Enhancing the efficiency of slow-wave electron cyclotron masers with the tapered refractive index

2013 ◽  
Vol 20 (4) ◽  
pp. 043107 ◽  
Author(s):  
Ling-Bao Kong ◽  
Zhi-Ling Hou ◽  
Jian Jing ◽  
Hai-Bo Jin ◽  
Chao-Hai Du
Keyword(s):  
Refractive Index ◽  
Slow Wave ◽  
Electron Cyclotron ◽  
Electron Cyclotron Masers

The nonlinear theory of slow-wave electron cyclotron masers with inclusion of the beam velocity spread

2013 ◽  
Vol 339 ◽  
pp. 588-595 ◽  
Author(s):  
Ling-Bao Kong ◽  
Hong-Yu Wang ◽  
Zhi-Ling Hou ◽  
Hai-Bo Jin ◽  
Chao-Hai Du
Keyword(s):  
Slow Wave ◽  
Nonlinear Theory ◽  
Electron Cyclotron ◽  
Velocity Spread ◽  
Beam Velocity ◽  
Electron Cyclotron Masers

Slow-wave electron cyclotron maser

1988 ◽  
Vol 38 (6) ◽  
pp. 2883-2888 ◽  
Author(s):  
T. H. Kho ◽  
A. T. Lin
Keyword(s):  
Slow Wave ◽  
Electron Cyclotron ◽  
Electron Cyclotron Maser ◽  
Cyclotron Maser

Room Temperature Deposition of Silicon Oxynitride Films with Low Stress Using Sputtering-Type Electron Cyclotron Resonance Plasmas

1999 ◽  
Vol 594 ◽  
Author(s):  
D. Gao ◽  
K. Furukawa ◽  
H. Nakashima ◽  
J. Gao ◽  
J. Wang ◽  
...  
Keyword(s):  
Refractive Index ◽  
Thermal Desorption ◽  
Flow Rate ◽  
Cyclotron Resonance ◽  
Room Temperature ◽  
Electron Cyclotron Resonance ◽  
Thermal Desorption Spectroscopy ◽  
Electron Cyclotron ◽  
Silicon Oxynitride ◽  
Intrinsic Stress

AbstractSilicon oxynitride (SiOxNy) films with low stress were deposited successfully at room temperature using sputtering-type electron cyclotron resonance (ECR) plasmas. Films were deposited for a wide range of flow rate ratio of O2 to N2 at a constant Ar flow rate. Film properties were verified by characterizations of refractive index (ellipsometry), structural properties (Fourier transform infrared and Auger electron spectroscopy), intrinsic stress, and barrier strength of water penetration (thermal desorption spectroscopy). A near-stoichiometric SiOxNy (x = 1.44 and y = 0.41) film with low stress could be formed at the optimum deposition condition, under which the SiOxNy film had a refractive index of 1.54. The results of thermal desorption spectroscopy measurements showed that the SiOx Ny film had a higher barrier against moisture penetration relative to deposited SiOx and SiNy films. The SiOxNy film was directly deposited on the organic EL device and the applicability was shown clearly. These results indicate that this SiOxNy film deposited using a sputtering-type ECR plasma has the potential to be utilized as a passivation layer of organic EL devices, which are required to be formed at low temperature.

Efficiency enhancement of anomalous-Doppler electron cyclotron masers with tapered magnetic field

2014 ◽  
Vol 21 (2) ◽  
pp. 023117 ◽  
Author(s):  
Chao-Ran Xie ◽  
Ling-Bao Kong ◽  
Pu-Kun Liu ◽  
Chao-Hai Du ◽  
Zhi-Ling Hou ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Electron Cyclotron ◽  
Efficiency Enhancement ◽  
Electron Cyclotron Masers ◽  
Tapered Magnetic Field

Slow Wave Electron Cyclotron Maser Utilizing Periodically Corrugated Waveguide

2001 ◽  
Vol 39 (1T) ◽  
pp. 320-323 ◽  
Author(s):  
Kazuo Ogura ◽  
Osamu Watanabe ◽  
Daizo Kamiyama
Keyword(s):  
Slow Wave ◽  
Electron Cyclotron ◽  
Corrugated Waveguide ◽  
Electron Cyclotron Maser ◽  
Cyclotron Maser

Gravitational Radiation and Electron-Cyclotron Masers from Ultra-Compact Double Degenerate Binaries

2008 ◽  
Author(s):  
Kinwah Wu ◽  
Andrew Willes ◽  
Gavin Ramsay ◽  
Ye-Fei Yuan ◽  
Xiang-Dong Li ◽  
...  
Keyword(s):  
Gravitational Radiation ◽  
Electron Cyclotron ◽  
Electron Cyclotron Masers
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