Aluminum doping induced columnar growth of homoepitaxial ZnO films by metalorganic chemical vapor deposition

2013 ◽  
Vol 103 (14) ◽  
pp. 141907 ◽  
Author(s):  
K. Ding ◽  
Q. C. Hu ◽  
X. Wang ◽  
J. Y. Zhang ◽  
W. W. Lin ◽  
...  
2009 ◽  
Vol 39 (5) ◽  
pp. 608-611 ◽  
Author(s):  
Tammy Ben-Yaacov ◽  
Tommy Ive ◽  
Chris G. Van de Walle ◽  
Umesh K. Mishra ◽  
James S. Speck ◽  
...  

2011 ◽  
Vol 50 (10R) ◽  
pp. 105502 ◽  
Author(s):  
Yong-Seok Choi ◽  
Dae-Kue Hwang ◽  
Bong-Joon Kwon ◽  
Jang-Won Kang ◽  
Yong-Hoon Cho ◽  
...  

2006 ◽  
Vol 21 (7) ◽  
pp. 1632-1637 ◽  
Author(s):  
Maria Losurdo ◽  
Maria M. Giangregorio ◽  
A. Sacchetti ◽  
Pio Capezzuto ◽  
Giovanni Bruno ◽  
...  

ZnO thin films have been grown by metalorganic chemical vapor deposition (MOCVD) and plasma-assisted (PA) MOCVD on c-axis-oriented sapphire (0001) and Si (001) substrates using the novel Zn(2-thenoyltrifluoroacetonate)2·N,N,N′,N′-tetramethylethylendiamine precursor. The structural, morphological, and optical properties of ZnO films have been investigated. The results show that the O2 PA growth results in highly c-axis-oriented hexagonal ZnO thin films also on cubic substrates. PA-MOCVD ZnO films have good optical properties, as inferred by the presence of a sharp and intense exciton in the dielectric function.


2011 ◽  
Vol 50 (10) ◽  
pp. 105502 ◽  
Author(s):  
Yong-Seok Choi ◽  
Dae-Kue Hwang ◽  
Bong-Joon Kwon ◽  
Jang-Won Kang ◽  
Yong-Hoon Cho ◽  
...  

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