Early stage fractal growth in thin films below the percolation limit

2013 ◽  
Author(s):  
R. Batabyal ◽  
J. C. Mahato ◽  
Debolina Das ◽  
B. N. Dev
Keyword(s):  
Thin Films ◽  
Early Stage ◽  
Fractal Growth ◽  
Percolation Limit

Solid-State Electrolysis in CuBr Thin Films: Observation and Modelling of Fractal Growth

ChemPhysChem ◽  
2002 ◽  
Vol 3 (1) ◽  
pp. 107-110 ◽  
Author(s):  
Caroline Lambert ◽  
Pascal Lauque ◽  
Jean-Luc Seguin ◽  
Gilbert Albinet ◽  
Marc Bendahan ◽  
...  
Keyword(s):  
Thin Films ◽  
Solid State ◽  
Fractal Growth

Structural characterization of laser ablated epitaxial (Ba0.5Sr0.5)TiO3 thin films on MgO(001) by synchrotron x-ray scattering

1999 ◽  
Vol 14 (7) ◽  
pp. 2905-2911 ◽  
Author(s):  
Sangsub Kim ◽  
Tae Soo Kang ◽  
Jung Ho Je
Keyword(s):  
Thin Films ◽  
Early Stage ◽  
Lattice Parameter ◽  
Normal Direction ◽  
X Ray ◽  
X Ray Scattering ◽  
Surface Normal ◽  
Out Of Plane ◽  
Axis Parallel ◽  
Ray Scattering

Epitaxial (Ba0.5Sr0.5) TiO3 thin films of two different thickness (∼25 and ∼134 nm) on MgO(001) prepared by a pulsed laser deposition method were studied by synchrotron x-ray scattering measurements. The film grew initially with a cube-on-cube relationship, maintaining it during further growth. As the film grew, the surface of the film became significantly rougher, but the interface between the film and the substrate did not. In the early stage of growth, the film was highly strained in a tetragonal structure (c/a = 1.04) with the longer axis parallel to the surface normal direction. As the growth proceeded further, it relaxed to a cubic structure with the lattice parameter near the bulk value, and the mosaic distribution improved significantly in both in- and out-of-plane directions. The thinner film (∼25 nm) showed only one domain limited mainly by the film thickness, but the thicker film (∼134 nm) exhibited three domains along the surface normal direction.

Preparation of pzt thin films on Pt/Ti/SiO2 and Pt/SiO2 Substrates by ECR Plasma Enhanced DC Magnetron Multi-target Reactive Sputtering

1996 ◽  
Vol 441 ◽  
Author(s):  
Sung-Tae Kim ◽  
Hyun-Ho Kim ◽  
Moon-Yong Lee ◽  
Won-Jong Lee
Keyword(s):  
Thin Films ◽  
Lead Zirconate Titanate ◽  
Electron Cyclotron Resonance ◽  
Perovskite Phase ◽  
Early Stage ◽  
Reactive Sputtering ◽  
Deposition Process ◽  
Pzt Thin Films ◽  
Si Substrates ◽  
Ecr Plasma

AbstractPerovskite-phase lead zirconate titanate (PZT) thin films were fabricated at 4751C by the electron cyclotron resonance (ECR) plasma enhanced DC magnetron multi-target reactive sputtering method on Pt/Ti/SiO2/Si and Pt/SiO2/Si substrates. Stoichiometric perovskite PZT films were readily obtained on Pt/Ti/SiO2/Si substrates because Ti atoms which were out-diffused to the Pt surface facilitated Pb incorporation by forming lead titanate at the early stage of deposition process. Activation of oxygen by ECR plasma facilitated the oxidation reaction and Pb incorporation into the film. Thus perovskite-phase PZT can be obtained on the Pt/SiO2/Si substrate.

scholarly journals Fractal growth in organic thin films: Experiments and modeling

2009 ◽  
Vol 95 (20) ◽  
pp. 204101 ◽  
Author(s):  
Gengxin Zhang ◽  
Brandon Weeks ◽  
Richard Gee ◽  
Amitesh Maiti
Keyword(s):  
Thin Films ◽  
Organic Thin Films ◽  
Fractal Growth

Fluctuations on the magnetic response of superconducting thin films of Nb and MgB2 – Percolation limit of vortex mobility

2007 ◽  
Vol 460-462 ◽  
pp. 1268-1269
Author(s):  
F. Colauto ◽  
P. Orgiani ◽  
X.X. Xi ◽  
W.N. Kang ◽  
E.M. Choi ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetic Response ◽  
Superconducting Thin Films ◽  
Percolation Limit

scholarly journals FRACTAL GROWTH OF NICKEL-BASED ALLOYS IN THIN FILMS

1988 ◽  
Vol 37 (9) ◽  
pp. 1480
Author(s):  
HUANG LI-JI ◽  
LIU BAI-XIN ◽  
DING JU-REN ◽  
LI HENG-DE
Keyword(s):  
Thin Films ◽  
Fractal Growth

Deposition of YSZ Thin Films by Liquid Fuel Combustion Chemical Vapor Deposition

2002 ◽  
Author(s):  
Zhigang Xu ◽  
Jag Sankar ◽  
Qiuming Wei ◽  
Jim Lua ◽  
Sergey Yamolenko ◽  
...  
Keyword(s):  
Thin Films ◽  
Growth Rate ◽  
Chemical Vapor Deposition ◽  
Substrate Temperature ◽  
Vapor Deposition ◽  
Liquid Fuel ◽  
Film Growth ◽  
Early Stage ◽  
Chemical Vapor ◽  
Nucleation Density

Thin film of YSZ electrolyte is highly desired to reduce the electrical resistance in SOFCs. YSZ thin Films have been successfully produced using liquid fuel combustion chemical vapor deposition (CCVD) technique. Nucleation of the YSZ particles were investigated based on two processing parameters, i.e., substrate temperature and total-metal-concentration in the liquid fuel. An optimum substrate temperature was found for highest the nucleation density. The nucleation density was increased with the total-metal-concentration. Microstructure evolution of the YSZ particles in the early stage in film growth was also studied. It was found that the particle growth rate was linear with processing time, and the particle orientation was varying with the time in the early stage of the film processing. To enhance the film growth rate, the effect of thermophoresis was studied. By increase the temperature gradient towards substrate, the effect of thermophoresis was enhanced and the film growth is also increased.

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