Large area sub-wavelength azo-polymer gratings by waveguide modes interference lithography

2013 ◽  
Vol 102 (3) ◽  
pp. 031103 ◽  
Author(s):  
Xiangxian Wang ◽  
Douguo Zhang ◽  
Yikai Chen ◽  
Liangfu Zhu ◽  
Wenhai Yu ◽  
...  
Keyword(s):  
Interference Lithography ◽  
Large Area ◽  
Azo Polymer ◽  
Waveguide Modes ◽  
Polymer Gratings ◽  
Sub Wavelength

scholarly journals Large area and deep sub-wavelength interference lithography employing odd surface plasmon modes

2016 ◽  
Vol 6 (1) ◽  
Author(s):  
Liqin Liu ◽  
Yunfei Luo ◽  
Zeyu Zhao ◽  
Wei Zhang ◽  
Guohan Gao ◽  
...  
Keyword(s):  
Surface Plasmon ◽  
Interference Lithography ◽  
Large Area ◽  
Plasmon Modes ◽  
Sub Wavelength

Large-area two-dimensional silicon photonic crystals for infrared light fabricated with laser interference lithography

2004 ◽  
Vol 15 (5) ◽  
pp. 639-642 ◽  
Author(s):  
L Prodan ◽  
T G Euser ◽  
H A G M van Wolferen ◽  
C Bostan ◽  
R M de Ridder ◽  
...  
Keyword(s):  
Photonic Crystals ◽  
Infrared Light ◽  
Interference Lithography ◽  
Laser Interference Lithography ◽  
Two Dimensional ◽  
Laser Interference ◽  
Large Area ◽  
Silicon Photonic

scholarly journals The Fabrication of Nanostructures on Polydimethylsiloxane by Laser Interference Lithography

Nanomaterials ◽  
2019 ◽  
Vol 9 (1) ◽  
pp. 73 ◽  
Author(s):  
Jun Wu ◽  
Zhaoxin Geng ◽  
Yiyang Xie ◽  
Zhiyuan Fan ◽  
Yue Su ◽  
...  
Keyword(s):  
Indium Tin Oxide ◽  
Splitting Method ◽  
Vertical Direction ◽  
Interference Lithography ◽  
Wearable Electronics ◽  
Laser Interference Lithography ◽  
Laser Interference ◽  
Large Area ◽  
Periodic Nanostructures ◽  
Ito Glass

We report a method for fabricating periodic nanostructures on the surface of polydimethylsiloxane (PDMS) using laser interference lithography. The wave-front splitting method was used for the system, as the period and duty cycle can be easily controlled. Indium tin oxide (ITO) glass reveals favorable characteristics for controlling the standing waves distributed in the vertical direction, and was selected as the rigid substrate for the curing of the PDMS prepolymer, photoresist spin coating, and exposure processes. Periodic nanostructures such as gratings, dot, and hole arrays were prepared. This efficient way of fabricating large area periodic nanoscale patterns will be useful for surface plasmonic resonance and wearable electronics.

Large area metal micro-/nano-groove arrays with both structural color and anisotropic wetting fabricated by one-step focused laser interference lithography

Nanoscale ◽  
2019 ◽  
Vol 11 (11) ◽  
pp. 4803-4810 ◽  
Author(s):  
Hao Wu ◽  
Yunlong Jiao ◽  
Chenchu Zhang ◽  
Chao Chen ◽  
Liang Yang ◽  
...  
Keyword(s):  
Metal Surfaces ◽  
Structural Color ◽  
Interference Lithography ◽  
Laser Interference Lithography ◽  
Laser Interference ◽  
Large Area ◽  
One Step

Colorful and anisotropic multi-functional metal surfaces fabricated by focused laser interference lithography.

Large-Area Sub-Wavelength Optical Patterning via Long-Range Ordered Polymer Lens Array

2016 ◽  
Vol 8 (25) ◽  
pp. 16368-16378 ◽  
Author(s):  
Jin Wu ◽  
Chihao Liow ◽  
Kai Tao ◽  
Yuanyuan Guo ◽  
Xiaotian Wang ◽  
...  
Keyword(s):  
Long Range ◽  
Large Area ◽  
Lens Array ◽  
Optical Patterning ◽  
Sub Wavelength

Interference lithography patterned large area plasmonic nanodisks for infrared detection

2014 ◽  
Vol 128 ◽  
pp. 373-375 ◽  
Author(s):  
Guangyuan Si ◽  
Qiaoyun Wang ◽  
Jiangtao Lv ◽  
Ligang Miao ◽  
Fengwen Wang ◽  
...  
Keyword(s):  
Infrared Detection ◽  
Interference Lithography ◽  
Large Area

Sub-Wavelength Texturing for Solar Cells Using Interferometric Lithography

2006 ◽  
Vol 51 ◽  
pp. 115-120 ◽  
Author(s):  
W.L. Chiu ◽  
M.M. Alkaisi ◽  
G. Kumaravelu ◽  
R.J. Blaikie ◽  
R.J. Reeves ◽  
...  
Keyword(s):  
Defect Density ◽  
Substantial Reduction ◽  
Surface Texturing ◽  
Silicon Substrates ◽  
Textured Surface ◽  
Large Area ◽  
Periodic Patterns ◽  
Interferometric Lithography ◽  
Plasma Reflection ◽  
Sub Wavelength

We have employed Interferometric Lithography (IL) for sub-wavelength surface texturing on large area silicon substrates. Low defect density Reactive Ion Etching (RIE) processes have been developed to transfer the pattern into the silicon using SF 6 plasma. Reflection measurements on the sub-wavelength textured surface have been carried out and show a substantial reduction from ~30% to below 4% over the spectrum range from 400nm to 1200nm. IL is a mask-less lithography technique which is used to define periodic patterns. The theoretical limit of the pitch size of the structure is half of the wavelength of the light source. Hence, the sub-wavelength patterns can be achieved easily. Moreover, sub-wavelength texturing requires short RIE processes; most of the plasma-induced damage on the silicon surface can be avoided.

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