Numerical simulation of ion charge breeding in electron beam ion source

2014 ◽  
Vol 85 (2) ◽  
pp. 02B706 ◽  
Author(s):  
L. Zhao ◽  
Jin-Soo Kim
Keyword(s):  
Numerical Simulation ◽  
Electron Beam ◽  
Ion Source ◽  
Charge Breeding

Fast and efficient charge breeding of the Californium rare isotope breeder upgrade electron beam ion source

2015 ◽  
Vol 86 (8) ◽  
pp. 083311 ◽  
Author(s):  
P. N. Ostroumov ◽  
A. Barcikowski ◽  
C. A. Dickerson ◽  
A. Perry ◽  
A. I. Pikin ◽  
...  
Keyword(s):  
Electron Beam ◽  
Ion Source ◽  
Rare Isotope ◽  
Charge Breeding ◽  
Efficient Charge

Charge breeding of radioactive isotopes at the CARIBU facility with an electron beam ion source

2018 ◽  
Vol 89 (5) ◽  
pp. 052402 ◽  
Author(s):  
R. C. Vondrasek ◽  
C. A. Dickerson ◽  
M. Hendricks ◽  
P. Ostroumov ◽  
R. Pardo ◽  
...  
Keyword(s):  
Electron Beam ◽  
Ion Source ◽  
Radioactive Isotopes ◽  
Charge Breeding

scholarly journals Erratum: “Charge breeding of radioactive isotopes at the CARIBU facility with an electron beam ion source” [Rev. Sci. Instrum. 89, 052402 (2018)]

2018 ◽  
Vol 89 (10) ◽  
pp. 109901
Author(s):  
R. C. Vondrasek ◽  
C. A. Dickerson ◽  
M. Hendricks ◽  
P. Ostroumov ◽  
R. Pardo ◽  
...  
Keyword(s):  
Electron Beam ◽  
Ion Source ◽  
Radioactive Isotopes ◽  
Charge Breeding

Nucleation and Early Growth of Sputtered thin Films

1970 ◽  
Vol 28 ◽  
pp. 516-517
Author(s):  
Dudley M. Sherman ◽  
Thos. E. Hutchinson
Keyword(s):  
Thin Films ◽  
Electron Beam ◽  
Ion Beam ◽  
Ion Source ◽  
Water Cooling ◽  
Stages Of Growth ◽  
Lens Assembly ◽  
Microscope Technique ◽  
Ion Beam Sputter Deposition

The in situ electron microscope technique has been shown to be a powerful method for investigating the nucleation and growth of thin films formed by vacuum vapor deposition. The nucleation and early stages of growth of metal deposits formed by ion beam sputter-deposition are now being studied by the in situ technique.A duoplasmatron ion source and lens assembly has been attached to one side of the universal chamber of an RCA EMU-4 microscope and a sputtering target inserted into the chamber from the opposite side. The material to be deposited, in disc form, is bonded to the end of an electrically isolated copper rod that has provisions for target water cooling. The ion beam is normal to the microscope electron beam and the target is placed adjacent to the electron beam above the specimen hot stage, as shown in Figure 1.

Numerical Simulation of the Effects of Preheating on Electron Beam Additive Manufactured Ti-6Al-4V Build Plate

2016 ◽  
Vol 879 ◽  
pp. 274-278 ◽  
Author(s):  
Jun Cao ◽  
Philip Nash
Keyword(s):  
Numerical Simulation ◽  
Residual Stress ◽  
Finite Element ◽  
Electron Beam ◽  
Cross Section ◽  
Element Model ◽  
Normal Direction ◽  
Thermal Residual Stresses ◽  
Longitudinal Residual Stress ◽  
Middle Cross Section

In an earlier study, a 3-D thermomechanical coupled finite element model was built and experimentally validated to investigate the evolution of the thermal residual stresses and distortions in electron beam additive manufactured Ti-6Al-4V build plates. In this study, an investigation using this robust and accurate model was focused on an efficient preheating method, in which the electron beam quickly scanned across the substrate to preheat the build plate prior to the deposition. Various preheat times, beam powers, scan rates, scanning paths and cooling times (between the end of current preheat scan/deposition layer and the beginning of the next preheat scan/deposition layer) were examined, and the maximum distortion along the centerline of the substrate and the maximum longitudinal residual stress along the normal direction on the middle cross-section of the build plate were quantitatively compared. The results show that increasing preheat times and beam powers could effectively reduce both distortion and residual stress for multiple layers/passes components.

Mass analyzer using electron‐beam‐guiding type ion source

1979 ◽  
Vol 50 (12) ◽  
pp. 1517-1520 ◽  
Author(s):  
Tohru Kishi ◽  
Isao Yamada ◽  
Toshinori Takagi
Keyword(s):  
Electron Beam ◽  
Ion Source ◽  
Mass Analyzer

The MAXEBIS at GSI as a test ion source for charge breeding and for HITRAP

2008 ◽  
Vol 79 (2) ◽  
pp. 02A705 ◽  
Author(s):  
O. Kester ◽  
R. Becker ◽  
J. Pfister ◽  
A. Sokolov ◽  
G. Vorobjev ◽  
...  
Keyword(s):  
Ion Source ◽  
Charge Breeding
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