diamond film and the copper substrate is better than the others. When it was 2.5h or longer, because the graphite layers existed as intermediate, the adherence between the diamond films and copper substrates was very poor. Therefore, the diamond films were easily peeled off from the substrates. Otherwise, the second stage called annealing process after the deposition played an important role to the adhesion. The films would be easily peeled off by curling without the annealing process.

Synthesis of Nano-Crystalline Diamond Film in Hot Filament Chemical Vapour Deposition by Adding Ar

2001 ◽  
Vol 18 (2) ◽  
pp. 286-288 ◽  
Author(s):  
Zhang Yu-Feng ◽  
Zhang Fan ◽  
Gao Qiao-Jun ◽  
Yu Da-Peng ◽  
Peng Xiao-Fu ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Diamond Film ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Nano Crystalline ◽  
Hot Filament

Boron-Doped Nanocrystalline Diamond Films Deposited By Using DC Arc Plasma Jet CVD

2010 ◽  
Vol 426-427 ◽  
pp. 30-34
Author(s):  
Bing Kun Xiang ◽  
Dun Wen Zuo ◽  
Xiang Feng Li ◽  
Feng Xu ◽  
M. Wang
Keyword(s):  
Diamond Film ◽  
Boron Concentration ◽  
Low Frequency ◽  
Nanocrystalline Diamond ◽  
Boron Doped ◽  
Nano Crystalline ◽  
Diamond Peak ◽  
Dc Arc ◽  
Afm Observation ◽  
Peak Value

Boron-doped micro-nanocrystalline diamond coating may be successfully prepared on Mo substrate with DC arc plasmas jet deposition device. Along with the increase of doped-boron concentration in the film, two-point resistance measurement indicates that film resistance presents exponential decrease; Raman spectrum test shows that, the characteristic peak value of diamond 1332cm-1 in the spectrum moves toward low frequency, the semi-height width of diamond peak, peak D and peak G, etc. in the spectrum is expanded, and the component of non-diamond bonds such as sp2, etc. in the film is increased; SEM and AFM observation shows that, increasing the doped-boron concentration could further subdivide the crystal grains in the film, and is beneficial for the growth of nano- or ultra-nano-crystalline diamond film; film annealing test shows that, micro-nanocrystalline diamond film with higher doped-boron concentration has better thermal stability than the micro-nanocrystalline diamond film without doped boron.

Anodically Generated Short-Lived Species on Boron-Doped Diamond Film Electrodes

2005 ◽  
Vol 152 (1) ◽  
pp. E14 ◽  
Author(s):  
James Farrell ◽  
Farrel J. Martin ◽  
Heidi B. Martin ◽  
William E. O’Grady ◽  
Paul Natishan
Keyword(s):  
Diamond Film ◽  
Boron Doped Diamond ◽  
Boron Doped ◽  
Diamond Film Electrodes

Electrodeposition of Lead at Boron-Doped Diamond Film Electrodes: Effect of Temperature

2003 ◽  
Vol 15 (12) ◽  
pp. 1011-1016 ◽  
Author(s):  
César Prado ◽  
Shelley J. Wilkins ◽  
Peter Gründler ◽  
Frank Marken ◽  
Richard G. Compton
Keyword(s):  
Diamond Film ◽  
Effect Of Temperature ◽  
Boron Doped Diamond ◽  
Boron Doped ◽  
Diamond Film Electrodes

Development and growth time optimization of boron-doped micro-crystalline, undoped micro-crystalline and undoped nano-crystalline composite diamond film

2016 ◽  
Vol 232 (7) ◽  
pp. 1244-1258 ◽  
Author(s):  
Xinchang Wang ◽  
Chengchuan Wang ◽  
Fanghong Sun
Keyword(s):  
Surface Roughness ◽  
Diamond Film ◽  
Surface Hardness ◽  
Middle Layer ◽  
Growth Time ◽  
Initial Surface ◽  
Diamond Layer ◽  
Boron Doped ◽  
Nano Crystalline ◽  
Composite Diamond

Based on a well-designed growth procedure, a tri-material, namely, a three-layer boron-doped micro-crystalline, undoped micro-crystalline and undoped nano-crystalline composite diamond film, is deposited on the pretreated WC–6 wt% Co substrate, the basic characters of which are systematically studied and compared with some other commonly used diamond films. Besides, the growth times for three respective layers are accordingly determined. It is further clarified that the underlying boron-doped micro-crystalline diamond layer can well adhere to the WC–Co substrate due to either the reduction in the residual stress or the formation of B–Co compounds. There is no doubt that the surface undoped nano-crystalline diamond layer with relatively lower hardness and initial surface roughness is more convenient to be polished to the required surface roughness. Moreover, when the growth times for the middle undoped micro-crystalline diamond layer and the surface undoped nano-crystalline diamond layer are both appropriate, the undoped micro-crystalline diamond layer with extremely high diamond quality and hardness can effectively reinforce the surface hardness of the whole composite film. Based on the discussions on the influences of the growth times for the different layers on the performance of the composite diamond film, the growth times for the boron-doped micro-crystalline diamond, undoped micro-crystalline diamond and undoped nano-crystalline diamond layers are, respectively, determined as 4, 4 and 2 h. Under such conditions, the reinforcement effect of the middle layer on the surface hardness can be guaranteed, and the undoped nano-crystalline diamond grains have totally covered the undoped micro-crystalline diamond layer.

Adherent and low friction nano-crystalline diamond film grown on titanium using microwave CVD plasma

2008 ◽  
Vol 17 (3) ◽  
pp. 294-299 ◽  
Author(s):  
S.J. Askari ◽  
G.C. Chen ◽  
F. Akhtar ◽  
F.X. Lu
Keyword(s):  
Diamond Film ◽  
Low Friction ◽  
Nano Crystalline
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